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An electrostatic discharge(ESD) detection circuit with a modified RC network for a 90-nm process clamp circuit is proposed.The leakage current is reduced to 4.6 nA at 25℃.Under the ESD event,it injects a 38.7 mA trigger current into the P-substrate to trigger SCR,and SCR can be turned on the discharge of the ESD energy.The capacitor area used is only 4.2μm~2.The simulation result shows that the proposed circuit can save power consumption and layout area when achieving the same trigger efficiency,compared with the previous circuits.  相似文献   
2.
提出一种90nm 1.2VCMOS工艺下只用低压器件的新型3×VDD容限的静电检测电路.该电路利用纳米工艺MOSFET的栅极泄漏特性和反馈技术来控制触发晶体管并进而开启箝位器件(可控硅整流器),同时采用多级叠加结构以承受高电压应力.在静电放电时,该电路能产生38mA的触发电流.在3×VDD电压下工作时,每个器件都处于安全电压范围,在25℃时漏电流仅为52nA.仿真结果表明,该检测电路可成功用于3×VDD容限的接口缓冲器.  相似文献   
3.
A MOSFET-based electrostatic discharge (ESD) power clamp circuit with only a 10 ns RC time constant for a 0.18-μm process is proposed. A diode-connected NMOSFET is used to maintain a long delay time and save area. The special structure overcomes other shortcomings in this clamp circuit. Under fast power-up events, the gate voltage of the clamp MOSFET does not rise as quickly as under ESD events, the special structure can keep the clamp MOSFET thoroughly off. Under a falsely triggered event, the special structure can turn off the clamp MOSFET in a short time. The clamp circuit can also reject the power supply noise effectively. Simulation results show that the clamp circuit avoids fast false triggering events such as a 30 ns/1.8 V power-up, maintains a 1.2 μs delay time and a 2.14 μs turn-off time, and reduces to about 70% of the RC time constant. It is believed that the proposed clamp circuit can be widely used in high-speed integrated circuits.  相似文献   
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提出两种90nm 1VCMOS工艺下电压触发的静电放电检测电路.电压触发的静电检测电路避免了纳米级工艺中的MOS电容栅极漏电问题.该检测电路包含一个反馈回路,提高了检测电路的触发效率,同时增加了反馈关断机制,在芯片工作时检测电路由于某些特殊因素误触发后,仍然可以自行关断,而不会进入闩锁状态.在3V静电放电仿真时,该电路能产生28mA触发电流,以开启箝位器件来泄放静电电荷.在25℃正常电压下工作时,漏电流仅为42(45)nA.仿真结果表明,该检测电路可成功用于纳米级CMOS工艺的集成电路静电保护.  相似文献   
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