Physicochemically Stable Polymer‐Coupled Oxide Dielectrics for Multipurpose Organic Electronic Applications

A chemically coupled polymer layer is introduced onto inorganic oxide dielectrics from a dilute chlorosilane‐terminated polystyrene (PS) solution. As a result of this surface modification, hydrophilic‐oxide dielectrics gain hydrophobic, physicochemically stable properties. On such PS‐coupled SiO₂ or AlO_x dielectrics, various vacuum‐ and solution‐processable organic semiconductors can develop highly ordered crystalline structures that provide higher field‐effect mobilities (μ_FETs) than other surface‐modified systems, and negligible hysteresis in organic field‐effect transistors (OFETs). In particular, the use of PS‐coupled AlO_x nanodielectrics enables a solution‐processable triethylsilylethynyl anthradithiophene OFET to operate with μ_FET ～ 1.26 cm² V^?1 s^?1 at a gate voltage below –1 V. In addition, a complementary metal‐oxide semiconductor‐like organic inverter with a high voltage gain of approximately 32 was successfully fabricated on a PS‐coupled SiO₂ dielectric.     

Core‐Brominated Tetraazaperopyrenes as n‐Channel Semiconductors for Organic Complementary Circuits on Flexible Substrates

Organic thin‐film transistors (TFTs) are prepared by vacuum deposition and solution shearing of 2,9‐bis(perfluoroalkyl)‐substituted tetraazaperopyrenes (TAPPs) with bromine substituents at the aromatic core. The TAPP derivatives are synthesized by reacting known unsubstituted TAPPs with bromine in fuming sulphuric acid, and their electrochemical properties are studied in detail by cyclic voltammetry and modelled with density functional theory (DFT) methods. Lowest unoccupied molecular orbital (LUMO) energies and electron affinities indicate that the core‐brominated TAPPs should exhibit n‐channel semiconducting properties. Current‐voltage characteristics of the TFTs established electron mobilities of up to μ_n = 0.032 cm² V^?1 s^?1 for a derivative which was subsequently processed in the fabrication of a complementary ring oscillator on a flexible plastic substrate (PEN).     

Holography and plasma oxidation for uniform nanoscale two dimensional channel formation of vertical organic field-effect transistors with suppressed gate leakage current

Vertical organic field-effect transistors (VOFETs) with nanoscale channel openings have been fabricated using pentacene as an active layer material. To achieve uniform nanoscale two-dimensional channel openings, a laser holography lithography has been introduced. Uniformly distributed and well-aligned holes with 250 nm diameter were successfully obtained with the laser holography lithography. VOFET devices with these channel openings have shown high on/off ratio of about 10³ without any further treatment. Gate leakage current was also decreased with an additional insulating layer generated on the gate electrode sidewall via plasma oxidation.     

Stretchable,Transparent Zinc Oxide Thin Film Transistors

Stretchable and transparent thin film transistors (TFTs) with intrisically brittle oxide semiconductors are built using a wavy structural configuration that can provide high flexibility and stretchability. After device fabrication procedures including high temperature annealing, the oxide semiconductor‐based TFT arrays can be transferred directly to plastic or rubber substrates, without an additional device process, using transfer printing methods. This procedure can avoid some of the thermal degradation problems associated with plastic or rubber substrates by separating them from the annealing procedure needed to improve the device performance. These design and fabrication methods offer the possibility of developing a new format of stretchable electronics.     

非对称HALO-LDD掺杂石墨烯纳米条带场效应管的电学特性研究(英文)

随着器件沟道尺寸的不断缩小,短沟道效应(SCE)和漏致势垒降低效应(DIBL)对常规类MOSFET结构的石墨烯纳米条带场效应管(GNRFET)影响变大,从而引起器件性能下降。文中提出了一种新型采用非对称HALO-LDD掺杂结构的GNRFET,其能够有效抑制器件中SCE和DIBL,改善器件性能。并采用一种量子力学模型研究GNRFET的电学特性,该模型基于二维NEGF(非平衡格林函数)方程和Poisson方程自洽全量子数值解。结合器件的工作原理,研究了GNRFET的电学特性和器件结构尺寸效应,通过与采用其他掺杂结构的GNRFET的电学特性对比分析,发现这种掺杂结构的石墨烯纳米条带场效应管具有更低的泄漏电流、更低的亚阈值斜率和DIBL以     

Subnanometer Analysis and Modeling of MBE Grown InP Based MODFETs

InGaAs/InAlAs double-doped double-strained modulation-doped field-effect transistors OD-SMODFETs)1 were grown by solid source molecular beam epitaxy. The structures were characterized using high resolution x-ray diffraction, Hall effect, and cross-sectional scanning tunneling microscopy. A record two-dimensional electron gas (2DEG) sheet density of 8.5 × 10¹²/cm² and 8.1 × 10¹²/cm² for 300 and 77K, respectively, was achieved. The mobility was 6500 and 12000 cm²/ Vs for 300 and 77K, respectively. To the author’s knowledge,² the previous record 2DEG result was 6.58 × 10¹²/cm². The electron mobility was limited by alloy scattering and interface roughness caused by the presence of “clustering.” Using cross-sectional scanning tunneling microscopy to verify the presence of these clusters, we have the first images of the lattice matched InAlAs (spacer)-InGaAs (quantum well) interface. These images reveal clusters that have approximate spherical or cylindrical shapes with equivalent cubic dimensions ranging from 25 to 45Å.     

Optimization of a 0.6 μm, single polysilicon emitter bipolar technology versus narrow emitter effects

A novel 0.6 μm, single polysilicon emitter bipolar technology has been optimized in order to reduce the consequences of narrow emitter effects (NEE) appearing at the laterals of the emitter area. The primary technological mechanisms of these effects have been studied and differentiated for this technology. They have been found to be the polysilicon over-etch into the underlying silicon, the pedestal oxidation, both of them in the area of the extrinsic base implantation, and the extrinsic base lateral diffusion. Designs of experiments techniques have been used in order to study all these technological elements and their effect on the final performance of the transistors. Common emitter current gain variation versus emitter width has been studied by means of test structures and an optimization method is proposed. Lateral diffusion of extrinsic base has been identified as main source of NEE in this technology, which reduces the transistors current gain. Pedestal oxidation has been identified as secondary source of these effects, acting in an opposite way of lateral diffusion increasing the transistors current gain. This opposed effects have been tuned in the technological optimization to minimize the NEE by means of a mutual compensation.     

氨化Ga2O3/Mg薄膜制备簇状GaN纳米线

通过在1050°C时氨化Ga2O3/Mg薄膜制备出簇状GaN纳米线。用X射线衍射(XRD),傅里叶红外吸收光谱(FTIR)扫描电子显微镜(SEM)和高分辨电子显微镜(HRTEM)对样品进行测试分析。结果表明,GaN纳米线为六万纤锌矿结构单晶相并且成族生长,直径在200～500nm米左右,其长度可达5～10μm。几乎所有纳米线的直径均有逐渐缩小的趋势。对Mg膜的作用进行了初步的分析。     

Monitoring the Channel Formation in Organic Field‐Effect Transistors via Photoinduced Charge Transfer

Conducting channel formation in organic field‐effect transistors (OFETs) is considered to happen in the organic semiconductor layer very close to the interface with the gate dielectric. In the gradual channel approximation, the local density of accumulated charge carriers varies as a result of applied gate bias, with the majority of the charge carriers being localized in the first few semiconductor monolayers close to the dielectric interface. In this report, a new concept is employed which enables the accumulation of charge carriers in the channel by photoinduced charge transfer. An OFET employing C₆₀ as a semiconductor and divinyltetramethyldisiloxane‐bis(benzocyclobutene) as the gate dielectric is modified by a very thin noncontinuous layer of zinc‐phthalocyanine (ZnPc) at the semiconductor/dielectric interface. With this device geometry, it is possible to excite the phthalocyanine selectively and photogenerate charges directly at the semiconductor/dielectric interface via photoinduced electron transfer from ZnPc onto C₆₀. Thus the formation of a gate induced and a photoinduced channel in the same device can be correlated.     

Direct structuring of C60 thin film transistors by photo-lithography under ambient conditions

Direct structuring techniques are an indispensable need for future low-cost applications of organic semiconductor materials in e.g. active matrix displays or integrated circuits. We demonstrate direct structuring of a small molecule organic semiconductor by a photo-lithography lift off process under ambient conditions. To show compatibility of this process, we fabricate organic thin film transistors (OTFT) containing the benchmark electron transporting semiconductor C60 as active material in a top-contact geometry. C60 as electron transporting semiconductor serves as good indicator for contamination and degradation caused by the structuring procedure. To disclose influences of structuring, we discuss the OTFT performance for different channel lengths from 100 μm down to 2.7 μm. In particular, we show that lithography processing gives rise to increased contact resistances. Apart from that, mobility of C60 as material parameter is only weakly affected which underlines the compatibility of the suggested structuring procedure. The potential of this structuring procedure for future integration of driving transistors in active matrix displays is demonstrated.