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W. M. ARMSTRONG A. C. D. CHAKLADER M. L. A. De CLEENE 《Journal of the American Ceramic Society》1962,45(9):407-412
In a study of the interfacial reactions between SiO2 and the refractory metals Ta, Nb, V, and Mo, a wide range of reactions was observed. Investigation of normal and tapered sections at the interface showed considerable reaction and solution in the case of V, reactions in the cases of Ta and Nb, and very little reaction in the case of Mo. The major interfacial reaction was oxygen corrosion followed by (most possibly) reaction with silica glass to form silicates. X-ray data showed that the oxides were the principal components at the interface. Evidence was obtained for the formation of silicides in the case of the system Ta-SiO2 . A very low melting silicate was formed in the case of V and silica. 相似文献
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