光刻对准技术研究进展

回顾了光刻对准技术的发展功能,对各种对准方法的原理和特点进行了分析和评价,介绍了几种典型主流光刻对准系统结构形式,并对光刻对准技术前景进行了描述与展望。     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

石油勘探MEMS Sensor生产过程中工艺优化

介绍一种新的电容式石油勘探MEMS Sensor生产过程中氧化、光刻、刻蚀主要工艺的选择原则和理论依据。