注氢硅中微结构缺陷的TEM观察

通过透射电子显微镜观察到注氢硅片中存在损伤带，损伤带的位置和注人氢的分布几乎一致，推断损伤带是由于氢的注入引起的。损伤带内主要以平行于正表面的{111}面状缺陷为主，另外还有斜交于正表面的{111}面状缺陷以及{100}面状缺陷，这是由于氢朝能量低的位置的迁移聚集而形成的。在损伤带的中间还可见到晶格紊乱团块和空洞，这是由于损伤带中间存在高浓度的氢和高密度的面状缺陷面导致形成的。     

Effect of Y2O3, CeO2 on Sintering Properties of Si3N4 Ceramics

The effect of rare earth oxides Y203 or Ce02 on sintering properties of Si3N4 ceramics was studied and the mechanism of assisting action during sintering was analyzed. The results in dicate that the best sintering properties appear in Si3N4 ceramics with 5% Y203 or 8% CeO2. Secondary crystallites are formed at grain boundaries after heat treatment,which decreases the amount of glass phase and contributes to the improvement of high-temperature mechanical properties of silicon nitride.     

薄Si膜对基底表面粗糙度的影响

利用ＺＹＧＯ光学干涉测量仪，散射积分测量法观测了光学元件表面均方根粗糙度．详细分析了薄Ｓｉ膜对基底均方根粗糙度的影响，由此认为薄膜并不总是复制基底表面的粗糙度，结果出现了薄膜降低表面粗糙度的现象．提出了一定厚度范围的薄Ｓｉ膜的表面粗糙度存在着一个稳定值的新设想．     

Measurements ofPVTx properties of refrigerant mixture HFC-32+HFC-125 in the gaseous phase

The experimental 156PVTx properties of an important binary refrigerant mixture, HFC-32 (difluoromethane)+HFC-125 (pentafluorethane), have been measured for three compositions, i.e., 50, 60, and 80 wt% HFC-32, by a constant-mass-method coupled with expansion procedure in an extensive range of temperaturesT from 320 to 440 K, of pressuresP from 1.8 to 5.3 M Pa, and of densities p from 50 to 124 kg · m^–3. The experimental uncertainties of the present measurements are estimated to be within ±7 mK in temperature, ±2 kPa in pressure, ±0.2% in density and ±0.02 wt% of HFC-32. The sample purities are 99.998 wt% for HFC-32 and 99.99 wt% for HFC-125. Seventy-eight second and third virial coeflicients for temperatures from 320 to 440 K have been determined by the present measurements.Paper presented at the Twelfth Symposium on Thermophysical Properties, June 19–24, 1994, Boulder, Colorado, U.S.A.     

Preparation and Properties of Sintering Additives Coated Si3N4 from Heterogeneous Nucleation Processing

The sintering additives such as Al2O3 and /or Y2O3 were coated on the surfaces of Si3N4 particles via heterogeneous nucleation processing using a buffered pH solution as the precipitation reagent .They nucleated and grew only on the surfaces of Si3N4 and did not form sol particles in solution by TEM observation .The isoelectric point(IEP) of coated Si3N4 was different from that of as-received Si3N4.The IEP of Al(OH)3-coated Si3N4 occurred at pH8.4, which is close to that of alumina .When Al(OH)3-coated Si3N4 particles were coated with Y(OH)3,the IEP of coated Si3N4 powder shifted from pH8.4 to pH9.2 ,similar to that of yttria.In addition ,the rheological data showed that Al2O3 and /or Y2O3 coated Si3N4 suspension is nearly Newtonian and that added Si3N4 suspension shows a shear rate thinning behavior.     

Mg-Si基热电化合物的研究现状

重点综述了Mg-Si基热电化合物的基本特性，该体系热电材料的制备方法与掺杂改性的研究进展，并提出了要重点解决的问题。     

Si_（1－x）Ge_x／Si定向耦合器的研制

在运用ＳｉＧｅ脊形波导单模条件和有效折射率法分析ＳｉＧｅ／Ｓｉ定向耦合器结构参数的基础上，采用分子束外延和各向异性腐蚀技术制备出Ｓｉ１－ｘＧｅｘ／Ｓｉ（ｘ＝０．０５）单模定向耦合器．在波长为１．３μｍ时，平均串音小于－１８．１ｄＢ，输出功率耦合效率达到９８．１％     

Design and Manufacture of GeSi/Si Superlattice Nanocrystalline Photodetector

According to Maxwell＇s theory, the optical transmission characteristics in GeSi/Si superlattice nanocrystalline layer have been analyzed and calculated. The calculated result shows that when the total thickness L is 340 nm, the single mode lightwave can be transmitted only at periodic number M≥15.5. In addition, at the direction of transmission, when the transmission distance is larger than 500 μm, the lightwave intensity is decreased greatly. Based on the above parameters, the design and manufacture of GeSi/Si superlattice nanocrystalline photodetector are carried out.     

浅谈诺兰达工艺控制

介绍了诺兰达炉氧平衡控制方法 ,对控制中常见的问题总结了一些相应措施。     

硅粉/酚醛制备低成本碳化硅陶瓷复合材料

以低成本的硅粉和酚醛为原料 ,采用浆料浸渍 热压成型 反应烧结法制备了Cf SiC单向板 ,并对工艺条件进行了探讨。制备得到的单向板的弯曲强度达到 45 6 .8MPa ,断裂韧性达到 7.94MPa·m1 2 。