Microwave annealing effects on ZnO films deposited by atomic layer deposition

Zinc oxide thin films deposited on glass substrate at 150°C by atomic layer deposition were annealed by the microwave method at temperatures below 500 °C.The microwave annealing effects on the structural and luminescent properties of Zn O films have been investigated by X-ray diffraction and photoluminescence.The results show that the MWA process can increase the crystal quality of Zn O thin films with a lower annealing temperature than RTA and relatively decrease the green luminescence of Zn O films.The observed changes have demonstrated that MWA is a viable technique for improving the crystalline quality of Zn O thin film on glass.     

应用微波技术抑制光刻胶图形的坍塌与黏连

针对显影工艺中水的表面张力导致的高高宽比抗蚀剂图形的坍塌及黏连,提出了一种基于微波加热的干燥技术来有效改善纳米抗蚀剂图形的干燥效果。该方法利用微波穿透光刻胶结构直接加热光刻胶图形间隙中残存的去离子水,水分子吸收微波的光子能量迅速蒸发,从而有效地抑制光刻胶图形的坍塌与黏连现象。利用提出的基于微波加热的干燥方法,成功获取了高260nm、宽16nm的光刻胶线条组和直径为20nm的光刻胶柱形阵列,其中高高宽比线条组和由15 625根柱子组成的柱形阵列结构没有出现坍塌及黏连情况,验证了在微波产生的交变电场作用下,可以减小水分子团簇,降低水的表面张力。