Visible-light photocatalysis in nitrogen-carbon-doped TiO2 films obtained by heating TiO2 gel-film in an ionized N2 gas

To use solar irradiation or interior lighting efficiently, we sought a photocatalyst with high reactivity under visible light. Nitrogen and carbon doping TiO₂ films were obtained by heating a TiO₂ gel in an ionized N₂ gas. The as-synthesized TiO_2−x−yN_xC_y films have shown an improvement over titanium dioxide in optical absorption and photocatalytic activity such as photodegradation of methyl orange under visible light. The process of the oxygen atom substituted by nitrogen and carbon was discussed. Oxygen vacancy induced by the formation of Ti³⁺ species and nitrogen and carbon doped into substitution sites of TiO₂ have been proven to be indispensable for the enhance of photocatalytic activity, as assessed by UV-Vis Spectroscopy and X-ray photoemission spectroscopy.     

Room temperature crystallization by RF plasma

The crystallization of amorphous thin films was achieved by radiofrequency (RF) plasma treatment. Although various amorphous films are crystallized after 2 min or so, the sample temperature is lower than 150 °C without compulsory cooling even when the films are treated for 1 h. This treatment works on amorphous films of various materials, independently of the film preparation method and substrate materials. Sol-gel-derived TiO₂ films were densified and simultaneously crystallized to anatase structure by the plasma treatment and the obtained films indicate almost the same photocatalytic activities as that of thermally crystallized TiO₂ films. Plasma-crystallized sputtered indium tin oxide (ITO) films have a bixbite structure and the resistivity reached to 1.6 × 10^− 4 Ω cm while the crystallization condition was not optimized. Amorphous silicon films with a small mount of crystallites were deposited by sputtering method and were crystallized by the plasma treatment.     

Fabrication of porous TiO2 film via hydrothermal method and its photocatalytic performances

Porous anatase (TiO₂) films were fabricated onto stainless steel substrates with Ti(OC₄H₉)₄ as a precursor via hydrothermal process. The crystallization and porous structure of TiO₂ film were dependent on the time and temperature of the hydrothermal reaction. A TiO₂ film with orderly porous structure and high crystallization was obtained upon treatment at 150 °C for 2 h. The grain size of TiO₂ is ca. 6 nm, and pore diameter is ca. 10 nm. Diffusion of Fe into the porous TiO₂ film occurred; Fe also diffused onto the surface of the film with the extension of hydrothermal reaction time or increase of the reaction temperature. The diffusion reaction has a large effect on the formation of porous TiO₂ film as well as its interface texture. However, it does not change the crystal phase of the TiO₂. The resultant TiO₂ film showed high photocatalytic activity towards degradation of gaseous formaldehyde.     

锐钛矿型TiO2胶体制备抗菌陶瓷的特性研究

利用锐钛矿晶型的纳米TiO2 胶体溶液 ,将硅胶作为粘结剂按不同配比加入TiO2 胶体 ,用提拉法在陶瓷表面形成均匀薄膜并在高温下烘烤成膜。研究TiO2 和硅胶在不同比例情况下的薄膜特性 ,讨论了退火温度对亲水性及光催化活性的影响 ,利用分光光度计测量了TiO2 薄膜对亚甲基蓝的分解活性 ,测定了薄膜对洗涤剂、消毒剂、3 %NaOH和沸水的抗腐蚀能力。结果表明 ,利用这种方法制备的薄膜具有较好的光致亲水性和光催化性 ,并具有良好的抗腐蚀能力。     

Preparation of monoclinic BiVO4 thin film by citrate route for photocatalytic application under visible light

A monoclinic BiVO₄ (mBiVO₄) film composed of nanoparticles with a size of 100 nm was prepared via a citrate-precursor chemical route. The BiVO₄ film was characterized by X-ray diffraction, scanning electron microscopy and absorption spectra. It was found that the mBiVO₄ film showed a photocatalytic activity of Acid Orange 7 (AO7) degradation in aqueous solution under visible-light irradiation (λ > 400 nm). The degradation efficiency was 78.9% in 3 h and basically remained constant in 10 repeated batch runs. The results demonstrated that the mBiVO₄ film had a high photocatalytic activity under visible light and good durability in repeated use.     

Photocatalytic and antibacterial properties of TaON-Ag nanocomposite thin films

TaON-Ag nanocomposite thin films with Ag nano-particles embedded in TaON were prepared by reactive co-sputtering of Ta and Ag in the plasma of (O₂ + N₂)/Ar. The deposition temperature was either at room temperature or 300 °C. These films were characterized mainly by UV-Vis photometry and scanning electron microscopy. It is found that Ag doping into the TaON films leads to several beneficial changes on film properties. It would reduce the optical band gap and, therefore, enhance the films' photocatalytic behavior. It is also found that Ag nano-particles may emerge on the surface of TaON with or without RTA. This could be much meaningful since Ag particles' appearance is closely related to the antibacterial property of TaON-Ag films. The results show that TaON-Ag films deposited at 300 °C have an outstanding antibacterial behavior with the illumination of visible light due to the synergistic effects of Ag and photocatalytic behavior of TaON.     

用纤维TiO2作光催化剂降解饮用水中腐殖质

用纤维状ＴｉＯ２作为光催化剂，采用间歇和连续两种操作方式，在Ｏ３／ＴｉＯ２／ＵＶ体系中处理含腐殖质的饮用水，使腐殖质去除率在９７％，纤维ＴｉＯ２可过滤回收，易于实际应用。     

Preparation and characterisation of titanium dioxide films for catalytic applications generated by anodic spark deposition

The advanced plasma electrochemical process of anodic spark deposition (ASD) was used to generate photoactive titanium dioxide films on titanium metal substrates. A shift to easier-to-machine substrates was demonstrated by the deposition of a titanium film with physical vapour deposition onto different materials such as glass, silicon, and stainless steel prior to ASD. Obtained films were characterised by scanning electron microscopy, surface area measurement (Brunnauer-Emmett-Teller method, BET), X-ray diffraction, electron-probe microanalysis, and glow discharge spectroscopy. Additionally, film thickness was determined by eddy current measurements. Standard ASD conditions were defined as 180 V applied voltage over a 180 s hold time, a voltage ramp of 20 V/s, a duty cycle of 0.5 and a frequency of 1500 Hz. Most prominent characteristics of the titanium films produced under these standard conditions are a film thickness of ≤80 μm, a surface area of approximately 51 m²/g (BET) and an anatase content of approximately 30% and rutile content of approximately 70%. Furthermore, the film formation process is elucidated and the dependence of film thickness on deposition time and the dependence of the anatase and rutile content on the deposited mass are shown for varying ASD conditions.