Conformal aluminum oxide coating of high aspect ratio structures using metalorganic chemical vapor deposition

The metalorganic chemical vapor deposition of aluminum oxide has been studied over a wide process parameter range. Electrical properties of as-grown and annealed layers have been investigated using planar aluminum/aluminum oxide/silicon capacitors. The best processing conditions resulted in a leakage current of 10 nA/cm² at an equivalent oxide thickness of 3.6 nm. In addition, the film conformality was evaluated on silicon trench structures with aspect ratios of up to 60. Excellent step coverage of over 90% (thickness at trench bottom to thickness at trench middle) was achieved at temperatures below 400 °C and a pressure of 100 Pa. After annealing the electrical properties of these layers, analyzed on planar test structures, were comparable to the results obtained at higher deposition temperature.     

Fabrication of Er3+/Pr3+ Co-doped soda-lime glass thin films using RF magnetron sputtering method and optical property characterization

Er^3+/Pr³⁺ co-doped soda-lime glass thin films have been fabricated using RF magnetron sputtering method and their structural and optical properties have been studied. Deposition rate, crystallinity, and composition of glass thin films were investigated by scanning electron microscopy, transmission electron microscopy, and electron probe micro area analysis. Refractive index, birefringence and binding characteristics have been investigated using a prism coupler and X-ray photoelectron spectroscopy. Er³⁺/Pr³⁺ co-doped soda lime glass thin films were prepared by changing substrate temperature (room temp. ∼550^∘C), RF power (90 W–130 W), and Ar/O₂ gas flow ratio at processing pressure of 4 mTorr. Glass thin films could be obtained at the optimized processing condition at 350^∘C, RF power of 130 W, and gas flow of Ar:O₂ = 40:0 with maximum deposition rate of 1.6 μm/h. Refractive index and birefringence increased from 1.5614 to 1.5838 and from 0.000154 to 0.000552, respectively, as the content of Pr³⁺ increased. Binding energy of Pr3d also increased as the content of Pr³⁺ increased.     

Substrate effect on in-plane ferroelectric and dielectric properties of Ba0.7Sr0.3TiO3 thin films

Heteroepitaxial Ba_0.7Sr_0.3TiO₃ thin films were grown on (LaAlO₃)_0.3(Sr₂AlTaO₆)_0.35 (001) (LSAT) and SrTiO₃ (001) (STO) single crystal substrates using pulsed laser deposition (PLD). X-ray diffraction characterization revealed a good crystallinity and a pure perovskite structure for films grown on both LSAT and STO substrates. The in-plane ferroelectric and dielectric properties of the films were studied using interdigital electrodes (IDE). The film grown on LSAT substrate exhibited an enhanced in-plane ferroelectricity, including a well-defined P-E hysteresis loop with the remnant polarization P _r = 10.5 μC/cm² and a butterfly-shaped C-V curve. Nevertheless, only a slim hysteresis loop was observed in the film grown on STO substrate. Curie temperature T _c of the film grown on LSAT substrate was found to be ∼105^∘C, which is nearly 70^∘C higher than that of the bulk Ba_0.7Sr_0.3TiO₃ ceramics. T _c of the film grown on STO substrate has almost no change compared to the bulk Ba_0.7Sr_0.3TiO₃ ceramics. The dielectric tunabilities were found to be 64% and 52% at 1 MHz for the films grown on LSAT and STO substrates, respectively.     

Substrate effect on the temperature coefficient of resistance of La0.7Ca0.3MnO3 thin films prepared by metal organic deposition

Epitaxial La_0.7Ca_0.3MnO₃ (LCMO) thin films were successfully prepared by the metal-organic deposition process on various (001) single-crystal substrates: MgO, LaAlO₃ (LAO), SrTiO₃ (STO), and (LaAlO₃)_0.3-(SrAlTaO₆)_0.7 (LSAT). The crystallinity and the epitaxial growth of the LCMO films were characterized by X-ray diffraction (θ − 2θ scans and pole-figure analysis). The temperature dependence of the resistance of the LCMO/LSAT, LCMO/STO and LCMO/LAO films exhibit typical characteristics with a transition from the paramagnetic-insulator state to the ferromagnetic-metallic state at a temperature peak (T _p ) ranging from 258 to 270 K. However, the LCMO/MgO films exhibited a semiconducting behavior without any transition. Based on the R(T) measurement, we calculated the temperature coefficient of resistance (TCR) for a bolometric application and we obtained 22%/K, 10.2%/K and 27.5%/K for the film grown on the LSAT, STO and LAO substrates, respectively. This difference in the TCR properties is related to the strain induced by the lattice mismatch between LCMO and the different substrates.     

Pyroelectric properties and X-ray photoelectron spectroscopic study of R.F. magnetron-sputtering-derived PZT thin films deposited on various interlayers

PZT thin films and interlayers were fabricated by the radio frequency (r.f.) Magnetron-sputtering from the Pb_1.1Zr_0.53Ti_0.47O₃, PbO and TiO₂ target. As a result of the XPS depth profile analysis, we can confirm that the substrate temperature affects the oxidation condition of each element of interlayers and the PZT film. Compared to the PZT/Pt structure, the dielectric and pyroelectric properties of PZT thin films inserted by interlayers were measured to a relatively high value. In particular, the PZT/PbO structure had the highest pyroelectric properties (P = 189.4 μC/cm²K; F _D = 12.7×10⁻⁶ Pa^−1/2; F _V = 0.018 m²/C).     

Deposition and gas sensing properties of tin oxide thin films by inductively coupled plasma chemical vapor deposition

Tin oxide thin films have been deposited by a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system in order to explore its application as an alternative approach for thin film gas sensor preparation. The as-deposited SnO₂ films were of polycrystalline structure with nano-size grains of 12 nm. The SnO₂ films exhibited a maximum sensitivity of 43 to 1000 ppm H₂ at an optimum operating temperature of 350^∘C. The response time of the SnO₂ films was 12 s and full recovery was achievable.     

Initiation of tantalum oxide pores grown on tantalum by potentiodynamic anodic oxidation

The initiation and growth of porous oxide on Ta was investigated in mixed H₂SO₄/HF electrolytes. Under selected potentiodynamic anodic oxidation conditions the formation of nearly uniform porous Ta₂O₅ layer was observed. The porous Ta₂O₅ layers consist of self-organized pore arrays with single pore diameters ranging from 2 to 10 nm. The morphology and the thickness of the layer depend strongly on the applied potential, the scan rate and on HF presence. The composition of the porous oxide layer is Ta₂O₅.     

快速循环热处理对(Co0.35Fe0.65)99O1薄膜磁性能的影响

针对(Co0.35Fe0.65)99O1薄膜,研究了两种不同热处理工艺对其磁性能的影响。结果表明:快速循环热处理可以改善高磁矩(Co0.35Fe0.65)99O1薄膜磁性能,在450℃几个快速循环热处理后,沉积薄膜的矫顽力从105下降到3 Oe,电阻率下降到70%,a-Fe (Co)相晶粒尺寸可以减小到15~35 nm,该处理方法较以往的热处理更能改善软磁薄膜的性能。     

Fabrication and properties of ZAO powder, sputtering target materials and the related films

Aluminum-doped zinc oxide （ZnO：Al）, abbreviated as ZAO, is a novel and widely used transparent conductive material. The ZAO powder was synthesized by chemical coprecipitation. The ZAO ceramic sputtering target materials were fabricated by sintering in air, and ZAO transparent conductive films were prepared by RF magnetron sputtering on glass substrates. XRD proved that such films had an orientation of （002） crystal panel paralleled to the surface of the glass substrate. The average transmittance of the films in the visible region exceeded 80%.     

Investigation on the thermal decomposition of aged La2O3

The thermal decomposition process of air-aged La203 in argon atmosphere was studied using nonisothermal TG-DSC. X-ray diffraction and TG-DSC analysis showed that the aged powder was composed of La（OH）3 with small amounts of oxycarbonate. The decomposition process of air-aged La2O3 involves the two-step decomposition of La（OH）3 and the decomposition of oxycarbonate. The kinetic analysis of the two-step decomposition of La（OH）3 was carried out using Coats-Redfern and isoconversion （Ozawa） methods. The kinetics of the two-step decomposition can be described in terms of the nucleation and growth model A （m=1.5, m is the model parameter） and A （m=2.5）, respectively. The apparent activation energy for the first step is 136-144 （Coats-Redfern） and 137-164 kJ/mol （isoconversion）. The apparent activation energy for the second step is 191-194 （Coats-Redfern） and 186-213 kJ/mol （isoconversion）.