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Uchayash Sajid Mahfuz Datta Shamik Touhami Ahmed Rahman Al Mazedur Huq Hasina F. 《SILICON》2023,15(5):2323-2338
Silicon - Boron doped pSi was deposited on Si substrate in the RF magnetron sputtering system by varying three process parameters, namely-sputtering power, working pressure, and Ar gas flow rate.... 相似文献
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