Monodisperse polymer/metal composite particles by electroless chemical deposition: Effect of surface functionality of polymer particles

Micron‐sized polymer particles were coated with layers of nickel compounds by plating electrolessly in the presence of aqueous solutions of nickel chloride, sodium hypophosphite, sodium citrate, and ammonium chloride at elevated temperature. The uniform functional polymer particle could be obtained by seeded polymerization. To investigate the effect of surface functionality on the conditions for nickel deposition, the polymer particle was functionalized with the thiol group. From morphological observation, it was found that the mode of nickel deposition was greatly dependent on the surface functionality of the polymer particle. © 2002 Wiley Periodicals, Inc. J Appl Polym Sci 87: 420–424, 2003     

化学镀法制备SiC/Cu金属陶瓷复合粉体工艺的研究

为改善SiC与其他金属的结合性能，采用化学镀法在SiC粉体上镀Cu，制备包覆型陶瓷颗粒。通过精选、粗化、敏化、活化表面镀前处理，用硫酸铜镀液成功地得到在SiC上均匀镀Cu的包覆粉体，利用Olympus显微镜观察到包覆程度可达95％，通过详细讨论镀液的配方、pH值、镀液与SiC粉体的配比与对包覆效果的影响，最终得到硫酸铜用量控制在10—15g／l能得到我们所控制的沉积反应速度；包覆反应过程中pH值控制在11—13之间较为合适。     

酸性镀锡液的新进展

从近几年美国发明专利的角度扼要综述酸性镀锡液的新进展。说明酸性镀锡液由氟硼酸盐型发展为烷基磺酸盐型的改进过程。列出参考文献９篇。     

化学镀镍-磷合金机理的研究

通过对化学镀Ni—P合金过程中线性极化电阻及沉积速度的测量,得出极化电阻的倒数1/Rp与电流密度i呈线性关系。用阳极极化曲线的方法,较详细地研究了次磷酸钠在镍电极上的氧化过程。提出了化学镀Ni—P合金是按电化学机理进行的。     

化学镀镍复合配位剂的研究

采用对比试验和正交试验,以镀速、孔隙率、镀液稳定性和镀层硬度为评价指标,研究了单一配位剂及复合配位剂对镀液和镀层性能的影响,得到了复合配位剂的最优组合:8.4g/L乳酸,6g/L苹果酸,9g/L柠檬酸,8g/L丁二酸,1g/L丙酸。采用该复合配位剂的工艺配方可提高镀液使用寿命,获得性能优良的镀层。     

非金属电镀用导电漆的研制

介绍了导电漆、作为导电填料的片状镀银铜粉的制备工艺流程。分别研究了漆膜表面单位电阻与镀银铜粉的含量及其粒径以及钛酸酯偶联剂的含量之间的关系。结果表明,当镀银铜粉的粒径为400目、质量分数在57%~65%之间,钛酸酯偶联剂的质量分数为10%时,所得涂膜的导电性能最佳。加入含C-18的油酸可以使导电漆长期贮存而电阻值不变。经检测,所得涂膜具有良好的性能:附着力1级,硬度1 H,柔韧性1 mm,冲击强度50 kg/cm2,膜厚10~15μm,漆膜表面每厘米电阻0.15Ω,每分米电阻0.47Ω。指出了导电漆应用过程中的注意事项。     

选择性螯合滴定法测定电镀液中的锡铜铅

提出了测定电镀液中锡铜铅的一个简易快速螯合滴定法.用EDTA螯合锡(Ⅳ)、铜(Ⅱ)、铅(Ⅱ)和其它金属离子,然后分别用三羟基苯甲酸、巯基丁二酸和氨荒丙酸解蔽.释放出的EDTA,用锌标准溶液反滴定(XO-CPB为混合指示剂).终点变化相当敏锐.研究了测定锡、铜、铅时一般共存离子的干扰.此法已被成功地用于测定锡-铜-铅合金电镀液和镀层锡铜铅合金中的锡、铜和铅.     

钢铁件无熔盐覆盖光亮热浸镀铝-一种无污染镀铝新工艺

提出了一种无污染光亮镀铝工艺。在熔融的热浸镀铝液中添加少量（小于0．1％）抗氧化合金以代替熔盐覆盖。观察了镀铝件的外观、微观结构，并测试了其各项性能，该工艺所得镀铝件光亮洁白，具有优良的耐磨、耐蚀及抗高温氧化性能。     

酸性低温脉冲化学镀镍磷合金的性能

介绍了低温脉冲化学镀镍的研究工作。结果表明：由于电脉冲的催化作用，使得酸性化学镀镍的施镀温度降低至５０℃时，仍具有１１μｍ／ｈ的沉积速度，镀层磷含量达１０．４８ｗｔ％，结构组织仍为非晶态。其镀层的性能与８０℃施镀的化学镀镀层性能相当。     

Electroless Plating of Copper on Fluorinated Polyimide Films Modified by Plasma Graft Copolymerization and UV‐induced Graft Copolymerization with 4‐Vinylpyridine

Surface modification of two types of fluorinated polyimide (FPI) films, either by plasma polymerization and deposition of 4‐vinylpyridine (4VP) or by UV‐induced graft copolymerization with 4VP under atmospheric conditions, was carried out for adhesion enhancement with the electrolessly deposited copper. X‐ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FTIR) results revealed that the pyridine groups in the plasma polymerized 4VP (pp‐4VP) layer could be preserved to a large extent under proper glow discharge conditions. The grafted 4VP layer with well‐preserved pyridine groups was used not only as the chemisorption sites for the palladium complexes (without the need for prior sensitization by SnCl₂) during the electroless plating of copper, but also as an adhesion promotion layer for the electrolessly deposited copper. The T‐peel adhesion strength of the electrolessly deposited copper with both the 4VP plasma‐polymerized FPI (pp‐4VP‐FPI) film and the 4VP graft‐copolymerized FPI (4VP‐g‐FPI) film was much higher than that of the electrolessly deposited copper with the pristine or the Ar plasma‐treated FPI films. The high adhesion strength between the electrolessly deposited copper and the surface‐modified FPI film was attributed to the fact that the plasma‐polymerized and the UV graft‐copolymerized 4VP chains were covalently tethered on the FPI surfaces, as well as the fact that these grafted 4VP polymer chains were spatially and reactively distributed into the copper matrix.