Laser scanning path generation considering photopolymer solidification in micro-stereolithography

It is essential to automate the scanning path generation process to effectively implement the micro-stereolithography. However, a scanning path that is generated based only on a 3D CAD model introduces dimensional inaccuracies. In micro-stereolithography, the photopolymer solidification is affected by fabrication conditions, such as the optical properties (laser power, laser scanning speed, laser scanning pitch focusing condition, etc.) and material properties of the photopolymer. Thus, the photopolymer solidification phenomena must be considered when generating a laser scanning path. In this paper, a scanning path generation algorithm that uses 3D CAD data and considers the photopolymer solidification phenomena is proposed to improve the dimensional accuracy in micro-stereolithography. Multi-line photopolymer solidification experiments were performed for various laser scanning conditions to examine the photopolymer solidification phenomena. From these experiments, linear relations between the solidification length (width) and scanning length (width) were acquired and stored in a database. Subsequently, these data were utilized to compensate the scanning path of the laser beam. In addition, experiments for determining the layer thickness in the z-direction were performed and these results were also used in the scanning path generation algorithm.This research was supported by the Highly Advanced National Project (http://www.most.go.kr), which performs some of the National R&D Program, and sponsored by the Korean Ministry of Science and Technology under the contract project code M10214000116-02B1500-02010.     

Effect of dose rate and length of storage on the ESR signal strength in irradiated chicken bone

One hundred and twenty-five pairs of chicken drumsticks were randomly allocated to one of five dose rates: 5, 10, 15, 20 or 600 kGyh-. The highest dose rate was obtained using a linear accelerator whilst the remaining dose rates were provided using a ⁶⁰Co gamma source. Each batch of 25 pairs was further divided into groups five of which were stored at 4°C for 0, 7, 14, 21 or 28 days. ESR spectroscopy was used to measure the intensity of the radiation-induced signal. There was a quadratic relationship between ESR signal strength and dose rate, which although statistically significant is unlikely to be of practical importance. The magnitude of the ESR signal declined by about 20% over the first 14 days of storage at 4°C and thereafter the decrease was minimal.     

反射衰减诊断激光光束的应用分析

介绍了普通光学元件反射诊断激光光束的应用,提出了利用平面平晶的平面反射进行光能衰减,详细论述了采用该方法进行光能衰减的可行性,分析了平面平晶反射衰减中反射光S偏振态和P偏振态能量的差异,对激光束诊断的影响和解决方法,结合半导体绿激光器的光束诊断进行了应用分析。实验证明,该方法结构简单、调整方便、误差小,利用普通平面平晶反射衰减即可满足激光强度的匹配要求,实现了待测激光束无失真取样,达到很好的测试效果。     

Metallographic sample prepared by ion beam etching

Ion beam etching technique was used to reveal the metallograhpic microstructure and interface morphology of electroplating chromium coating, in particular, whose substrate surface layer was treated in advance by laser quenching. Chemical etchings were also conducted for comparison. The reveal microstructures were observed and analyzed by scanning electron microscopy. The results show that ion beam etching can reveal well the whole microstructures of composite coating-substrate materials.     

A comparison of finite elements for nonlinear beams: the absolute nodal coordinate and geometrically exact formulations

Two of the most popular finite element formulations for solving nonlinear beams are the absolute nodal coordinate and the geometrically exact approaches. Both can be applied to problems with very large deformations and strains, but they differ substantially at the continuous and the discrete levels. In addition, implementation and run-time computational costs also vary significantly. In the current work, we summarize the main features of the two formulations, highlighting their differences and similarities, and perform numerical benchmarks to assess their accuracy and robustness. The article concludes with recommendations for the choice of one formulation over the other.     

离子束溅射淀积光学薄膜的膜厚均匀性实验

介绍了离子束溅射技术改善薄膜均匀性的两种方法。研究了修正板技术,根据工程需要将修正板技术应用于行星转动条件下的光学薄膜的均匀性修正。分别研究了靶摆动和不摆动的情况下,淀积薄膜的均匀性修正。实验结果表明,修正后的均匀性结果优于 1%,能满足实际应用的要求;靶摆动修正的均匀性结果优于修正板技术。     

The effect of some instrument operating conditions on the x-ray microanalysis of particles in the environmental scanning electron microscope

The objective of this investigation was to evaluate the practical effects of electron beam broadening in the environmental scanning electron microscope (ESEM) on particle x-ray microanalysis and to determine some of the optimum operating conditions for this type of analysis. Four sets of experiments were conducted using a Faraday cage and particles of copper, glass, cassiterite, andrutile. The accelerating voltage and chamber pressure varied from 20 to 10 kV and from 665–66 Pa (5.0 to 0.5 torr), respectively. The standard gaseous secondary electron detectors (GSED) and the long environmental secondary dectectors (ESD) for the ESEM were evaluated at different working distances. The effect of these parameters on the presence of artifact peaks was evaluated. The particles were mounted on carbon tape on an aluminum specimen mount and were analyzed individually and as a mixture. Substrate peaks were present in almost all of the spectra. The presence of neighboring particle peaks and the number of counts in these depended upon the operating conditions. In general, few of these peaks were observed with the long ESD detector at 19 mm working distance and at low chamber pressures. More peaks and counts were observed with a deviation from these conditions. The most neighboring peaks and counts were obtained with the GSED detector at 21.5 mm working distance, 10 kV accelerating voltage, and 665 Pa (5.0 torr) chamber pressure. The results of these experiments support the idea that the optimum instrumental operating conditions for EDS analysis in the ESEM occur by minimizing the gas path length and the chamber water vapor pressure, and by maximizing the accelerating voltage. The results suggest that the analyst can expect x-ray counts from the mounting materials. These tests strongly support the recommendation of the manufacturer to use the long ESD detector and a 19 mm working distance for EDS analysis. The results of these experiments indicate that neighboring particles millimeters from the target may contribute x-ray counts to the spectrum.     

SURFACE ROUGHNESS OF SPUTTERED SILICON. II. MODEL VERIFICATION

Experimental verification of the mathematical surface roughness model for sputtered silicon was performed. The beam shape and its significant level of intensity were determined first by measuring the topography of craters sputtered by focused ion beam (FIB). Then the beam function was generated for various combinations of beam parameters. The material function was developed both by theoretical and experimental analysis. These two functions were then used in the model to calculate the theoretical surface roughness. Microsurface analysis was formed by FIB sputtering of a (100) silicon wafer. The surface roughness at the bottom of the sputtered features was then measured using an atomic force microscope. The theoretical surface roughness was found to be within ±1 and ±5 nm of the measured surface roughness with the measurement uncertainty (standard deviation) of about ±0.36 and ±0.85 nm for R_a and R_t, respectively.     

30.4 nm Si/C多层膜反射镜的制备与测量

采用离子束溅射镀膜装置制备了一种新的材料组合Si/C多层膜 ,用于 30 4nm波段的正入射多层膜反射镜。并用软X射线反射率计测得其反射比最大值为 0 14。有效地抑制了 15 0nm处的二级衍射峰。