真空紫外光激发下Tb~(3+)激活的稀土正硼酸盐的发光

报导了Tb3+、Ce3+激活的稀土正硼酸盐的真空紫外光谱。分析了Ce3+的4f75d能级随基质结构、基质阳离子的变化,讨论了温度、Tb3＋离子的浓度对发光的影响以及Ce3＋－Tb3＋间的能量传递.     

First Measurement of VUV Spectroscopy Using 1 m Normal Incidence Spectrometer on HL-2A

A 1 m vacuum ultraviolet （VUV） spectrometer with temporal and spatial resolution was developed for impurity study of HL-2A tokamak. The instrument is equipped with two concave gratings blazed at 80 nm and 150 nm, respectively, and a windowless back-illuminated charge coupled device （CCD） detector of 256 × 1024 pixels. Tile total wavelength coverage of spectrometer is 30～ 320 nm with a spectral resolution of 0.015 nm at a width of entrance slit of 10 μm. A portion of this range is observed during a plasma discharge with a spectral range of 20 nm. The minimum integration time of the detector system is about 6.7 ms for each frame in a full binning mode. Using a space-resolved slit located between the entrance slit and the grating a radial profile on the vertical direction with a range of 400 mm can be obtained. The primary results were successfully obtained with high signal-to-noise ratio and good spectral resolution, which demonstrated the instrument functions very well.     

真空紫外激发下Pr 3+掺杂的几种硼酸盐体系的低温光谱特性

研究了SrB4O7：Pr^3＋，LaB3O6：Pr^3＋及LaMgB5O10：Pr^3＋低温下的光谱．从发射谱上看这三种发光材料都可以产生光子级联发射，对照Pr^3＋离子的能级图对各发射峰进行了指认．因为硼酸盐体系中较高的声子振动能量导致了^3P0和^1D2能级间的无辐射弛豫，所以级联发射的第二步过程^3P0→^3HJ发光非常微弱或基本没有．在LaJ32O6及LaMgB5O10的激发谱上除了4f5d吸收带外还观测到了Pr^3＋离子的^3H4→^1S0跃迁，由此在这两种材料中确常TPr^3＋离早的^1S0能缀相对千昌低的4f5d能缀的付詈．     

Observation of filament-like structures in ELMy H-mode plasma with a VUV imaging system developed on the EAST tokamak

On the EAST tokamak, filament-like structures have been observed in ELMy H-mode discharges with a high-speed vacuum ultraviolet (VUV) imaging system. The topos, chronos and their weight can be obtained simultaneously by performing the so-called singular value decomposition (SVD) analysis of raw VUV imaging data. The fluctuation amplitude is observed to be suppressed and enhanced gradually in the edge localized mode (ELM) crash and pedestal recovery phase in the chronos, respectively, while filament-like structures can only be found in the pedestal recovery phase on the topos. The mode structure, i.e. m/n=36/9 (m and n are the poloidal and toroidal mode number, respectively) with ρ₀=0.95, w₀=0.07 (ρ₀and w₀ denote the mode location and mode width, respectively) is derived by a comparison of the synthetic images and the experimental imaging data.     

V型耦合式刀片低能束流位置探测器及其性能检测

基于合肥国家同步辐射实验室(NSRL)低能量真空紫外光源的特点,研制了耦合式刀片低能束流位置探测器,用于在线监测波荡器辐射出的低能量真空紫外相干光源的稳定性.探测器采用V型耦合式刀片作为探针,基于错位安装、倾斜嵌入被测光束边缘和直流偏压捕集自由电子等技术有效增强光电效应,提高探针的响应灵敏度和探测器监测精度.介绍了耦合式刀片低能束流位置探测器的结构特点、探测原理和性能测试,在线监测了NSRL波荡器光源的稳定性,获得了一系列有价值的试验数据.结果表明:该探测器能完成NSRL-0.8GeV低能储存环上插入件光源的在线监测,满足对改造后的新光源各插入件辐射光束位置稳定监测的要求.     

UV-based advanced oxidation processes for the treatment of odour compounds: Efficiency and by-product formation

The occurrence of the taste and odour compounds geosmin and 2-methyl isoborneol (2-MIB) affects the organoleptic quality of raw waters from drinking water reservoirs worldwide. UV-based oxidation processes for the removal of these substances are an alternative to adsorption and biological processes, since they additionally provide disinfection of the raw water. We could show that the concentration of geosmin and 2-MIB could be reduced by VUV irradiation and the combination of UV irradiation with ozone and hydrogen peroxide in pure water and water from a drinking water reservoir. The figure of merit EE/O is an appropriate tool to compare the AOPs and showed that VUV and UV/O₃ yielded the lowest treatment costs for the odour compounds in pure and raw water, respectively. Additionally, VUV irradiation with addition of ozone, generated by the VUV lamp, was evaluated. The generation of ozone and the irradiation were performed in a single reactor system using the same low-pressure mercury lamp, thereby reducing the energy consumption of the treatment process. The formation of the undesired by-products nitrite and bromate was investigated. The combination of VUV irradiation with ozone produced by a VUV lamp avoided the formation of relevant concentrations of the by-products. The internal generation of ozone is capable to produce ozone concentrations sufficient to reduce EE/O below 1 kWh m⁻³ and without the risk of the formation of nitrite or bromate above the maximum contaminant level.     

Degradation of polyimide film under vacuum ultraviolet irradiation

The degradation of PI film irradiated with VUV in a wavelength of 5 to 200 nm is investigated. The results show that transparency of PI film decreases obviously after irradiation and more obviously for the film irradiated with VUV of higher intensity. In addition, the absorption line red‐shifts for the PI film. The XPS and FTIR analyses results indicate that decarbonylation and the condensation of the benzene group take place under the irradiation and that carbonification takes place under 100 VUV suns. The change of optical property could be attributed to the stabilizing of the conjugation group and as well as to the carbonification to some extent. The character of VUV on polymer degradation is discussed. © 2004 Wiley Periodicals, Inc. J Appl Polym Sci 94: 1370–1374, 2004     

Plasma treatment and adhesion properties of a rubber-modified polypropylene

In this study, cold, glow-discharge plasmas were used as a pretreatment method for the lacquering of rubber-modified polypropylene plates. This type of material is also referred to as thermoplastic polyolefins (TPOs). The effects of plasma treatments at radio- and microwave frequencies (RF and MW) and in combined MW-RF modes were studied, as were the effects of plasma power-to-gas flow (P/F) ratios and of discharges in oxygen, nitrogen, air, argon, and hydrogen. Surface characterization was carried out by contact angle measurements with water as the wetting liquid, and by XPS analyses. The adhesion between a two-component polyurethane (PUR) lacquer and plasma-treated TPO plates was evaluated by 180°-peel testing. The wettability of TPO surfaces was not affected by the plasma frequency or the P/F ratio, while the influence of the discharge gas was noticeable. Furthermore, no correlation between wettability and peel force could be found. Instead, lacquer adhesion was shown to be highly dependent on the P/F ratio and on the choice of discharge gas. The peel forces were found to be in the range of 0.1-35 N/15 mm, and the locus of failures was shown (by visual inspection or by XPS analysis) invariably to be in the TPO substrate. Electromagnetic radiation, most likely vacuum-ultraviolet (VUV) emission (<200 nm), was proposed to be a critical factor in plasma treatments. Attributed to VUV radiation was the creation of radicals in the TPO substrate; these lead to severe chain scission reactions and thereby govern the cohesive strength of the near-surface region of the substrate.     

Surface modification of poly(tetrafluoroethylene-co-hexafluoropropylene) with vacuum UV radiation from rotating helium dc arc plasmas

Treatment of poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP) with vacuum ultraviolet (VUV) radiation from high pressures of helium in rotating dc arc plasmas was investigated. X-ray photoelectron spectroscopy (XPS) detected defluorination and appearance of the functional groups (C=O, O–C=O and C–O) on the surface. Fourier transform infrared (FT-IR) spectroscopy showed the appearance of a band at 1884 cm^?1 indicating the formation of the carboxylic acid fluoride moiety, –(C=O)–F. Improvement in film wettability was observed by contact angle measurements while SEM micrographs showed an increased amount of cracking on the surface with VUV exposure. Adhesion measurements of Cu sputter-coated onto the photo-modified surfaces resulted in failure within the fluoropolymer (cohesive failure) and not at the Cu-fluoropolymer interface. Cohesive failure occurred with shorter treatment times than for VUV exposure downstream from low pressure Ar microwave plasmas.