Powder Deposition in Three Parallel-Oriented Dies of Different Shapes

Uniformity of bulk density distribution during the die filling process is required to minimize quality problems, such as distortion and cracking, for powder compacts. Understanding the die filling process is necessary in ensuring a uniform powder deposition. The second-generation pressure deposition tester (PDT-II) was used to investigate the deposition process and final pressure distribution of powder filling in toroidal, cylindrical, and E-shaped dies. All tests were conducted using a spray-dried free-flowing granular powder. The results indicated that for toroidal dies: (1) the area around 0° orientation (the leeward end) had the highest pressure values (1186.7 to 2498.0 Pa), with the average pressure values of the remaining area 353.7-648.0 Pa; (2) the pressure distribution was symmetrical about the centerline parallel to the feed shoe movement direction; (3) the highest feed shoe speed (500 mm/s) led to the most nonuniform pressure distribution among the three speeds; (4) higher feed shoe speed did not always result in higher final pressure values; and (5) the right die tended to have higher final pressure values (215.0 to 2498.0 Pa) than the center die (95.4 to 2052.5 Pa). For E-shaped dies: (1) the final pressure values of the middle leg (308.9 to 760.7 Pa) were higher than those of the left and the right legs (148.9 to 530.3 Pa); (2) the area along the backside had the highest final pressure value (1054.6 to 1303.8 Pa); (3) the pressure distribution was symmetrical about the centerline parallel to the feed shoe movement direction; and (4) neither the center die nor the right die always had higher pressure values than the other one at all locations. Comparison between cylindrical and toroidal dies indicated that: (1) neither of the two die shapes (cylinder and toroid) led to consistently higher or lower final pressure values at all locations and (2) for all three feed shoe speeds, the toroidal die had higher average final pressure values in the 0° orientation.     

The process window for diamond deposition from the vapor phase with sulfur in the C–H–O feed gas mixtures

Theoretical predictions using a modified radical species ternary diagram for C–H–O system indicate that addition of sulfur expands the C–H–O gas phase compositional window for diamond deposition. Sulfur addition to no-growth domain increases the carbon super-saturation by binding the oxygen and the addition of sulfur to the non-diamond domain reduces the heavy carbon super-saturation by decreasing C_nH_m species concentration in the gas phase. The overall effect of sulfur addition to gas phase mixtures is characterized as that of oxygen addition to the C–H system, i.e. expansion of the compositional window over which diamond can be deposited from the gas phase. In addition, the increasing sulfur concentration to diamond domain feed gases beyond 2000 ppm did not affect the steady state gas phase composition but the quality of diamond was reduced.     

Prediction of axial velocity profiles and solids hold-up in a rotary kiln

Axial bed depth profiles were experimentally measured in a rotary kiln containing ilmenite particles under steady state and transient conditions. The variables include feed rate of solids, inclination and rotational speed of the kiln. and dam height. The variation of the axial velocity with kiln axis was estimated. The semi-experimental model proposed by Perron and Bui (1990) was modified to include the effect of the variables of the present study. The mean residence time of solids was estimated from the fractional hold-up and expressed in terms of the process variables. The transients induced by a step change in any of the operating conditions were measured as variation of discharge rate of solids with time.     

金刚石薄膜中晶粒尺寸的研究

扫描电子显微研究表明，化学汽相沉积的金刚石薄膜中晶粒大小比较均匀。但随着沉积时间和薄膜厚度的增加，晶粒逐渐变大，且每一层内，存在少量的大金刚石颗粒，讨论了晶粒尺寸变化和大晶粒形成的原因和机制。     

低速爆轰管对黑火药的点传火性能研究

文章采用中心点火管结构的实验装置研究了黑火药的点传火性能。用低速爆轰 (L VD)中心点火管来点燃黑火药时 ,1# ～ 3# 大粒黑药的传火速度为 70 0 m· s-1～ 80 0 m· s-1数量级 ,燃烧波宽度在 3.1ms～ 3.5 ms,最大压力峰值 :1# 为 36 .4 MPa,2 # 为 2 4 .0 MPa,3# 为 38.0 MPa。用普通中心点火管点燃黑火药时 ,2 # 、3# 和钝化 2 # 大粒黑的传火速度分别为 6 1.2 m· s-1、6 8.2 m·s-1和 4 0 .1m· s-1,最大燃烧波宽度分别为 9.2 ms、6 .3ms和 9.5 ms。燃烧波表明 ,L VD中心传火管与普通中心传火管相比较 ,在传火管的不同位置处 ,前者的 P- t曲线一致性远高于后者。     

Hydride Vapor Phase Epitaxy of GaN Thick Films by the Consecutive Deposition Process Using GaCl3

GaN buffer and main layers were grown by the conventional hydride vapor phase epitaxy technique using GaCl₃ consecutively. The deposited buffer layers were investigated by atomic force microscopy and X-ray analysis. To examine the behavior of the buffer layers at main layer growth temperature, heat treatment was conducted at 900°C. Based on the results of the buffer layer study, GaN thick films were grown at 1050°C. Optimum deposition conditions of buffer layer from the buffer and main layer studies generally coincided. On the φ scanning pattern, the GaN films grown on (0001) Al₂O₃ were single-crystalline. Band-edge emission dominated photoluminescence was observed at room temperature.     

利用短周期地脉动推断深层地基S波速度

从二维随机波场的相关理论出发，提出了如何从短周期地脉动（频率＞０．５Ｈｚ）时域信号中计算Ｒａｙｌｅｉｇｈ波弥散曲线，进而反演深层地基剪切波（Ｓ波）速度的理论方法和分析技术，并结合实测信号的分析结果，探讨了该方法的可行性和实用性。     

Silver Electrodeposition from Photographic Processing Solutions

This paper describes the parameters that are important in the industrial practice of silver removal from photographic fixers. The experiments were performed under potentiostatic control using synthetic solutions. The current efficiency was analysed as a function of the cathodic potential taking into account the deposit quality. A cathodic potential of ?0.5 V against a saturated calomel electrode is recommended. The conditions to prevent the darkening of the electrodeposit were investigated. The determination of silver concentration in the solution was made by direct potentiometry. The results obtained with synthetic fixers were corroborated by making the silver deposition from commercial fixers in an electrochemical reactor with rotating cylinder electrode intercalated in an electrolytic flow circuit in order to simulate practical conditions.     

石英晶体监控法镀制高精度光学薄膜

讨论了石英晶体监控法在光学薄膜镀制过程中的应用原理。通过与常规的光学监控法镀制的膜层相比较．证实了石英晶体监控法有助于提高光学薄膜的光学品质。试验表明所镀膜层的光学性能优异，在光通信和激光器等领域具有广阔的应用前景。