等离子体横向刻蚀硅的特性研究

研究了用SiO2 +Al作掩模 ,SF6 +O2 混合气体等离子体对Si的横向刻蚀 ,其结果表明 ,在SF6 +O2 等离子体气氛中 ,Al是很好的保护膜 ,可以在待悬浮器件下形成大的开孔。因此 ,预计用这种技术 ,可以在Si片上集成横向尺寸为数百微米 ,具有优良高频性能的MEMSRF/MW无源器件 ,如开关、传输线、电感和电容等。     

CVD金刚石工具膜生长特征SEM观察

本文用不热形变栅状直丝化学气相沉积（ＣＶＤ）法生长金刚石膜，在Ｓｉ及ＷＣ－Ｃｏ硬质合金衬底上金刚石膜晶面显露规律随衬底温度和甲烷浓度而异，经适当表面处理及选择合适的工艺条件，当生长初期衬底上就呈现出良好晶形的沉积膜，衬底与膜之间的粘结力能得到提高。Ｒａｍａｎ谱分析表明此膜仅具有特征金刚石１３３２ｃｍ￣（－１）峰，通过ＳＥＭ观察揭示出盒刚石膜可在表面、侧面及棱上生长，并与衬底有良好的联结。     

微波电子回旋共振等离子体技术及其应用

微波电子回旋共振等离子体是淀积薄膜、微细加工和材料表面改性的一种重要手段。由于这种等离子体电离水平高,化学活性好,可以用来实现基片上薄膜的室温化学气相淀积和反应离子刻蚀,因此对于微电子学、光电子学和薄膜传感器件的发展,这种等离子体会具有重要的意义。此外,采用微波电子回旋共振等离子体原理,没有灯丝的离子源可以提高离子源的使用寿命,可以增加离子束的束流密度。可以确信,微波电子回旋共振等离子体的发展,将把离子源技术提高到一个新的水平。显然,这必将对材料表面改性工艺,包括离子注入掺杂等工艺的发展发挥作用。自从1985年以来,为了得到大容积等离子体而发展了微波电子回旋共振多磁极等离子体,这些技术在薄膜技术、微细加工以及材料表面改性中的应用前景是乐观的。我们将在本文中,介绍微波电子回旋共振等离子体的原理及其应用。     

用发射天线式微波等离子体CVD装置沉积大面积金刚石薄膜

在国内首次研制成功了高气压发射天线式微波等离子体辅助化学气相沉积金刚石薄膜装置，用该装置成功地在３英寸的单晶硅衬底上沉积了Φ７０ｍｍ的金刚石薄膜。这一成果填补了国内空白，对我国金刚石薄膜研究领域的设备更新换代和开发应用具有重要意义。     

基于B点磁探针膛内电枢电弧长度与速度分布测量的计算机控制系统的研究

基于B点磁探针的测量原理，建立了电磁轨道炮膛内三维等离子体电枢电弧长度和电弧运动速度测量的数学模型，通过对该模型的分析给出了用于测量膛内电枢电弧长度和运动速度分布的相应推论。开发了用于测量膛内等离子体电枢电弧长度和速度的多通道计算机控制诊断系统，并进行了相应的试验研究。     

Surface tailoring of an ethylene propylene diene elastomeric terpolymer via plasma‐polymerized coating of tetramethyldisiloxane

In the research presented here, we explore the use of a low‐energy plasma to deposit thin silicone polymer films using tetramethyldisiloxane (TMDSO) (H(CH₃)₂? Si? O? Si? (CH₃)₂H) on the surface of an ethylene propylene diene elastomeric terpolymer (EPDM) in order to enhance the surface hydrophobicity, lower the surface energy and improve the degradation/wear characteristics. The processing conditions were varied over a wide range of treatment times and discharge powers to control the physical characteristics, thickness, morphology and chemical structure of the plasma polymer films. Scanning electron microscopy (SEM) shows that pore‐free homogeneous plasma polymer thin films of granular microstructure composed of small grains are formed and that the morphology of the granular structure depends on the plasma processing conditions, such as plasma power and time of deposition. The thicknesses of the coatings were determined using SEM, which confirmed that the thicknesses of the deposited plasma‐polymer films could be precisely controlled by the plasma parameters. The kinetics of plasma‐polymer film deposition were also evaluated. Contact angle measurements of different solvent droplets on the coatings were used to calculate the surface energies of the coatings. These coatings appeared to be hydrophobic and had low surface energies. X‐ray photoelectron spectroscopy (XPS) and photoacoustic Fourier‐transform infrared (PA‐FT‐IR) spectroscopy were used to investigate the detailed chemical structures of the deposited films. The optimum plasma processing conditions to achieve the desired thin plasma polymer coatings are discussed in the light of the chemistry that takes place at the interfaces. Copyright © 2004 Society of Chemical Industry     

微波等离子体化学气相沉积的 a-Si∶H 性能研究

本文着重对微波等离子体化学气相沉积法高速沉积的 a-Si∶H 膜的物理性能进行评价研究.测量了沉积膜的光电性能、暗电导激活能、光禁带宽度、光吸收特性、沉积膜中悬键态密度以及氢含量等,并讨论沉积条件对膜性能的影响.结果表明,在沉积速率高达30～90(?)/s 情况下,膜的光电导(光照强度10~5Lux)与暗电导比值可达10~3～10~5,暗电导率从10~(-3)到10~(-11)((?)cm)~(-1),其激活能在0.23～0.88eV 之间(0～200℃温度范围内),光禁带宽度为1.40～2.20eV,氢含量约为2～20%.     

三维PDP放电过程数值模拟软件

介绍了三维PDP放电过程模拟软件，该软件可较真实地反映放电单元的实际情况，对放电性能进行优化设计，且具有通用性强、界面友好、使用方便、功能完善等特点。可对不同结构、不同气体成份、不同驱动电压及波形等情况进行计算。     

The Influence of Medium on Low-Voltage Circuit Breaker Arcs

This paper mainly focuses on the influence of three kinds of media： air, air-10%PA （Nylon） and air-10% POM （polyoxymethylene） on low-voltage circuit breaker arcs. A threedimensional （3-D） model of arc motioa under the effect of external magnetic field is built based on magnetohydrodynamics （MHD） equations. By adopting the commercial computational fluid dynamics （CFD） package based on the control-volume method, the above MHD equations are solved. For the media of air-10%PA and air-10%POM, the distributions of stationary temperature and electrical potential and the transient motion processes are compared with those of air arc. The research shows that both air-10%PA and air -10% POM can cool the arc plasma and the former is more effective. Both of them can increase the stationary voltage as well. Moreover, the presence of the two mixtures can accelerate the arc motion toward the quenching area and ensures the arc quenched in time.     

Surface characterization of PET nonwoven fabric treated by He/O2 atmospheric pressure plasma

The surface of polyethyleneterephthalate (PET) nonwoven fabric was modified by He/O₂ atmospheric pressure plasma treatment, varying plasma exposure time. The plasma treated PET surfaces have been analyzed to investigate the chemical nature and morphology of surface by X‐ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM), respectively. The change of wettability was measured depending on plasma exposure time. XPS results indicated the presence of oxygen‐based functional groups on the PET nonwoven fabric surface after plasma treatment and oxygen content increased as exposure time increased. The mean roughness increased after 30 s exposure and further increase in exposure to 60 s led to decrease of the roughness and then again increase. The root mean square roughness followed the similar trend to mean roughness. The average difference in height, Rz, increased after plasma exposure for 30 s, while it slightly decreased after 60 s exposure. Despite of redeposition, the Rz of 90 s exposed sample increased more than two times compared with those of 30 and 60 s exposed. Wettability increased progressively up to 10 times after 90 s exposure compared with the untreated. It is attributed to the increases of hydrophilicity and surface roughness. © 2008 Wiley Periodicals, Inc. J Appl Polym Sci, 2008