SIMS investigations of isotope effects at a processed solid surface

A review of the latest research and the new experimental data obtained by the authors on changes in the isotope composition in the near-surface layers of solids in ion scattering processes, ion sputtering, the secondary ion emission, ion implantation, electrolytic saturation by hydrogen isotopes, thermo-diffusion from external source, and chemical solution action is presented. In all these processes appreciable changes in natural isotopic composition of the near-surface layers have been registered. These changes take place among the secondary emitted and reflected particles also. Investigations of these effects have been made by the methods of secondary ion mass spectrometry (SIMS) and secondary ion energy-mass spectrometry (SIEMS). The many-isotopic samples of molybdenum, nickel implanted in copper, various titanium modifications, thin film titanium-aluminum systems and some others have been used. The general regularities in the changes in the isotope composition by different processes are found. Possible mechanisms of these processes are discussed.     

Material properties and growth control of undoped and Sn-doped In2O3 thin films prepared by using ion beam technologies

Undoped (IO) and Sn-doped In₂O₃ (ITO) films have been deposited on glass and polymer substrates by an advanced ion beam technologies including ion-assisted deposition (IAD), hybrid ion beam, ion beam sputter deposition (IBSD), and ion-assisted reaction (IAR). Physical and chemical properties of the oxide films and adhesion between films and substrates were improved significantly by these technologies. By using the IAD method, non-stoichiometry and microstructure of the films were controlled by changing assisted oxygen ion energy and arrival ratio of assisted oxygen ion to evaporated atoms. Relationships between structural and electrical properties in ITO films on glass substrates were intensively investigated by using the IBSD method with changing ion energy, reactive gas environment, and substrate temperature. Smooth-surface ITO films (R_rms ≤ 1 nm and R_p-v ≤ 10 nm) for organic light-emitting diodes were developed with a combination of deposition conditions with controlling microstructure of a seed layer on glass. IAR surface treatment enormously enhanced the adhesion of oxide films to polymer substrate. The different dependence of IO and ITO films' properties on the experimental parameters, such as ion energy and oxygen gas environment, will be intensively discussed.     

MEVVA离子源凸形引出电极的研制

介绍了金属蒸气真空弧(Metal vaporvacuumarc,MEVVA)离子源的凸形引出电极的研制.研究表明,凸形引出电极可以完成离子束的强制发散功能,从而在较短的引出距离和较小的引出电极面积的条件下得到大的束斑和均匀可应用的束流分布.通过对几种不同的电极结构的比较研究,得到了满足应用要求的凸形引出电极.     

Rapid Small-Scale Column Tests for Arsenate Removal in Iron Oxide Packed Bed Columns

Arsenate breakthrough in column studies with a porous granular ferric hydroxide (GFH) was investigated in model waters and groundwaters. In this study, the use of rapid small-scale column tests (RSSCTs) initially designed for simulating the removal of organic compounds by granular activated carbon was extended for arsenate adsorption onto GFH. Adsorption kinetic studies and a comparison of laboratory RSSCT performance versus pilot-scale performance suggests that proportional diffusivity (PD) RSSCT scaling approaches are more valid than constant diffusivity (CD) approaches for arsenate onto GFH. Adsorption densities from column tests (qcolumn) were calculated at the point in the breakthrough curve when arsenate equaled 10 μg/L in the column effluent. For a simulated 2.5 min empty-bed contact time (EBCT), a model water (pH=8.6) had qcolumn values of 0.99 to 1.5 mgAs/gGFH versus 0.02 to 0.28 mgAs/gGFH with a comparable pH and EBCT in a natural groundwater. The differences were attributed to the silica, phosphate, vanadium, and other adsorbable inorganics in the groundwater. At pH 7.6 to 7.8, qcolumn values from PD-RSSCTs in the three natural waters were comparable (1.5±0.3 mgAs/gGFH) and higher than CD-RSSCT qcolumn values (0.57±0.26 mgAs/gGFH) in the three natural waters. All the RSSCTs captured changes in water quality (source water and pH) and operational regimes (e.g., EBCTs) and could be used to aid in the selection and design of arsenic removal media for full-scale treatment facilities.     

Effect of electric charge accumulation on low energy ion implantation in insulators

Charge accumulation at the surface of insulators during low energy ion implantation is related to two processes: ion impinging on the sample and secondary electron emission. Samples composed of a piece of Si (having the size of the ion beam) fixed on the centre of polyethylene (PE) coupons have been implanted with 2.2 keV H₂ ions to a fluence of 2 × 10¹⁶ H/cm². ERD (Elastic Recoil Detection) depth profiles of the implanted ions are shallower with an increase of the PE coupon size. The relative critical Si/PE size to repel all the incident ions is around 1.1 × 1.1 cm²/2.5 × 2.5 cm². The potential of the secondary electron suppressor has been varied from −500 V to +500 V. It changes the secondary electron distribution around the implanted area and, consequently, affects the accumulation of charges at the sample surface. When the potential is 0 V, a uniform ion implantation with little effect of charge accumulation for all sizes of PE coupons is obtained. A two-dimension model has been performed and gives a good explanation for the mechanism of the electric charge neutralisation.     

表征PAN纤维和炭纤维微细结构的HRTEM样品制备方法

为用高分辨透射电子显微术(HRTEM)表征聚丙烯腈(PAN)纤维和炭纤维的微细结构，从纤维性能出发，探讨研碎、离子束减薄和超薄生物切片三种制备方法及其工艺步骤，结合实验结果，对比了三种制备方法的原理、优缺点，提出了制备方法的适用范围和选择原则，并推断适于表征预氧化纤维微细结构的样品制备方法。与生物样品的制备方法类似，把超薄生物切片法引入到纤维材料HRTEM样品制备领域，为系统研究炭纤维微细结构的演变提供了线索。     

离子选择电极法测定氟化物过程中的质量控制

文章从氟离子选择电极的维护及其性能的判断、相应极限、空白电位值、参比电极的维护及其对电位值的影响、滤纸的使用以及溶液的pH值、温度、搅拌、电极浸入深度与位置、测定顺序等影响离子选择电极法测定氟化物的有关因素进行了研究和探讨，并提出对较复杂样品的测定易采用标准加入法以提高测定准确度和精密度。     

Ultraflat indium tin oxide films prepared by ion beam sputtering

Indium tin oxide (ITO) films with a smooth surface (root-mean-square roughness; R_rms=0.40 nm) were made using a combination of the deposition conditions in the ion beam-sputtering method. Sheet resistance was 13.8 Ω/sq for a 150-nm-thick film grown at 150 °C. Oxygen was fed into the growth chamber during film growth up to 15 nm, after which, the oxygen was turned off throughout the rest of the deposition. The surface of the films became smooth with the addition of ambient oxygen but electrical resistance increased. In films grown at 150 °C with no oxygen present, a rough surface (R_rms=2.1 nm) and low sheet resistance (14.4 Ω/sq) were observed. A flat surface (R_rms=0.5 nm) with high sheet resistance (41 Ω/sq) was obtained in the films grown with ambient oxygen throughout the film growth. Surface morphology and microstructure of the films were determined by the deposition conditions at the beginning of the growth. Therefore, fabrication of ITO films with a smooth surface and high electrical conductivity was possible by combining experimental conditions.     

氮离子注入铝的结构研究

采用掠射X射线衍射和AES方法分析了氮离子注入铝的结构和成分,采用TRIM?8程序对注入过程中氮浓度随深度的分布进行了模拟。结果表明:当温度低于300℃,能量为60 keV,用71017 /cm2和1?018 /cm2注量的氮离子注入铝时,在铝的表面生成了六方结构的AlN而不是立方结构的AlN;同时碰撞扩散作用在氮离子注入过程中居主导地位,热扩散作用和辐照增强扩散作用均不明显。     

离子束辅助沉积立方氮化硼的试验研究

运用离子束辅助沉积(IBAD)法在硅片上制备了立方氮化硼(c—BN)薄膜，研究了辅助能量、辅助束流及辅助束中氮气含量等参数对膜中c—BN含量的影响。用红外光谱(FTIR)及X射线光电子能谱(XPS)分析技术对得到的c—BN膜进行了分析。结果表明：合适的离子辅助能量能够获得c—BN含量高的薄膜；膜中c—BN的含量随辅助气体中N2含量的提高而增加；辅助束流对薄膜的形成影响不明显。