Behavior of laser welded steel in chloride solution studied using difference imaging

In situ imaging techniques in conjunction with electrochemical measurements were used to study the behavior of steel surfaces in simple chloride solutions. The imaging method detected the presence of significantly thicker uniform layers than the original passive oxide. The layers were found to form in chloride after the steel was anodically polarized following reduction of the passive oxide film. The growth of the layer depended on the degree of prior passive oxide reduction. Formation of the layer was also sensitive to underlying structure and enabled rapid location of regions of higher corrosion rate across laser welds in steels.     

旋风管内气相的湍流运动特性

利用二维激光多普勒测速仪(LDV)测量了旋风管内湍流运动的时均速度、脉动速度、能谱函数、微分尺度及湍流耗散等参数，对湍流特性参数分布进行了详细的描述，并初步分析了旋风管内湍流运动特性对颗粒分离的影响.     

Development of three-electrode type micro-electrochemical reactor on anodized aluminum with photon rupture and electrochemistry

Photon rupture with a focused single pulse of pulsed YAG-laser irradiation was used to fabricate an aluminum electrochemical micro-reactor. Porous type anodic oxide film formed on aluminum specimens was irradiated in solutions with a pulsed Nd-YAG laser beam through a convex lens to fabricate micro-channels, micro-electrode, and through holes (for reference electrode, solution inlet, and outlet). During irradiation, specimens were moved by a computer controlled XYZ stage. After irradiation, the surface of the micro-channel and through hole were again treated to form anodic oxide film and the surface of the micro-electrode was treated electrochemically to provide an Au layer. The calculated volume of the micro-reactor including micro-channel and through holes is about 1.5 μl. The cyclic voltammogram of the micro-electrochemical cell was measured in K₃Fe(CN)₆/K₄Fe(CN)₆ with both static and flowing solution at different scanning rates. The anodic and cathodic peak currents were measured and the values depended on scanning rate and ion concentration when the solution was static. With the flowing solution, limiting currents were observed and the anodic limiting current was increased with the cubic root of the solution flow rate.     

用于光刻系统仿真的多边形处理算法

为提高光刻仿真效率,通过对光刻原理进行研究,提出了2种多边形处理算法,将掩模上的多边形图案进行切分优化,将其划分成若干矩形或三角形。在Linux环境下应用C语言设计出一个完整的光刻仿真系统,设计的具体光学参数为:光源波长为193nm,数值孔径为0.3~0.8,部分相干系数可调范围为0.2~0.8,可一次性仿真1μm×1μm到10μm×10μm范围内的45 nm~0.18μm工艺的复杂版图,并通过多次实验进行验证。实验结果表明:原版图图像的边缘细节得到保留,且该算法有效地减少了光刻模拟的计算复杂度与计算时间,整体效率提升20%以上,为当前智能传感器系统芯片的制造节省了宝贵时间。     

数控车床定位精度的激光检测法

数控机床的定位精度是反映数控机床控制特性和加工质量的重要指标,直接决定着零件的加工精度。如果机床的定位精度超差,则会导致加工出的零件不合格,这也直接影响了数控机床性能与功能的发挥。为了快速、准确检测出机床的定位误差并进行误差补偿,阐述了利用双频激光干涉仪进行数控机床定位精度检测的方法。     

一种改进的激光光斑中心检测算法在路基沉降测量中的实现

通过检测激光光斑中心位置偏移的方法来监测路基沉降,是一种便携易布设的方法。而激光光斑中心的检测可以使用重心法、圆拟合、椭圆拟合、高斯曲面拟合。采用重心法运算简单精度低,而采用拟合法精度更高,由于光轴与靶面间存在夹角,光斑更近似看作一椭圆,应用椭圆拟合,辅之以亚像素精度分割,Canny边缘提取后获得了较为理想的沉降监测精度。     

用激光技术测定液体中的声速和等熵压缩性系数

本文应用根据激光光声原理和技术建立的流体热力学性质测量实验装置，测定了七个温度下苯、四氯化碳液体中，苯与四氯化碳二元溶液中的声速（ｕ）、密度（ρ），计算了等熵压缩性系数（Ｋ＿ｓ）等热力学数据。用多项幂级数，以最小二乘法拟合声速ｕ与温度ｔ的数学关系。实测的声速值与文献值比较，相对误差小于０．０４％，等熵压缩性系数与文献数据也相当吻合。     

Model for reaction‐assisted polymer dissolution in LIGA

A new chemically oriented mathematical model for the development step of the LIGA process is presented (LIGA is an acronym for the German words Lithographie, Galvanoformung, and Abformung). The key assumption is that the developer can react with the polymeric resist material to increase the solubility of the latter, thereby partially overcoming the need to reduce the polymer size. The ease with which this reaction takes place is assumed to be determined by the number of side‐chain scissions that occur during the X‐ray exposure phase of the process. The dynamics of the dissolution process are simulated by the solution of the reaction diffusion equations for this three‐component, two‐phase system, the three species being the unreacted and reacted polymers and the solvent. The mass fluxes are described by multicomponent diffusion (Stefan–Maxwell) equations, and the chemical potentials are assumed to be given by the Flory–Huggins theory. Sample calculations are used to determine the dependence of the dissolution rate on key system parameters such as the reaction rate constant, polymer size, solid‐phase diffusivity, and Flory–Huggins interaction parameters. A simple photochemistry model is used to relate the reaction rate constant and the polymer size to the absorbed X‐ray dose. The resulting formula for the dissolution rate as a function of the dose and temperature is fit to an extensive experimental database to evaluate a set of unknown global parameters. The results suggest that reaction‐assisted dissolution is very important at low doses and low temperatures, the solubility of the unreacted polymer being too small for it to be dissolved at an appreciable rate. However, at high doses or at higher temperatures, the solubility is such that the reaction is no longer needed, and dissolution can take place via the conventional route. These results provide an explanation for the observed dependences of both the rate of dissolution and its activation energy on the absorbed dose. © 2005 Wiley Periodicals, Inc. J Appl Polym Sci 97: 25–37, 2005     

Evaluation of nucleation activation energy in metal CVD processes

A new approach to evaluate activation energy for nucleation in metal chemical vapor deposition (CVD) is presented. Deposition is performed by laser induced chemical vapor deposition (LCVD) using a low laser power and a high scan speed, so that only discrete particles in the initial nucleation stage are formed. The nucleation activation energy is then obtained from a relationship between the laser-induced surface temperature distribution and the particle distribution. The activation energy is directly related to the nucleation barrier, and hence the difference in the nucleation activation energies on different substrates may be used to explain the chemical selectivity which is often observed during metal CVD processes. This approach is experimentally applied to aluminum CVD using dimethylethylamine alane (DMEAA) precursor, and its nucleation activation energy is found to be 25kcal/mol on silicon surface.