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61.
The authors describe a new type of titanium (Ti) implant as a Modi-anodized (ANO) Ti implant, the surface of which was treated by sandblasting, acid etching (SLA), and anodized techniques. The aim of the present study was to evaluate the adhesion of MG-63 cells to Modi-ANO surface treated Ti in vitro and to investigate its osseointegration characteristics in vivo. Four different types of Ti implants were examined, that is, machined Ti (control), SLA, anodized, and Modi-ANO Ti. In the cell adhesion study, Modi-ANO Ti showed higher initial MG-63 cell adhesion and induced greater filopodia growth than other groups. In vivo study in a beagle model revealed the bone-to-implant contact (BIC) of Modi-ANO Ti (74.20% ± 10.89%) was much greater than those of machined (33.58% ± 8.63%), SLA (58.47% ± 12.89), or ANO Ti (59.62% ± 18.30%). In conclusion, this study demonstrates that Modi-ANO Ti implants produced by sandblasting, acid etching, and anodizing improve cell adhesion and bone ongrowth as compared with machined, SLA, or ANO Ti implants. These findings suggest that the application of Modi-ANO surface treatment could improve the osseointegration of dental implant.  相似文献   
62.
植入不锈钢腐蚀疲劳过程中的晶间腐蚀   总被引:1,自引:0,他引:1  
用SEM研究了浸在Hank模拟体液中的轧态316L和铸态316L和铸态317L不锈钢在腐蚀疲劳期间产生的间晶腐蚀。结果表明,腐蚀疲劳初始裂纹是在腐蚀晶界上孕育产生的,在疲劳应力作用下,由沿晶扩展变为穿晶扩展;晶间腐蚀不是由碳化物析出造成晶界贫Cr产生的。而是一种非敏化晶间腐蚀。  相似文献   
63.
针对碲镉汞中波p-on-n技术进行研究,采用二次离子质谱仪分析注入后及退火后As离子在碲镉汞材料中的浓度分布,使用透射电镜表征激活退火后离子注入损伤修复状态,通过半导体参数测试仪评价pn结的IV特性,将探测器芯片装在变温杜瓦中测试其不同温度下的焦平面技术指标。研究结果表明,As离子注入后在碲镉汞体内形成大量缺陷,经过富汞退火后缺陷得到修复,同时As离子进一步向内扩散,制备的pn结工作稳定表明As离子得到有效激活,制备的中波p-on-n探测器芯片在120 K温度下有效像元率可以达到99%以上。  相似文献   
64.
65.
In this paper, a low-power low-noise complementary metal-oxide semiconductor (CMOS) receiver RF front-end (RFFE) that employs a current-reuse Q-boosted resistive feedback low-noise amplifier (RFLNA) is proposed for 401 to 406 MHz medical device radio-communication service band IoT applications. By employing a series RLC input matching network, the proposed RFLNA has the advantages of both the conventional RFLNA and the inductively degenerated common-source LNA without using large on-chip spiral inductors at the sources of the main transistors. The proposed active mixer utilizes a current-reuse transconductor, in which a p-channel metal-oxide semiconductor (PMOS) transistor performs a current-bleeding function to reduce direct current (DC) and flicker noise in the switching stage of the active mixer. The proposed receiver RFFE is implemented in a 65-nm CMOS process and achieves a voltage gain of 30.9 dB, noise figure of 4.1 dB, S11 of less than −10 dB, and IIP3 of −22.9 dBm. It operates at a supply voltage of 1 V with bias currents of 360 μA. The active die area is 0.4 mm × 0.35 mm.  相似文献   
66.
通过对钛片表面电荷的调控来改变纯钛表面的蛋白吸附能力,改善其生物学性能。将大颗粒喷砂酸蚀的样本分别浸泡在不同的溶液中,分别观察检测不同样本表面形貌及表面元素构成,各组样本的表面粗糙度,以及各组样本表面的电荷状况。最后检测各组样本的纤维连接蛋白吸附能力。结果表明,各组样本表面具有相似的表面形貌,不同组表面因为浸泡的液体不同其表面元素各不相同;各组样本的表面粗糙度无显著差异;而浸泡在氯化钙溶液中的钛片具有最高蛋白吸附能力(P0.01),而对照组大颗粒喷砂酸蚀组吸附能力最弱。将钛片浸泡在含有二价钙离子的氯化钙溶液中可以改变钛片表面的电荷状态,提升蛋白吸附能力,从而改善其生物学性能。  相似文献   
67.
We have proposed a Tripolar Electrode Stimulation Method (TESM) which may succeed in narrowing the stimulation region and continuously moving the stimulation site for cochlear implants. The TESM stimulates the auditory nerve array through lymphatic fluid by means of three adjacent electrodes selected from among an electrode array. Currents are emitted from the electrodes on each side and the central electrode receives them. The current received by the latter electrode is equal to the sum of the currents emitted from the electrodes on the two sides. In this paper, the electric intensity profiles produced by the TESM and by monopolar stimulation were measured in a human cadaver cochlea and in a saline solution. We found that in the TESM, the electric intensity profile produced in the human cadaver cochlea was about the same as that in the saline solution. In addition, in the TESM, the electric intensity profile was much sharper than that of monopolar stimulation in the human cadaver cochlea. Furthermore, the nervous excitation region could be localized in a certain range by means of TESM. © 1999 Scripta Technica, Electr Eng Jpn, 129(1): 1–9, 1999  相似文献   
68.
Titanium surface is an important factor in achieving osseointegration during the early wound healing of dental implants in alveolar bone. The purpose of this study was to evaluate sandblasted-etched surface implants to investigate the osseointegration. In the present study, we used two different types of sandblasted-etched surface implants, an SLA™ surface and a Nanoblast Plus™ surface. Roughness and chemical composition were evaluated by a white light interferometer microscope and X-ray photoelectron spectroscopy, respectively. The SLA™ surface exhibited the higher values (Ra 3.05 μm) of rugosity compared to the Nanoblast Plus™ surface (Ra 1.78 μm). Both types of implants were inserted in the femoral condyles of ten New Zealand white rabbits. After 12 weeks, histological and histomorphometric analysis was performed. All the implants were osseointegrated and no signs of infection were observed. Histomorphometric analysis revealed that the bone–implant contact % (BIC) ratio was similar around the SLA™ implants (63.74 ± 13.61) than around the Nanoblast Plus™ implants (62.83 ± 9.91). Both implant surfaces demonstrated a favorable bone response, confirming the relevance of the sandblasted-etched surface on implant osseointegration.  相似文献   
69.
胡盼  周名兵  黄棣  张利  李玉宝 《功能材料》2012,43(12):1532-1536
采用不同比例的氢氟酸(1%(质量分数)HF)与双氧水(30%(质量分数)H2O2)以及二者不同配比(1∶1、5∶1和1∶5)的混合溶液对钛金属表面进行处理,制备出具有不同拓扑结构的钛活性表面.用扫描电镜(SEM)、原子力显微镜(AFM)、接触角测试和X射线光电子能谱(XPS)等手段分别对各组样品的表面形貌、粗糙度、亲疏水性及表面化学组成变化等进行分析和表征.将各组样品分别与骨肉瘤细胞株(MG63)共培养,用SEM观察细胞形态变化,利用MTT比色法测定细胞增殖能力,通过体外细胞培养实验考察处理后的钛金属表面对MG63细胞形貌及增殖分化特性的影响.结果表明,经HF和H2O2混合溶液处理后的样品表面粗糙,并含有丰富的F-和OH-基团,促进了细胞的粘附、铺展、生长和增殖,大幅改善了钛表面的生物活性.其中,氢氟酸与双氧水按1∶5配比的混合溶液处理后的样品在细胞培养前期显示出更加优良的细胞相容性,这对促进钛种植体与周围骨组织间的快速整合具有积极意义.  相似文献   
70.
采用插销试验法研究了JDHS-38#自保护药芯焊丝焊接U75V钢轨的冷裂敏感性,评估了预热温度、线能量、焊道数3个因素对U75V钢轨临界断裂应力的影响.结果表明,现场对钢轨施焊时,采取250℃的预热温度,14 kJ/cm左右的线能量,双层焊等措施可以使钢轨接头热影响区少产生甚至不产生焊接冷裂纹,使其临界断裂应力达646 MPa,与抗拉强度相当.若采用其他工艺参数,临界断裂应力较低,且当拘束拉伸应力高于抗拉强度时,于热影响区发生氢致断裂.焊接接头过热区组织主要为马氏体、贝氏体,断口显微形貌主要为河流花样、泥状花样及爪状花样.  相似文献   
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