Ni(pz)_4Br_2型络合物的光、热、磁性质的理论研究

本文利用d8（D*（4h））对称性与d8（D*（2h））对称性线性叠加d8［（1－C2）D*（4h）＋C2D*（2h）］作为Ni2+离子的环境品场，借助于强场能量矩阵和全组态混合EPR理论对Ni（pz）_4Br_2型络合物的吸收光谱、肖特基（Schottky）热容量和顺碰碰化车进行了统一计算和理论分析．理论结果与实验观测值符合甚好．从而对Ni（pz）_4Br_2的光、热、磁性质作出了完整、合理的理论解释．     

空气中烧成的镍导体及其应用

将空气中烧成的镍导体用于散热制冷片制作工艺中，可降低成本，提高合格率。通过实验得到的最佳值为：镍导体中４号玻璃（ＳｉＯ２＞３０，Ｂ２Ｏ３＞１０，ＰｂＯ＜５５，ＴｉＯ２少许）的含量４．５％，化学镀镍时间５０ｍｉｎ，方阻４７．５ｍΩ／□，附着力８．１Ｎ／ｍｍ２。     

改善激光熔覆镍基合金和陶瓷硬质相复合涂层性能的研究

激光熔覆镍基合金和陶瓷硬质相（WC）复合涂层过程中存在的问题是容易形成缺陷和开裂。通过调整WC的比例和分布,合理的工艺参数,增设韧性良好的过渡层,并加入微量混合稀土氧化物,对发生马氏体相变硬化的热影响区进行激光回火处理等,以获得无裂纹缺陷,金相组织均匀,并具有硬度平滑过渡的优质熔覆层。     

Effect of annealing temperature on Ti/Al/Ni/Au ohmic contacts on undoped AlN films

The Ti/Al/Ni/Au metals were deposited on undoped AlN films by electron beam evaporation. The influence of annealing temperature on the properties of contacts was investigated. When the annealing temperatures were between 800 and 950℃, the AlN-Ti/Al/Ni/Au contacts became ohmic contacts and the resistance decreased with the increase of annealing temperature. A lowest specific contacts resistance of 0.379 Ω·cm² was obtained for the sample annealed at 950℃. In this work, we confirmed that the formation mechanism of ohmic contacts on AlN was due to the formation of Al-Au, Au-Ti and Al-Ni alloys, and reduction of the specific contacts resistance could originate from the formation of Au₂Ti and AlAu₂ alloys. This result provided a possibility for the preparation of AlN-based high-frequency, high-power devices and deep ultraviolet devices.     

3D Self‐Supported Fe‐Doped Ni2P Nanosheet Arrays as Bifunctional Catalysts for Overall Water Splitting

The development of highly efficient bifunctional electrocatalysts for both hydrogen evolution reaction (HER) and oxygen evolution reaction (OER) is crucial for improving the efficiency of overall water splitting, but still remains challenging issue. Herein, 3D self‐supported Fe‐doped Ni₂P nanosheet arrays are synthesized on Ni foam by hydrothermal method followed by in situ phosphorization, which serve as bifunctional electrocatalysts for overall water splitting. The as‐synthesized (Ni_0.33Fe_0.67)₂P with moderate Fe doping shows an outstanding OER performance, which only requires an overpotential of ≈230 mV to reach 50 mA cm^?2 and is more efficient than the other Fe incorporated Ni₂P electrodes. In addition, the (Ni_0.33Fe_0.67)₂P exhibits excellent activity toward HER with a small overpotential of ≈214 mV to reach 50 mA cm^?2. Furthermore, an alkaline electrolyzer is measured using (Ni_0.33Fe_0.67)₂P electrodes as cathode and anode, respectively, which requires cell voltage of 1.49 V to reach 10 mA cm^?2 as well as shows excellent stability with good nanoarray construction. Such good performance is attributed to the high intrinsic activity and superaerophobic surface property.     

机械合金化19Cr-14Ni不锈钢粉末激光熔覆层的组织和性能

激光熔覆所用粉末材料的制备方法主要是雾化法。为探索激光熔覆专用材料的制备新方法,将以单元素粉末的形式,按照19Cr-14Ni不锈钢的成分来配制混合粉,并将该混合粉机械合金化45h,在45#钢板上分别将采用上述两种不锈钢粉末进行激光熔覆。采用X射线衍射(XRD)、扫描电镜(SEM)/能谱仪(EDS)、腐蚀电化学等方法研究熔覆层的相组成、微结构和耐蚀性。结果表明,与雾化粉体激光熔覆层相比,机械合金化粉体激光熔覆层的枝晶得到细化,其组织呈连续网状分布,Cr元素的枝晶间偏析得以改善;与雾化粉体相比,机械合金化能提高粉体熔覆层的耐蚀性能,但其硬度略有降低。     

镍基合金激光熔覆层组织特征研究

利用同步送粉法在Q235低碳钢表面激光熔覆了镍基合金涂层.用扫描电镜、X射线衍射仪、能谱仪、显微硬度计对熔覆层的微观组织、物相组成、成分分布及显微硬度进行了测定与分析.结果表明:在激光功率3kW,扫描速度300mm/min,光斑直径3mm等工艺条件下的激光熔覆质量良好,无气孔、裂纹等缺陷,且与基材呈良好的冶金结合;熔覆...     

利用Ni纳米岛模板制备半极性晶面GaN纳米柱

报道了在GaN表面以Ni纳米岛结构作为模板,利用电感耦合等离子(ICP)刻蚀制备GaN纳米柱的研究结果。原子力显微镜(AFM)测试结果表明,金属Ni薄膜在快速热退火(RTA)作用下形成了平均直径和高度大约分别为325 nm和70 nm的纳米岛状结构。通过电子扫描显微镜(SEM)照片看出,以GaN表面所形成的Ni纳米岛作为模板图形,通过控制ICP刻蚀时间,在一定的刻蚀时间内(2 min)获得有序的并拥有半极性晶面的GaN纳米柱阵列。这种新颖的半极性GaN纳米柱作为氮化物量子阱或者超晶格结构的生长模板,可以有效减小甚至消除极化效应,提高光电子器件的效率和性能。     

Ni纳米粒子掩膜用于提高GaN基LED出光率的研究

以无水乙醇为溶剂、柠檬酸为分散剂,用超声分散技术配制Ni纳米粒子分散液;将分散液用旋涂的方法在GaN基发光二极管(LED)的ITO电流扩展层上制备单层Ni纳米粒子掩膜,采用ICP(inductively coupledplasma)干法刻蚀技术在ITO层上制作出表面粗化的结构。在20 mA工作电流下,与普通GaN基LED相比,这种ITO表面粗化的GaN基LED芯片发光强度提高了30%,并且对器件的电性能影响很小。结果表明,该表面粗化技术是一种工艺简单、成本低和能有效提高LED发光效率的方法。     

Ce和Ni共掺杂BiFeO3薄膜的光学和铁磁性能

利用溶胶-凝胶工艺在石英衬底上制备了镍铈共掺杂铁酸铋Bi_(0.9)Ce_(0.1)Fe_(1-x)Ni_xO_3(xBCFNO,x=0,0.03,0.05,0.07)薄膜.X-射线衍射(XRD)测试表明所有样品的晶体结构都为四方钙钛矿铁酸铋BiFeO_3结构.由于Ce和Ni共掺杂,XRD显示,峰位置发生偏移.主峰(012/110)峰值在Ni含量x=0.05时峰值最大.扫描电子显微镜(SEM)测试也显示x=0.05时晶粒最大,结晶度最好.光学透射测试显示xBCFNO薄膜x=0.03时的光学禁带宽度最小,为2.14 eV.铁磁测试结果表明镍铈共掺杂可以进一步提高铁酸铋的室温铁磁性.