高空螺旋桨驱动电机控制系统的仿真研究

螺旋桨的负载特性不仅与飞行器的飞行高度相关,还与其驱动电机的转速呈现非线性关系,若驱动电机采用传统的PID控制方法,较难取得理想的控制效果.为了解决这一问题,在分析了驱动电机的数学模型和螺旋桨负载特性的基础上,设计了一种模糊自适应PID控制方法.并在Matlab/Simulink中建立了控制系统的仿真模型,进行了仿真实验.实验结果表明,模糊自适应PID控制方法动静态品质良好、鲁棒性强,控制效果明显优于传统的PID控制器.     

双余度舵系统设计与研究

为了提高舵系统可靠性,采用了冗余策略,设计了双余度舵系统.选用双余度永磁无刷直流电机作为舵机本体,采用均流技术等控制策略,实现系统软硬件设计.利用Matlab/Simulink,对双余度无刷直流电机本体和舵系统整体进行仿真验证.仿真结果和实验结果表明,该设计实现了对角度的高精度跟踪,整个系统稳态误差小、性能优良.     

一种基于80C196KC和L298N的直流电机PWM控制技术

阐述了基于80C196KC和L298N的直流电机PWM控制系统的设计,给出了PWM调速系统的工作原理,结合具体硬件电路介绍了L298N驱动直流电机的实现方法及抗干扰措施,并给出了引入分段PI控制的软件实现方法。实践证明,系统工作稳定可靠,达到设定效果。     

无刷直线直流电机非换相期间推力分析

在电磁弹射过程中,抑制推力波动具有很重要的意义,并且要保持推力恒定,而速度对推力具有很大的影响,因此在本文中重点分析速度对推力的影响.首先建立了非换相期间无刷直线直流电机(BLDCLM)的数学模型,对数学模型进行了求解,推导出电流、推力的解析式;详细分析了PWM调制占空比、速度、反电动势系数对推力的影响,其中反电动势系数的分析结果对电机的设计具有重要的参考意义.最后,通过采用直接搜索的方法获得最优的占空比,来补偿增大的速度引起的推力下降.     

输电线路直流融冰装置中快速短接装置

介绍了一种用于冬季高压覆冰线路的输电线路直流融冰快速短接装置,具有结构新颖、材料合理、重量小、便于安装作业的优势,阐述了其研制和工作背景,介绍了结构设计方案及实际工程中的操作效用。     

直流调速系统的优化与仿真

提出了一种采用计算机仿真进行直流调速系统的优化与仿真的方法：首先,根据直流调速数字控制系统的性能特点,建立了系统仿真模型,然后分析了该系统的缺点所在并进行优化,从而构成一种复合控制系统,以实现对驱动电流的控制作用,最后对优化前后的输出数据进行分析对比,结果表明,采用优化后的控制系统可使输出数据更加精确可靠。     

ZAO透明导电薄膜的制备及性质

ZAO（ZnO：Al）透明导电薄膜是一种具有高的载离子浓度和宽禁带的半导体氧化物，电学和光学性能优异。极具应用前景。本文介绍了ZAO薄膜的制备现状、特性、磁控溅射参数对其电学和光学性质的影响以及今后研究的方向。     

Preparation and characterization of sputtered Cu films containing insoluble Nb

Copper films containing various amounts of insoluble Nb (up to 24.7 at.%) were prepared by r.f. magnetron sputtering. The crystallography and microstructure of the films were investigated for as-deposited and annealed Cu(Nb) thin films. Cu(Nb) thin films are found to consist of non-equilibrium supersaturated solid solution of Nb in Cu with a nanocrystalline microstructure. X-ray diffraction and scanning electron microscope analyses revealed a reduction in the grain sizes of the films with increasing Nb content in the films leading to a grain refinement. The electrical resistivity of as-deposited and annealed Cu(Nb) thin films is found to be low for an Nb content 2.7 at.%. Significant drops in the resistivity were observed for the high Nb contents after annealing at 530 °C which may be due to grain growth and formation of Nb-bearing phase in the film. Microhardness of the films was found to increase with the Nb concentration due to the combined effects of grain refinement and the solute strengthening of Nb.     

Microstructure of direct current and pulse magnetron sputtered Cr-B coatings

Chromium diboride thin films possess desirable combinations of properties (such as high hardness, wear resistance, chemical inertness, high thermal and electrical conductivity), which are attractive for a wide range of potential industrial applications. However, these properties depend strongly on the deposition process and parameters. Investigation of the resultant coating structures could explain certain differences between them, giving important information about the characteristics of the deposition process (which in this particular case is a recently developed method involving magnetron sputtering of loosely packed blended powder targets) and pointing out directions for improvement.In this paper, Cr-B coatings deposited by direct current (DC) and DC-pulse magnetron sputtering of loosely packed blended powder targets are characterised by transmission electron microscopy (TEM) techniques (electron diffraction and bright-field/dark-field imaging). The structures of the coatings deposited with different parameters are investigated and compared, and the effect of oxygen contamination on the structure is discussed.Coatings with an extremely fine, nanocolumnar structure were observed. DC sputter deposited (and generally non-stoichiometric) Cr-B coatings exhibit a short range ordered ‘zone T’ microstructure, while DC-pulse deposited stoichiometric CrB₂ coatings are dense and defect-free, crystalline and show strong preferred orientation.A small amount of contamination by oxygen of the interfacial sub-layers (due to the target material being a powder) of the DC-pulse magnetron sputter deposited stoichiometric CrB₂ (and near-stoichiometric CrB) coatings was found to affect the structure by suppressing nanocolumnar growth and promoting equiaxed, nanometer-sized grains, close to the coating/substrate interface. The majority of the coating however remained nanocolumnar.     

Carbon films deposited by MCECR plasma sputtering

The mirror-confinement-type electron cyclotron resonance (MCECR) plasma source has high plasma density and high electron temperature, and it is quite useful in many plasma processing, and has been used for etching and thin-film deposition. In this paper, the carbon films about 50 nm thickness were deposited on Si (1 0 0) by MCECR plasma sputtering the sintered carbon target with the argon plasma, and its properties were studied. The bonding structure of the film was analyzed by using the X-ray photoelectron spectropscopy (XPS) and the nanostructure was evaluated with the high-resolution transmission electron microscopy (HRTEM). The tribological properties (friction coefficient, wear rate, and wear life) of the film was investigated by using the pin-on-disk tribometer under the conditions that the normal load is 1 N and the sliding velocity is 0.05 m/s. The nanohardness of the films was measured by using the nanoindenter under conditions that the maximum displacement is 30 nm and the maximum load is 500 μN. The optical properties were measured by using the ellipsometer. The residual stress was measured with a surface profilometer. The surface morphology was studied by using the atomic force microscope (AFM).