镍铬合金镀层的相组成和界层结构

生产搪资制品中的一个迫切问题是保护镍铬合金加热元件和焙烧器件免受高温腐蚀，为此研制出一系列玻璃釉质镀层成分，然而在镍铬合金工业生产中它们并没有被采用。     

Ground-based investigation of atomic oxygen effects on naked Ag and Ag with protective organic coating

Protective behavior of organic coatinge of alkyd,epoxy,urethane and siloxance applied to silver solar cell interconnects and erosion of Ag were investigated by exposure experiments to ground simulation atomic oxygen(AO).Evaluations of their protective properties were made through assessing their mass cfhange characteristics,chemical and physical changes to Ao attack.The specimens,after exposure were analyzed with SEM/EDAX and XPS.The results indicated that the silver is heavily etched.some coatings such as epoxy,alkd,urethane are seriously degraded or removed as volatile oxides and morphology of coatings changes.It is evident that siloxane coatings have excellent properties for anti-AO attack.The erosion product consists of silicon dioxide layer of compact texture and is left on the surface to provide adequate protection fro further attack by the energetic AO.     

生长温度对等离子体增强化学气相沉积生长ZnO薄膜质量的影响

以Zn(C2 H5) 2 和CO2 为反应源 ,在低温下用等离子体增强化学气相沉积方法 ,在Si衬底上外延生长了高质量的ZnO薄膜。用X射线衍射谱和光致发光谱研究了衬底温度对ZnO薄膜质量的影响。X射线衍射结果表明 ,在生长温度为2 3 0℃时制备出了高质量 ( 0 0 0 2 )择优取向的ZnO薄膜 ,其半高宽为 0 2 6°。光致发光谱显示出强的紫外自由激子发射与微弱的与氧空位相关的深缺陷发光 ,表明获得了接近化学配比的ZnO薄膜     

铜基镍镀层的化学退除

一、前言镀层的退除可以分为化学退除和电化学退除两大类。与电化学退除相比,化学退除具有操作方便、设备简单、节约时间、提高工效等优点。因此,本文就铜基镍镀层化学退除法作一讨论。本退除法具有如下特点: 1.既适用于铜基亦适用于铁基多层镀镍件。     

原子荧光光谱法测定锌及锌合金中砷含量

介绍了试样经稀硝酸溶解后，以硫脲--抗坏血酸(5%—5％)预还原As^5 至As^3 ，加热原子化炉体温度至700℃-800℃消除S6、Sn氢化物的干扰，在10%HCl介质中，砷被硼氢化钾还原为氢化物，用原子荧光光谱法测定．线性范围为0—100ng/ml；回收率为96．7—100％；变异系数为2．36％-6．3％，适于锌及锌合金中0．001%-0.05％范围砷的测定．     

锌电积的节电探讨

分析厂影响锌电积电能消耗的因素，提出了锌电积的节电对策与展望。     

锌精矿制粒沸腾焙烧新工艺的应用与改进

介绍了锌精矿制粒沸腾焙烧新工艺的工业化生产应用与技术改进情况 ,阐述了取得的成果及存在的问题