PCR生物芯片微加工技术的研究

聚合酶链式反应（PCR）在生命科学研究及诸多相关领域已经得到了广泛应用。PCR生物芯片是利用微加工技术制作的能够实现PCR扩增反应的微装置。文中给出了基于MEMS技术的PCR生物芯片的微加工技术及加工方法，特别对集成在芯片上的加热器及温度传感器的微加工方法进行了重点介绍，并对它们的特性进行了分析比较。最后预测了PCR生物芯片微加工技术的发展方向及要克服的主要难题。     

微流控分析芯片的加工技术

综述了微流控分析芯片和加工技术和材质性能,光刻和蚀刻技术常用于加工硅,玻璃和石英芯片。有机聚合物由于品种多,易加工,是代替玻璃和石英的芯片材料。本文总结和讨论了各种芯片材料和它们的加工方法,如光刻,湿法刻蚀,干法刻蚀,模塑法,软刻蚀,热压法,激光切蚀法,LIGA技术和键合技术,引用文献36篇。     

聚焦离子束无掩模刻蚀研究

利用镓源二级透镜聚焦离子束装置在半导体基片上进行了一系列的无掩模刻蚀实验研究，在不同材料上刻蚀了各种图形，总结分析了不同参数的聚焦离子束对刻蚀的影响。     

Fabrication of THz Dipole Antenna Using Lift-off Method

The microfabrication technique for THz dipole antenna, "lift-off" was studied in this paper. Its procedure has been examined in detail, and discreetly tweaked. Particularly, Chlorobenzene is suggested to assist the formation of undercut indispensible for fulfilling "lift-off". The experimental results of fabricated antennas confirm the effectiveness of this method.     

Replication of Microstructures by Roll-to-Roll UV-Curing Embossing

The characteristics of pattern replication and releasing in a roll-to-roll ultraviolet- (UV) curing embossing process were investigated. The roll embossing system was designed for large-area continuous embossing, with employment of a fast curing resin, a heat damage protector, and a surface energy reducing coating. A 60° V-groove pattern with a groove period of 30 µm was embossed. It was found that the replication quality was profoundly influenced by the pattern geometry, the pattern direction, and the mold surface energy. In particular, the pattern direction significantly affected the edge sharpness and the surface topography of replicated features. In the parallel groove mode, a significant amount of tearing and sliding occurred, whereas in the transverse groove mode, biting marks were observed on the side wall of the V-groove. A simple mechanical model was used to explain the difference in pattern releasing with different pattern layouts. The replication quality was found to be significantly improved with the application of a fluorinated coating on the roll mold.     

The formation and elimination of polymer bulges in CO2 laser microfabrication

CO₂ laser is a quick and cheap method for the fabrication of microfluidic chip. However, bulges will form at the rim of the laser ablation zone due to the thermal stress induced by great temperature gradient. The bulges will result in bonding problems, microchannels clogging and electrophoresis sample leak. The method to eliminate the bulges still requires further investigation. In this paper, the formation process of the bulges was recorded synchronously. The relationship between laser fabrication parameters and the height of bulge was established. The effects of the extruding direction of the plate on the forming of the bulge were evaluated. A simple method of “two times of laser cutting” is presented to eliminate the bulges. Results showed that the laser fabrication parameters, such as output power of laser beam and laser beam moving speed, have significant influence on the forming of bulge. The height of bulge also has relationship with the extruding direction of the commercial plate. The method of two times of laser cutting is an effective and simple way to eliminate the bulges.     

Crystallisation of Foturan glass-ceramics

Photostructurable glass-ceramics are suitable for 3-dimensional microfabrication and, in some instances, can be used as an alternative material to silicon in the microfabrication of micro-electro-mechanical-system (MEMS) devices. Foturan^® is a photosensitive lithium-aluminium-silicate glass that can be structured by an exposure to UV light, followed by a thermal treatment and an etching step. In this work, the crystallisation kinetics and microstructure evolution of unexposed and UV-exposed Foturan^® are investigated by means of differential scanning calorimetry, X-ray diffraction and scanning electron microscopy. The glass transition temperature T_g, the apparent activation energy of crystallisation E_a and the colour of UV-exposed Foturan^® are discussed. It is shown that nucleation and crystallisation of UV-exposed Foturan^® can be steered either as a function of temperature (non-isothermal) or as a function of time (isothermal). This is essential for the photostructuring and etching of Foturan^® regarding the achievable feature sizes of 25 μm for MEMS applications.     

偏晶向(111)硅片闪耀光栅的设计

利用硅单晶的特殊结构可以设计出不同角度的闪耀光栅，再使用MEMS的紫外光刻、各向异性腐蚀等常规工艺就可以完成硅闪耀光栅的制作。设计了一种利用偏转晶向(111)硅片制作小角度闪耀光栅的方法，避免了利用其它晶向的硅片制作闪耀光栅的缺点。利用这种方法制作了线宽为4μm的硅闪耀光栅，使用原子力显微镜(AFM)进行了光栅表面形貌测试，得到平均表面粗糙度为110．94nm，试验结果表明制作的硅光栅样片具有良好光学特性的反射表面和光栅槽形。