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Gupta Abhinav Rai Sanjeev Kumar Nitish Sigroha Deepak Kishore Arunabh Pathak Varnika Rahman Ziya Ur 《SILICON》2022,14(3):1005-1012
Silicon - It is a well-known fact that the gate stacking is used to improve the electrostatic behavior of Si0.5Ge0.5 Junctionless Gate-All-Around (JL-GAA) MOSFETs. In gate stacking, the high-k... 相似文献
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