区块整体调剖优化设计技术研究

为满足区块整体调剖技术优化设计的需要,研制开发了一套简便、适用的区块整体调剖优化决策系统,采用模糊综合评判技术建立调剖井选择优化模型、以反映注水井注水能力及油藏和流体特征参数筛选调剖剂,用井组数值模拟优化调剖剂用量和预测调剖效果。采用该方法既可加快计算速度、满足现场调剖的急需,又可保持数值模拟计算在效果预测方面的准确性。利用该方法对辽河油田龙11块整体调剖进行了优化设计,现场试验结果和预测结果相符,取得了较好的增油降水效果。图4表1参2（白宝君摘）     

BRIGADIER JOHN TILTMAN: ONE OF BRITAIN'S FINEST CRYPTOLOGISTS

Biography of Brigadier John Tiltman, who worked as a cryptologist for the British and American governments from 1920 to 1980.     

Characteristics of the Thrust Bearing with Accelerating Slider

Thrust bearing characteristics are examined in the motion generated by the accelerating slider. The selected case is the situation where the fluid within the lubricating film initially is at rest and at time zero the infinitely long slider assumes a velocity which is a function of time. Numerical solutions to the governing differential equations are obtained for the case of constant but arbitrary acceleration and for the case of acceleration proportional to time. The corresponding previously published analytical solutions are compared with those numerical results.     

ZnO layers grown by Atomic Layer Deposition: A new material for transparent conductive oxide

We demonstrate possibility of a control (by selection of zinc precursors and variation of a growth temperature) of electrical properties of ZnO films grown by Atomic Layer Deposition (ALD). ZnO films grown by ALD are used in test photovoltaic devices (solar cells) as transparent conductive oxides for upper, transparent layer in inorganic and organic solar cells, and as n-type partners of p-type CdTe.     

Auto CAD的层、块及菜单技术在机械图样中的应用

本文阐述了 Auto CAD 层、块及菜单技术在机械图样中的应用方法和技巧。从而使得计算机辅助机械设计的速度得以提高,并且可以减少磁盘空间的占有量。     

Applications of atomic layer chemical vapor deposition for the processing of nanolaminate structures

Atomic layer chemical vapor deposition (ALCVD) is a variant of a CVD process that involves surface deposition for the controlled growth of nano-thickness films. ALCVD is based on the self-limiting surface reaction with less than a monolayer chemisorption of chemical precursors. Advantages of the ALCVD process are uniform film growth on large area substrate, easy control of composition in atomic level, low growth temperature, multi-layer thin film growth with various composition, and wide process window. Since initially developed by Suntola in 1977, ALCVD has been used for the growth of various materials, including oxides, nitrides, metals, elements, and compound semiconductors. This article reviews the basic principle, mechanism, characteristics, and applications of ALCVD.     

PROFIBUS—DP在高炉自动化系统中的应用

本文剖析了Profibus现场总线的通讯原理及特性。具体描述了Profibus—DP在高炉自动化系统硬件和软件方面的应用。同时结合现场实践及施工调试，对现场总线故障的诊断方式提出了有效可行的几点意见。     

WAP网关中安全层的设计与实现

Internet技术和无线网络技术的快速发展使它们已经成为迈向信息社会的两个重要标志。如何结合两者的技术优势,不受信息源和用户访问位置的限制,以统一的标准向用户提供无处不在的信息服务,正成为网络界和电信业界共同关注的一个焦点问题。而WAP协议正是为此而应运而生。文章介绍了笔者和北京Si-Tech公司共同开发的WAP网关框架和模块结构,并重点讨论了WTLS的特点和实现内容,最后描述了所实现的WTLS层的处理机制和数据结构。     

基于协作缓存的VOD服务器端Cache设计

近年来,随着计算机网络技术和多媒体技术的发展,视频点播服务已逐渐成为现实。分布式VOD(VideoOnDemand)服务器系统的提出是为了支持更多的大量并发数据流,和单一服务器相比,这样的结构拥有更好的使用效率、可靠性和可扩展性。协作缓存CC(cooperativecache)技术将各服务器的内存协调工作,形成全局的cache。这样的结构不仅充分发挥了分布式VOD服务器结构的特点,同时也增大cache容量,提高系统全局命中率,从而提高了系统效率。该文在协作缓存技术基础上,针对流媒体和VOD系统的特点,提出了GBBcache替换算法。该算法以数据块的生命周期作为出发点,充分考虑了现有用户和请求接入用户的服务需求,提高了内存使用效率。笔者对该算法进行了理论分析,并证明了它在性能上与传统的cache替换算法相比的优越性。