变频器在单张纸平版印刷机改造中的应用

本文主要介绍了变频器在国产单双色单张纸平版印刷机改造中的应用，以及对变频器的一些功能的要求。     

Effects of lithography non-uniformity on device electrical behavior. Simple stochastic modeling of material and process effects on device performance

Understanding how lithographic material and processing, affect linewidth roughness (LWR), and finally device operation is of immense importance in future scaled MOS transistors. The goal of this work is to determine the impact of LWR on device operation and to connect material and process parameters with it. To this end, we examine the effects of photoresist polymer length and acid diffusion length on LWR and transistor performance. Through the application of a homemade simulator of the lithographic process, it is shown that photoresists with small polymer chains and small acid diffusion lengths form lines with low LWR and thus lead to transistors with more reliable electrical performance.     

Spontaneous Formation of Ordered Lateral Patterns in Polymer Thin‐Film Structures

The understanding of the lateral morphology stability of thin polymer devices is of fundamental importance. In this work, the lateral morphology in a model system consisting of thin polymer films capped with thin metal layers on a Si substrate is investigated. When the model system is heated above a critical temperature, a characteristic surface topographic structure is observed that has a well‐defined periodicity but random orientation. It is shown that the minimum temperature, T_min, required for the surface pattern to be observed decreases with increasing polymer‐film thickness. Increasing either the metal‐ or polymer‐layer thickness increases the characteristic wavelength of the topography. It is believed that the dominating driving force for the surface corrugated‐pattern formation is the thermal‐expansion‐coefficient mismatch of the capping layer and the substrate. A theoretical model based on local bending of a thin, stiff surface film on a thin, elastic medium is used to provide a quantitative analysis of the surface morphology. The calculated minimum temperature required for the surface morphology and the periodicity of the surface patterns to form are in strong agreement with the experimental results. By contrast, systems with prefabricated topographic patterns within any of the three layers (polymer, metal, substrate) produce highly anisotropic surface topographies aligned perpendicular to the prefabricated topographic structure. It is also found that, in a model system with pre‐patterned polymer films, a much higher critical temperature is required for the surface morphology to be observed. The changes in apparent stability and morphological orientation in the pre‐patterned systems can be understood as a result of the anisotropic release of the lateral surface stress during the heat treatment.     

辐射固化的国际现状——第一届亚洲地区国际辐射固化会议简介

辐射固化技术是辐射加工技术的分支,八十年代以来发展迅速,年增长率在10％以上。用辐射固化的产品种类很多,而磁性介质,隔离涂层,陶瓦瓷砖的装饰面,石膏板装饰表层、印刷板、光纤保护层,电子技术、蚀刻技术、压敏粘合剂等等。实现辐射固化首先要考虑好有关的化学问题。为发展辐射固化技术也应介绍UV/EB固化的安全操作、工业操作规程及专利法等,有关该领域的设备及工业获得很大的进展。     

Bilayer hydrogel assembly

The combination of two hydrogel layers based on photo-cross-linkable poly(dimethyl acrylamide) (PDMAAm) as base layer and poly(N-isopropyl acrylamide) (PNIPAAm) as top layer forms a bilayer assembly where, the base layer is highly swollen and the top layer shows temperature responsive swelling. Characterization was done by a combination of surface plasmon resonance spectroscopy and optical waveguide spectroscopy as well as atomic force microscopy. The PDMAAm and PNIPAAm within the bilayer assembly retain their swelling behavior, which they showed as a separate layer. Due to the presence of the photo-cross-linker such bilayer films can be patterned to develop surfaces with different properties at different regions.     

极紫外光刻真空工件台技术研究

在极紫外光刻系统中,真空工件台的运行精度、速度、加速度以及动态定位和扫描同步性能是影响整机成像质量、套刻精度和产率的重要因素。结合极紫外光刻机的工作原理和发展现状,论述了极紫外光刻机真空工件台系统的特征、组成及其关键技术。     

A lithographic approach to determine volume expansion factors during anodization: Using the example of initiation and growth of TiO2-nanotubes

The present work investigates the formation of nanotubes by anodizing titanium at 20 V in glycerol containing either 0.175 M or 0.35 M NH₄F. A photoresist-masking method of thin Ti films allows to use SEM cross-sections to directly obtain information on oxide morphology, layer thickness and metal substrate loss. Therefore not only features of the initial growth stages but also oxide expansion factors can accurately be determined. The expansion factors were found to be 2.4 for the initial formation of a barrier layer, 1.7–1.9 during pore initiation and 2.7–3.1 as the main nanotubes develop. These values (>2.6) suggest substantial contribution to steady state tube growth by a plastic oxide flow mechanism. Combined with RBS efficiency measurements the method presented here allows facile and direct investigation of the mechanism of pore/tube formation.     

光刻设备中工件台激光测长原理

通过对双频激光干涉仪的原理、结构、双频产生机理进行分析,阐述激光干涉仪在光刻设备中的实际应用,探讨激光干涉仪技术。     

Efficient electron beam condensing for low-energy microcolumn lithography

Low-energy electron beam lithography has been performed with a microcolumn by adopting a new technique that condenses the electron beam efficiently. To increase the probe current while keeping the kinetic energy of electrons sufficiently low, the negative or positive bias has been applied to the accelerator electrode, which reduces the divergence of the electron beam and hence makes more electrons pass through the microcolumn. With this technique, the probe current more than 1 nA has been achieved, which is large enough for the practical application of microcolumn lithography even when the kinetic energy of electrons is as low as 160 eV. The results of microcolumn lithography by using the condensed electron beam with a low-energy of 160 and 327 eV are also presented.