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在原子力显微镜(atomic force microscope,AFM)原位定位观察中,时常会遇到因失去标记物而无法定位的情况。本文介绍了一种在表面标记物被覆盖后,运用原子力显微镜的操纵功能,将标记物上的覆盖物“扫”开,重新找到标记物并用于精确定位的方法。以对高序热解石墨(highly ordered pyrolytic graphite,HOPG)表面牛血清白蛋白(bovine serum albumin,BSA)吸附的原位观察为例,在BSA膜覆盖HOPG表面的原子台阶后.采用接触模式AFM扫描,将BSA“扫”开,露出HOPG原子台阶作为标记,对图像上的结构进行精确定位。通过调节设置点、扫描范围、扫描速率、扫描线数、偏置值等戍像参数及扫描时间,可以控制“清扫”的力度和范围。 相似文献
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Surface morphologies of the films of poly [styrene-b-(ethylene-co-butene)-b-styrene] (SEBS) have been studied by using tapping-mode atomic force microscopy (TM-AFM). The films of block copolymer were prepared both by spin-coating on mica and by solvent-casting on different solution surfaces. For spin-coating samples, the effect of solution concentration, solvent, and annealing temperature are investigated. It is shown that changing the concentration of the solution makes no difference on the morphology of the film of the block copolymer. The microstructures are quite stable during thermal annealing; only the size of the domains changes toward the equilibrium configuration. However, solvent annealing can notably change the microstructures. When different selective solvents are used for film spin-coating, different morphologies can be obtained and explained by the different solubility parameters of the solvents. As expected, significant different morphologies in the top and the bottom surfaces of the casting films were observed. The images of the top surfaces reveal cylinder microdomains, while those of the bottom surfaces were spherical morphologies. 相似文献
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