Whisker and hillock growth via coupled localized Coble creep,grain boundary sliding,and shear induced grain boundary migration

A model incorporating the effects of grain geometry and size and grain boundary properties on the growth of whiskers and hillocks has been developed based on coupling between localized Coble creep and grain boundary sliding. For both whiskers and hillocks accretion of atoms by Coble creep on grain boundary planes normal to the growth direction is limited by grain boundary sliding on planes parallel to the direction of whisker growth. If the accretion-induced shear stresses are not coupled to grain boundary migration a whisker forms when sliding occurs. In the case of hillocks an additional coupling between grain boundary sliding and shear-induced grain boundary migration leads to the observed lateral growth. By incorporating grain size and geometry, a structure-dependent grain boundary sliding coefficient and measured film stresses the local conditions for whisker growth, including the growth rates, can be calculated. As described here, other commonly observed whisker and hillock morphologies and geometries are consistent with this model, as are the effects of a surface oxide film and thermal cycling.     

A Predictive Model for Whisker Formation Based on Local Microstructure and Grain Boundary Properties

Whisker and hillock formation in thin films is well known as a highly local mechanism for stress relaxation, where in many cases, only a few whiskers form out of thousands of grains in a film. In this article, the microstructural characteristics for specific grains to form whiskers in β-Sn films are discussed in light of our recent whisker growth model, establishing a relationship among grain boundary sliding limited Coble creep, surface grain geometry, and film stress for different stress conditions, including for thermal cycling. Through our recent finite-element simulations of stresses induced by room-temperature aging and thermal cycling of textured microstructures, the role of elastic and thermoelastic anisotropy in creating preferred whisker formation sites and the general propensity of a film to form whiskers have been proposed for a range of β-Sn film textures. Taken together, these models suggest a strategy for identifying the effects of local microstructure and β-Sn anisotropy on whisker formation. If these predictions are accurate, then whisker growth risk may be effectively reduced by engineering film microstructures and textures for specific applications and stress conditions.