Fuel combustion test in constant volume combustion chamber with built-in adaptor

Combustion tests of pre-mixture of methane and air in constant volume combustion chamber(CVCC) have been carried out by means of flame propagation photo and gas pressure measurement,the effects of CVCC body temperature,intake pressure of pre-mixture of methane and air,equivalence ratio and location of the built-in adaptor have been investigated.The whole combustion chamber can be divided into two parts,i.e.the upper combustion chamber and the lower combustion chamber,by the built-in adaptor with through hol...     

铝合金ADC12Z高压铸造过程中铸件与铸型间界面热交换系数的研究

通过采集高压铸造过程中铸型内部温度的变化曲线,采用热传导反算法,求解了以铝合金ADC12Z为铸件材料的铸件-铸型界面换热系数,分析了该界面换热系数随铸件厚度的变化规律.计算及分析结果表明:在压铸过程中,铸件-铸型界面换热系数迅速升至最大值,随后下降,凝固结束后趋于稳定.铸件厚度增大不仅提高了换热系数,而且对换热系数的变化趋势也有很大影响.同时,不同厚度的铸件,其固相率和冷却速率的变化规律也有较大区别.     

Expansion microscopy

Super‐resolution optical microscopy techniques have revolutionized how we see and understand biology. In recent past, a new super‐resolution optical microscopy technique called expansion microscopy (ExM) was developed. Unlike other pre‐existing super‐resolution imaging techniques, this technique achieves super‐resolution by physically expanding biological specimens via a swellable hydrogel. After the development of ExM, various techniques based on ExM but with improved performance in various aspects, have been developed. In this review, we introduce the basic principles of ExM and its variants. and compare the advantages and disadvantages of these techniques. In addition, we present the applications of ExM techniques in various fields.     

Electrical Properties of Sputter-deposited ZrO2-based Pt/ZrO2/Si Capacitors

Pt/ZrO2/Si sandwich structures where ZrO2 is deposited by radio frequency （r.f.） magnetron sputtering using a Zr target in an atmosphere of O2/Ar gas mixture, were fabricated and the effects of the O2/Ar flow ratio in the reactive sputtering process, the annealing temperature, the ZrO2 film thickness on the structure, the surface roughness of ZrO2 films and the electric properties of Pt/ZrO2/Si metal-oxide-semiconductor （MOS） capacitors were investigated. The optimum process parameters of the Pt/ZrO2/Si capacitor based on reactively sputtered-ZrO2 determined in such a way as the capacitance is maximized and the leakage current, the oxide charge, and the interface trap density are minimized that is the O2/Ar flow ratio of 1.5, the annealing temperature of 800℃, and the film thickness of 10 nm. Also the conduction mechanism in the Pt/ZrO2/Si capacitor has been discussed.     

Silicone-coated polyimide films deposited by surface dielectric barrier discharges

Hybrid dielectric barrier discharges are investigated for plasma generated on the surface of a dielectric layer, where two conducting electrodes of high voltage and ground are formulated on the upper and bottom surfaces. Using a flexible thin polyimide-film of a thickness ranging from 25 to 125 μm, a plasma is generated with a voltage of about 1 kV and a frequency of 40 kHz.However, the surface of the dielectric layer was etched through a chemical reaction involving plasma oxygen radical species, and thus the polyimide films failed readily, resulting in dielectric breakdown within short operating time ranging from a few minutes to several tens of minutes,based on the film thicknesses of 25 μm and 125 μm, respectively. These plasma erosions were prevented by coating the polyimide surface with a 25 μm thick silicone paste. The siliconecoated film surface was then reinforced remarkably against plasma erosion as the organic polymer was vulnerable to chemical reaction of the plasma species, while the inorganic silicone exhibited a high chemical resistance against plasma erosion.     

Effects of honing treatment on AIP-TiN and TiAlN coated end-mill for high speed machining

The objective of this work is to compare the tool performance of TiN and TiAlN coated carbides end-mills deposited by an arc ion plating (AIP) method, using honing treatment to polish the cutting edge surface sleekly. The curve of surface roughness versus honing time showed a rapid improvement initially and thereafter became steady, manifesting a saturation effect. The optimal honing time related to surface roughness was determined to be approximately 20 s. As the surface roughness increased, the critical loads reduced. At an average surface roughness (Ra) of 0.028 μm, the highest critical loads of TiN and TiAlN coating layers were 98 and 114 N, respectively. Tool performances of uncoated and coated tools were conducted under high speed machining (HSM) of AISI D2 cold-worked die steel (62 HRC). Consequently, the TiAlN coated end-mill using honing treatment showed excellent tool life under HSM conditions.     

PURIFICATION AND CHARACTERIZATION OF POLYPHENOL OXIDASE FROM POTATO: I. PURIFICATION AND PROPERTIES

Polyphenol oxidase (Isozyme I) from potato was extracted and purified with ammonium sulfate, cation-exchange (Bio-Rad Bio-Scale S2) and Sephadex G-100 column chromatography. The enzyme was purified 11.8 fold resulting in a specific activity of 250.3 units/mg. Optimum pH of the enzyme was 6.6. Optimum temperature of the enzyme was 40C and its half-life was 0.8 min at 70C. The K_mfor catechol, pyrogallol, 4-methyl catechol, caffeic acid and L-DOPA were 4.11 mM, 0.61 mM, 0.78 mM, 0.50 mM and 32 mM, respectively. However, monophenols such as tyrosine, p-cresol and 1-naphtol did not show any activity. Data for V_max/K_m which represents catalytic efficiency show that 4-methyl catechol has the highest value. The molecular weight of the active enzyme was 86,000 Da, composed of two identical subunits. The number of Cu²⁺ ions bound was found to be 2 per enzyme molecule.     

SSI体系阻尼比实测及其分布规律研究

 阻尼比是结构动力分析的重要动力特性参数,目前规范采用的阻尼比是基于刚性地基或近似刚性地基的试验结果,未能考虑土与结构相互作用(SSI)效应。针对SSI效应问题,体系阻尼比的准确评估是其动力分析的重要前提。为了实现实际SSI体系阻尼比值较准确的识别,提出环境激励下SSI体系阻尼比测试与识别方法,并应用这一识别方法,给出西安及其周围地区82幢各类SSI体系基本等效黏滞阻尼比的实测识别结果。同时在实测阻尼比数据的基础上,初步研究实际SSI体系阻尼比的总体分布规律、影响因素和取值范围。     

Optical diffraction gratings embedded in BK-7 glass by low-density plasma formation using femtosecond laser

The optical embedded diffraction gratings with the internal refractive index modification in BK-7 glass plates were demonstrated using low-density plasma formation excited by a high-intensity femtosecond (130 fs) Ti: sapphire laser (λp=790 nm). The refractive index modifications with diameters ranging from 400 nm to 4 μm were photoinduced after plasma formation occurred upon irradiation with peak intensities of more than 1×1013 W/cm2. The graded refractive index profile was fabricated to be a symmetric around the center of the point at which low-density plasma occurred. The maximum refractive index change (Δn) was estimated to be 1.5×10-2. Several optical embedded gratings in BK-7 glass plate were demonstrated with refractive index modification induced by the scanning of low-density plasma formation.