Mo／SiO2软X射线多层膜的结构研究

本文用磁控射方法制备了几种Ｍｏ／ＳｉＯ２多层膜。在北京同步辐射装置（ＢＳＲＦ）的衍射站上测量了其氏角Ｘ射线衍射（ＸＲＤ）谱，并利用基于光学动力学理论的递推公式对低角Ｘ射线衍射谱进行了拟合，定量分析了膜层的周期结构和界面度以及界面度与层数、层厚的关系。同时用高分辩电子显微镜（ＨＲＥＭ）对一样品的截面进行了观察。     

源气体流量比对F-DLC薄膜结构的影响

以高纯石墨作靶，CHF3/Ar作源气体采用反应磁控溅射法制备出了氟化类金刚石（F-DLC）薄膜。拉曼光谱表明，CHF3相对流量的增加会引起薄膜的D峰与G峰强度之比I（D）/I（G）减小，晶粒增大，芳香环结构出例下降。红外吸收光谱分析证实了这些推论，指出这是由于薄膜中氟含量上升的结果。     

Si3N4／CrN nanostructured muitilayers grown by RF reactive magnetron sputtering

The amorphous/polycrystalline Si3N4/CrN nancrstructured multilayer films have been prepared by radio frequency (RF) reactive magnetron sputtering. The composition, microstructure and mechanical properties of these films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM) and nano-indentation. The CrN and Si3N4 single layer films are polycrystalline face centered-cubic and amorphous structures, respectively. The CrN and Si3N4 layers are nearly stoichiometric. The HRTEM image indicates that the interfaces are planar and modulation structure is clear in multilayers. The hardness values of Si3N4/CrN multilayers are between those of the constituent CrN and Si3N4 films at a substrate temperature of 20℃, and are somewhat higher than those of Si3N4 films at a deposition temperature of 500℃. There is no superhardness effect in the Si3N4/CrN multilayers. Based on the experimental results, the hardening mechanisms in the multilayers have been discussed.     

单片机及自组织模糊控制在可控硅磁控溅射靶极电源中的应用

本文介绍了由单片机组成的可控硅磁控溅射靶极电源自组织模糊控制系统，给出了主要硬件电路，对软件功能进行了说明，尤其对自组织模糊控制算法作了较为详细的论述。该系统动态特性良好，抗干扰能力强，有自组织、自学习和系统辩识的能力。     

同轴磁控溅射离子镀膜在装铈膜和超硬膜中的应用

同轴式磁控溅射离子镀膜机是磁控溅射和离子镀膜相结合的一种镀膜设备。从不小于1.5×2m 大面积基底上所镀膜层的均匀性和实际应用的可行性来看,是一种较好的成膜手段。1.国内现状目前国内生产蒸发式镀膜设备的厂家不少。这种方法是以高纯铝丝或铁铬镍合金丝等作为膜材,在大面积上镀镜或镀建材玻璃膜。普遍认为蒸发膜存在着如下问题: