低缺陷密度和平整表面的硅基砷化镓外延

Device-quality GaAs thin films have been grown on miscut Ge-on-Si substrates by metal-organic chemical vapor deposition. A method of two-step epitaxy of GaAs is performed to achieve a high-quality top-layer. The initial thin buffer layer at 360 ℃ is critical for the suppression of anti-phase boundaries and threading dislocations. The etch pit density ofGaAs epilayers by KOH etching could reach 2.25 × 10^5 cm^-2 and high-quality GaAs top epilayers are observed by transmission electron microscopy. The band-to-band photoluminescence property of GaAs epilayers on different substrates is also investigated and negative band shifts of several to tens of meVs are found because of tensile strains in the GaAs epilayers. To achieve a smooth surface, a polishing process is performed, followed by a second epitaxy of GaAs. The root-mean-square roughness of the GaAs surface could be less than 1 nm, which is comparable with that of homo-epitaxial GaAs. These low-defect and smooth GaAs epilayers on Si are desirable for GaAs-based devices on silicon substrates.     

Optical and structural properties of sol-gel derived nanostructured CeO_2 film

Sol-gel derived nanostructured CeO2 film was deposited on glass substrate using the dip-coating technique with annealed at 650oC. X-ray diffraction (XRD), scanning electron microscopy (SEM), Fourier transform infrared (FTIR), UV/VIS and photoluminescence (PL) spectroscopy studies were employed to analyze the structural and optical properties of the sol-gel derived nanostructured CeO2 film. The average crystallite size was estimated from XRD pattern using Scherrer equation as about 3–4 nm. SEM micrograph shows the film have good adherence to the substrate, porous in nature and crack free. The UV-visible absorption spectroscopic measurement results showed that the products had conspicuous quantum size effects. The absorption spectrum indicates that the sol-gel derived nanostructured CeO2 film have a direct bandgap of 3.23 eV and the photoluminescence spectra of the film show strong band at 378 nm may have promising applications as optoelectronic materials.     

Thermoelectric Effect Spectroscopy and Photoluminescence of High-Resistivity CdTe:In

Thermoelectric effect spectroscopy and photoluminescence techniques were used to study the defect levels in samples from three crystals of CdTe:In grown by the vertical gradient freeze method. The main goal of the investigation was to study defects, which strongly trap charge carriers or act as recombination centers in order to eliminate them from the technological process. The main difference among detecting and non-detecting samples was the absence of electron traps with a very high capture cross-section and energy 0.6 eV to 0.7 eV, which act as lifetime killers even at low concentrations. Recently published ab initio calculations show a complex of Te antisite and Cd vacancy within this energy range.     

基于二维表面等离子体激元的微结构

在介电常数符号相反的两个材料的界面处可激发出表面等离子体激元 (Surface plasmon)。文中利用普通扫描电子显微镜中出现的电子束诱导沉积纳米碳基本现象 ,提出和发展了一种无需光刻胶和额外掩模的亚微米图形化技术。采用这一新方法 ,成功地在镀金的半导体 In Ga Al P量子阱表面制备了各种亚微米点阵结构 ,并得到基于二维表面等离子体激元的可见波段半导体发光的增强作用     

聚噻吩类有机聚合物材料光电性能研究进展

介绍了典型的具有光电性能的噻吩类聚合物材料,包括烷基取代聚噻吩、联苯基取代聚噻吩、芴与噻吩共聚物及一些新型的噻吩类聚合物。对它们的结构、光学性能、电致发光性能进行了归纳和总结,讨论了不同类聚噻吩的特点,对比了随取代基种类、位置及个数的不同其聚合物性能的优缺点,并对其研究和应用前景进行了展望。     

Si(111)衬底上GaN外延材料的应力分析

对Si(111)衬底上GaN外延材料的应力随着低温AlN插入层数的变化进行了分析研究。通过喇曼散射谱在高频E2(TO)模式下的测试分析发现,随着低温AlN插入层数的增加,GaN材料的E2(TO)峰位逐渐接近体GaN材料的E2(TO)峰位(无应力体GaN材料的E2(TO)峰位为568cm-1),计算得出GaN材料的应力从1.09GPa减小到0.42GPa。同时,使用室温光荧光谱进行了分析验证。结果表明,Si衬底上GaN外延材料受到的是张应力,通过低温AlN插入层技术可以有效降低GaN材料的应力,并且最终实现了表面光亮的厚层无裂纹GaN材料。     

微腔中nc-Si/SiN超晶格的光致发光

研究了一维光子晶体微腔结构对nc-Si/a-SiNz超晶格发射的调制.一维光子晶体微腔采用两种具有不同折射率的非化学组分非晶氮化硅的周期调制结构,腔中嵌入采用激光晶化方法制备的硅量子点阵列,从Raman谱和透射电子显微镜分析得到其尺寸约为3～4 nm.从光致发光谱上观察到明显的选模作用、明显变窄的发光峰以及约两个量级的发光强度的增强.微腔对硅量子点阵列发光的调制主要表现在两个方面:共振模式的增强和非共振模式的抑制.硅量子点中位于腔共振模式的辐射跃迁被增强,非共振模式的辐射跃迁被抑制,因此位于腔共振频率处的跃迁通道成为硅量子点中唯一的辐射跃迁通道,导致光致发光谱的窄化和强度的增强.因此,在提高硅材料发光效率方面,光子晶体微腔具有非常大的应用前景.     

外腔面发射激光器自发辐射谱的热特性

热效应是限制外腔面发射激光器(VECSEL)输出功率和光束质量的主要原因。为了优化VECSEL增益芯片有源区量子阱的设计,降低激光器的热效应,提高斜效率和输出功率,采用光致荧光谱方法,对设计波长980nm VECSEL自发辐射谱的热特性进行了实验研究。取得了不同热沉温度下边发射和面发射谱随温度的变化数据。结果表明,反映有源区量子阱自身特性的边发射谱峰值波长随温度升高的红移速率是0.5nm/K,而受到增益芯片多层结构调制的面发射谱峰值波长随温度升高的红移速率只有0.1nm/K;由于受到VECSEL增益芯片中微腔的限制,面发射谱分离为多个模式,分别与微腔的腔模对应。可见对量子阱的发射波长及微腔腔长做预偏置优化处理,可以显著改善激光器的输出性能。     

利用固相反应法在硅片上制备硅酸锌发光薄膜及表征

采用与硅集成工艺相兼容的固相反应方法在硅衬底上制备了未经掺杂及掺锰的硅酸锌薄膜 .XRD测试和UV - Vis吸收谱测试证明在高于 880℃的温度下热处理 ,可以获得结晶状态很好的硅酸锌薄膜 .光致发光光谱分析表明 ,未掺杂的薄膜在紫外波段有较弱的发射 ,而掺锰的硅酸锌薄膜在可见光波段有很强的光致发射 .由于硅酸锌薄膜在高温下非常稳定 ,可以与硅集成电路工艺兼容 ,而且发光强度高 ,因此在制作硅基光电集成器件方面有非常大的应用前景     

HFCVD法制备SiC材料及室温光致发光

利用热丝化学气相沉积法(HFCVD)以CH4和SiH4作为反应气体在Si衬底上制备了SiC薄膜。用X射线衍射(XRD)、傅立叶红外吸收谱(FTIR)等手段对样品进行了结构和组分分析，分析结果表明已经在Si衬底上制备了SiC薄膜。对所制备的SiC薄膜进行了光致发光测试，在室温下观察到了薄膜峰值位于417nm和436nm的较强的可见光发射，认为这两个相近的蓝光发射起源可能是光激发载流子从SiC晶粒核心激发．然后转移到SiC晶粒表面发光中心上的辐射复合。