Permeable reactive barrier for groundwater remediation

This article aims to provide an overview of the upcoming technology of permeable reactive barriers for groundwater remediation. A comprehensive list of references and web-links are also provided for further in-depth understanding. A brief discussion on the Australian perspective on this emerging technology is also included.     

SIMADYN D控制器在武钢热轧动态无功补偿系统中的应用

SIMADYN D控制器应用于动态无功补偿，标志武钢动态无功补偿控制实现数字化突破。提高了系统的可靠性、调节精度和动态指标。     

Pool boiling on a superhydrophilic surface

Titanium Dioxide, TiO₂, is a photocatalyst with a unique characteristic. A surface coated with TiO₂ exhibits an extremely high affinity for water when exposed to UV light and the contact angle decreases nearly to zero. Inversely, the contact angle increases when the surface is shielded from UV. This superhydrophilic nature gives a self-cleaning effect to the coated surface and has already been applied to some construction materials, car coatings and so on. We applied this property to the enhancement of boiling heat transfer. An experiment involving the pool boiling of pure water has been performed to make clear the effect of high wettability on heat transfer characteristics. The heat transfer surface is a vertical copper cylinder of 17 mm in diameter and the measurement has been done at saturated temperature and in a steady state. Both TiO₂-coated and non-coated surfaces were used for comparison. In the case of the TiO₂-coated surface, it is exposed to UV light for a few hours before experiment and it is found that the maximum heat flux (CHF) is about two times larger than that of the uncoated surface. The temperature at minimum heat flux (MHF) for the superhydrophilic surface is higher by 100 K than that for the normal one. The superhydrophilic surface can be an ideal heat transfer surface. Copyright © 2002 John Wiley & Sons, Ltd.     

InxGa1−xAs ohmic contacts to n-type GaAs with a tungsten nitride barrier

Significant reduction of the contact resistance of In_0.7Ga_0.3As/Ni/W contacts (which were previously developed by sputtering in our laboratory) was achieved by depositing a W₂N barrier layer between the Ni layer and W layer. The In_0.7Ga_0.3 As/Ni/W₂N/W contact prepared by the radio-frequency sputtering technique showed the lowest contact resistance of 0.2 Ωmm after annealing at 550°C for 10 s. This contact also provided a smooth surface, good reproducibility, and excellent thermal stability at 400°C. The polycrystalline W₂N layer was found to suppress the In diffusion to the contact surface, leading to improvement of the surface morphology and an increase in the total area of the In_xGa−As between metal and the GaAs substrate. These improvements are believed to reduce the contact resistance.     

有环境约束时完成一族跟踪任务的力控制

本文为工业机器人提出了一种极点配置控制法，这种控制方法的优点有：一是它的积分作用消除了机器人的微小扰动和稳态误差；二是能任意设置系统的极点，因此能保证闭环系统的稳定性和规定状态变量的暂态响应；三是加入了加速度反馈，抑制了由电枢电感所引起的机械手的振动，最后，给出了ＰＵＭＡ５６２机器人的计算机仿真和实验结果验证了此控制法的有效性。     

高效率平面磁控溅射器的研制

介绍一种新型磁控溅射装置。它采用两块极性相对的环状磁铁的设计方法，通过扩大靶表面的等离子放电区域面积，使传统磁控溅射枪使用中经常受到的两个限制──溅射速率与靶的利用率得到了较大的改善。实验中铜靶在溅射功率密度为11W／cm~2时溅射速率约为800nm／min，如果继续提高功率则可获得更高的速率。而靶的利用率可达64％左右。另外，在认为出射粒子符合cos~nθ分布的前提下，发现当n＝3．3时，实验数据和理论数据符合得较好。     

GIC－4117／HC1．7MV Tandetron上的MeV离子注入系统

利用通用离子公司（ＧＩＣ）的４１１７型１．７ＭＶＴａｎｄｅｔｒｏｎ离子束分析设备进行ＭｅＶ级离子注入。所注入的离子能量范围由５００ｋｅＶ到１０ＭｅＶ，离子的质量在２４０ｕ以下，某些元素的负离子束流强度在１５０μＡ以上。双向机械扫描技术可将离子均匀地注入样片。     

中频反应溅射SiO2膜与直流溅射ITO膜的在线联镀

多数ITO透明导电玻璃生产线在实现SiO2膜与ITO膜在线联镀时，应用SiO2靶射频溅射沉积SiO2膜工艺和ITO靶直流溅射沉积ITO膜工艺，如果SiO2膜应用硅靶反应磁控溅射工艺，存在这种工艺是否可以与ITO靶直流溅射沉积ITO膜工艺在线联用以及如何实现联用的问题。作者对现有的生产线进行了改造设计、加工，做了大量实验、质谱分析和多项测试研究，成功地实现反应溅射SiO2膜与ITO膜在线联镀，做到SiO2镀膜室的工作状态的变化基本上不影响ITO镀膜室的工艺条件。     

反应精馏法制备高纯度醋酸甲酯

在中试反应精馏塔中以浓硫酸为催化剂进行了醋酸与甲醇反应制备醋酸甲酯的试验。反应精馏塔的精馏段为填料,反应段为立体催化精馏塔板,采用连续操作,考察了回流比、甲醇进料位置、停留时间、催化剂用量对反应精馏的影响。试验结果表明,当回流比为1.2、甲醇进料位置为第11～15块塔板、停留时间为2.2～2.5h、催化剂与醋酸的质量比为1.07∶100时,塔顶醋酸甲酯的质量分数达到99.50%以上,醋酸的转化率达到99.85%以上。