Experimental results on adiabatic coupling into SOI photonic Crystal coupled-cavity waveguides

The experimental implementation of an adiabatic coupling technique for efficient coupling between photonic crystal single-line defect waveguides and coupled-cavity waveguides is reported. The samples were fabricated in a silicon-on-insulator substrate using 248-nm-deep ultraviolet lithography. Experimental results are compared with three-dimensional (3-D) finite-difference time-domain simulations. Furthermore, the discrepancies between two-dimensional and 3-D simulation results are analyzed.     

Preferentially oriented BaTiO3 thin films deposited on silicon with thin intermediate buffer layers

Barium titanate (BaTiO₃) thin films are prepared by conventional 2-methoxy ethanol-based chemical solution deposition. We report highly c-axis-oriented BaTiO₃ thin films grown on silicon substrates, coated with a lanthanum oxynitrate buffer layer of 8.9 nm. The influence of the intermediate buffer layer on the crystallization of BaTiO₃ film is investigated. The annealing temperature and buffer layer sintering conditions are optimized to obtain good crystal growth. X-ray diffraction measurements show the growth of highly oriented BaTiO₃ thin films having a single perovskite phase with tetragonal geometry. The scanning electron microscopy and atomic force microscopy studies indicate the presence of smooth, crack-free, uniform layers, with densely packed crystal grains on the silicon surface. A BaTiO₃ film of 150-nm thickness, deposited on a buffer layer of 7.2 nm, shows a dielectric constant of 270, remnant polarization (2P_r) of 5 μC/cm², and coercive field (E_c) of 60 kV/cm.     

分子动力学方法的模拟参数对结果的影响

主要研究了利用分子动力学方法(MD)模拟等离子体与材料表面相互作用过程时分子动力学方法的参数对模拟结果的影响.详细分析了Berendsen热浴的应用时间、耦合强度和模拟时间量(单个轨迹的作用时间、弛豫时间)对模拟结果的影响,结果表明,热浴的应用时间对模拟结果的影响很大,而其它参数对模拟结果没有太大的影响.     

Focusing Polarization Diversity Grating Couplers in Silicon-on-Insulator

We report on compact focusing polarization diversity grating couplers in silicon-on-insulator, which can be used to overcome the polarization dependence of nanophotonic integrated circuits. The minimum fiber-to-fiber polarization dependent loss is 0.4 dB and the focusing grating couplers are as performant as standard 2-D-grating couplers without focusing. In addition, the focusing property of the gratings results in an 8-fold length reduction of the coupling structure as compared to standard nonfocusing 2-D-grating versions.     

Silicon-on-Insulator Spectral Filters Fabricated With CMOS Technology

We give an overview of recent progress in passive spectral filters and demultiplexers based on silicon-on-insulator photonic wire waveguides: ring resonators, interferometers, arrayed waveguide gratings, and echelle diffraction gratings, all benefit from the high-index contrast possible with silicon photonics. We show how the current generation of devices has improved crosstalk levels, insertion loss, and uniformity due to an improved fabrication process based on 193 nm lithography.