离心喷射沉积距离对TiAl基合金组织的影响

研究了γＴｉＡｌ基合金经离心喷射沉积成形时不同喷射距离对合金组织的影响。合金经等离子弧熔炼并重熔后，在真空条件下进行离心喷射沉积成形，喷射沉积距离分别为２００、３００、４００和５００ｍｍ。结果表明，经离心喷射沉积后的合金仍存在着孔隙，且随喷射距离的增加，孔隙率增加，孔隙越细密。成形后的组织结构为层片状组织，其形貌、层片大小也随成形距离的不同而变化     

多壁碳纳米管在不同表面功能基团自组装膜上的沉积

制备了表面功能基团为氨基和甲基的自组装膜,将不同表面功能基团自组装膜浸入多壁碳纳米管分散液中沉积,实验观察到,表面为氨基的APTES自组装膜对分散液中的碳纳米管有静电吸附作用而均匀吸附一层碳纳米管,表面为甲基的OTS自组装膜对分散液碳纳米管有排斥作用力而没有吸附碳纳米管,这一实验对利用单根碳纳米管构造纳米电子器件与纳米机械具有重要意义。     

等离子熔积成形与铣削光整复合直接制造金属零件技术

针对国内外现有的金属直接快速制造技术中存在的制件表面质量不高的瓶颈问题,开发了在制造过程中将等离子熔积增材成形与铣削光整减材复合的金属零件直接快速制造方法。研究该复合制造工艺参数对熔积成形性和形状特性以及热态干铣削刀具和工艺的影响规律,找到合理的工艺条件并用其试制出金属零件原型,为改善快速原型表面质量提供了有效的途径。     

Tribological behavior and graphitization of carbon nanotubes grown on 440C stainless steel

Vertically aligned carbon nanotube (CNT) arrays were directly grown onto 440C stainless steel substrates by plasma-enhanced chemical vapor deposition. Tribological properties of both short and long CNTs samples were studied under normal loads of 10 g, 25 g and 100 g. The CNTs had a steady-state friction coefficient of about 0.2 in humid air. In dry nitrogen, a friction of 0.2 was measured under a load of 10 g while high friction was measured at 25 g and 100 g loads. No significant variation of tribological behavior was measured between the short and long CNTs samples. SEM observations showed that rubbing caused the CNTs to align or lay down along the wear scar. They formed aggregates and were compressed by rubbing, which resulted in layer-structured graphite formations. SEM observation of the wear scars revealed loss of CNT structures accompanied by the appearance of dark areas. Micro Raman spectroscopic studies demonstrated that the dark areas were graphitized CNTs. Shear stress aligned the basal planes of the small graphene sheets in the CNT layers to the low friction orientation and eventually caused formation of more ordered graphite. The tribological formation of interfacial carbon layers increased with increasing stress from higher loads.     

过滤式阴极电弧沉积类金刚石薄膜的性能分析

成功地研制了一套过滤式阴极电弧沉积设备,并利用该设备成功获得了类金刚石薄膜。类金刚石薄膜的扫描电镜分析表明：获得的薄膜在硅基片上是光滑和致密的,在Ｔｉ合金基片上有裂纹,高速钢基片上有微孔。原子力显微镜分析表明：膜层的表面粗糙度与沉积参数密切相关。喇曼光谱研究表明,这种薄膜是典型的无氢类金刚石薄膜,喇曼光谱的高斯分解表明：随着偏压的变化,Ｄ线和Ｇ线的位置μＤ、μＧ向低频移动,半高宽σＤ减小。     

喷射共沉积6066Al/SiCp复合材料的组织与性能

采用喷射共沉积方法和热挤压工艺制备６０６６Ａｌ／ＳｉＣｐ颗粒复合材料,对工艺过程中发生的组织变化和力学性能进行了研究。结果表明,喷射共沉积方法能制备增强颗粒分布均匀,与基体结合好,具有快速凝固组织特征的颗粒增强复合材料锭坯,经过热挤压致密化后,材料组织细小,基体过饱和度明显,析出相在时效过程中迅速析出,粒度细小、弥散,与ＳｉＣ颗粒共同增强基体,力学性能优异。     

Room-temperature growth of high-purity titanium nitride by laser ablation of titanium in a nitrogen atmosphere

Thin films of titanium nitride (TiN) were deposited on glass substrates by KrF excimer laser ablation of titanium over a very broad nitrogen pressure range with different target–substrate distances at room temperature. The as-deposited TiN thin films were analyzed by X-ray diffraction and transmission electron microscopy. It was found that the as-deposited thin films are normally a mixture of TiN and metallic titanium, and the TiN-to-Ti ratio of the as-deposited thin film depends on both the nitrogen pressure and the target–substrate distance. High-purity TiN thin films can be obtained only in a very narrow deposition parameter range. A compound parameter (the product of the nitrogen pressure and the target–substrate distance) is proposed to optimize the deposition of high-purity TiN thin films, and the possible mechanism is also discussed. It was also revealed that the as-deposited TiN thin films are polycrystalline with an average grain size of about 20 nm.     

Use of a theoretical model to investigate RF and DC reactive sputtering of titanium and chromium oxide coatings

An analysis of RF and DC reactive sputtering techniques is presented. The transition between a metal sputtering mode and a compound sputtering mode is usually noticed with a metallic target and an argon+oxygen gas mixture. The so-called hysteresis effect often observed for small amounts of reactive gas is explained in recent models. By considering gas kinetics parameters, it is possible to evaluate quite simple relationships between the main processing parameters. These theoretical calculations enable the prediction and aid the understanding of instability phenomena observed in reactive sputtering. In this paper, the effects of some parameters on the position and size of instability regions are discussed, and the difference between DC and RF reactive deposition is investigated. Simulations and experimental results are compared for the case of titanium and chromium oxide thin films prepared by DC and RF reactive sputtering. The influence of sputtering power on the position of the hysteresis loop is analysed theoretically and experimentally, and the changes observed between the reactive sputtering of titanium and chromium oxide materials are also discussed.     

Enhancement of the properties of pulsed laser-deposited carbon nitride by the synchronisation of laser and N2 gas jet pulses

In surface coatings technology, especially in carbon-based materials, the deposition of energetic species is acknowledged as one of the most important factors in producing hard coatings. Pulsed laser deposition (PLD) of carbon under vacuum creates such energetic species and so carbon films with very high hardness values have been reported. However, when PLD takes place in a gas ambient, the ablated carbon species are decelerated to an extent that depends on the background pressure. As a result, during CN_x deposition, although the carbon species react effectively with N₂ at the beginning of their trajectories, when they reach the substrate they usually do not have sufficient kinetic energy to form a hard coating. In this paper we describe a new technique that combines the intense environment of an expanding N₂ jet with low-pressure PLD to produce CN_x species that travel almost free of collisions and reach the substrate with high kinetic energies. This new configuration is based on the synchronised pulsing of a N₂ jet with the laser pulse. The CN films produced are shown to have an increased film hardness without suppressing the nitrogen content. Furthermore, electron energy-loss spectroscopy shows the layers to have a very high proportion of π bonding, which can be correlated to the existence of sp-hybridised carbon in the form of –CN bonds.