A vectorial vibrating reed magnetometer with high sensitivity

A vibrating reed magnetometer with high sensitivity is constructed. Using optical signal pickup, modified excitation coils, and an acoustical reference excitation system, the high sensitivity of former constructions is combined with the detection of the magnetization component perpendicular to the bias field H. The calibration procedure providing increased reliability is simplified and allows hysteresis measurements with the magnetic easy axis of the sample oriented at an arbitrary angle with respect to H. Measurement results are given in order to demonstrate the performance of the apparatus     

Study of a BGO calorimeter using electron and hadron beams from 1 to 50 GeV

A calorimeter of 25 bismuth germanate (BGO) crystals equipped with silicon photodiode readout has been tested at the CERN SPS in the energy range 1–50 GeV. The response for electrons has been shown to be linear in this energy range and the rms resolution obtained ( ) is approximately 1%, for E > 4 GeV. The electron/pion separation was found to be better than 1:500 in the energy range 1–20 GeV. Data on lateral and longitudinal shower development were compared with the results of a Monte Carlo simulation using the SLAC-EGS program and found to be in good agreement.     

西藏南部地区人工爆炸地震探测的地壳结构

众所周如,西藏地区是研究地球深部结构和构造的窗口,是研究大陆板块学说的重要场所,也是寻找热源和其它矿产资源的有利地区.因此,世界各国地学科学家都希望在本地区进行科学研究工作,或与我国科学工作者协作共同探索这一重要地区.中国和法国的地质、地球物理科学家经商讨共同组成“中法喜马拉雅山地质研究队”,对西藏中部广大地区进行地质、地球物理的科学研究工作.深部地震探测是地球物理研究中的重要内容.中法双方共同决定,在中国西藏南部的日喀则地区至北边的那曲地区作地震探测工作.为了探测地壳上地幔的结构,1981年在西藏的南部佩枯错至普莫雍错500公里的喜马拉雅山北麓——雅鲁藏布江地区进行了人工爆炸地震探测工作.本文是中法地质研究队合作的深部地震探测资料的解释结果.     

Inhibiting and deactivating effects of water on the selective catalytic reduction of nitric oxide with ammonia over MnOx/Al2O3

The effect of water on the selective catalytic reduction (SCR) of nitric oxide with ammonia over alumina supported with 2–15 wt.-% manganese oxide was investigated in the temperature range 385–600 K, with the emphasis on the low side of this temperature window. Studies on the effect of 1–5 vol.-% water vapour on the SCR reaction rate and selectivity were combined with TPD experiments to reveal the influence of water on the adsorption of the single SCR reactants. It turned out that the activity decrease due to water addition can be divided into a reversible inhibition and an irreversible deactivation. Inhibition is caused by molecular adsorption of water. TPD studies showed that water can adsorb competitively with both ammonia and nitric oxide. Additional kinetic experiments revealed that adsorbed ammonia is present in excess on the catalyst surface, even in the presence of water. Reduced nitric oxide adsorption is responsible for the observed reversible decrease in the reaction rate; the fractional reaction order changes from 0.79 in the absence of water to 1.07 in its presence. Deactivation is probably due to the dissociative adsorption of water, resulting in the formation of additional surface hydroxyls. As the amount of surface hydroxyls formed is limited to a saturation level, the deactivating effect on the catalyst is limited too. The additional hydroxyls condense and desorb in the temperature range 525–775 K, resulting in a lower degree of deactivation at higher temperature. A high temperature treatment at 775 K results in a complete regeneration. The amount of surface hydroxyls formed per unit surface area decreases at increasing MnO_x-loading. The selectivity to the production of nitrogen is enhanced significantly by the presence of gas phase water.     

A Radiation Imaging Detector Made by Postprocessing a Standard CMOS Chip

An unpackaged microchip is used as the sensing element in a miniaturized gaseous proportional chamber. This letter reports on the fabrication and performance of a complete radiation imaging detector based on this principle. Our fabrication schemes are based on wafer-scale and chip-scale postprocessing. Compared to hybrid-assembled gaseous detectors, our microsystem shows superior alignment precision and energy resolution, and offers the capability to unambiguously reconstruct 3D radiation tracks on the spot.     

Experimental Study of Alumina Particle Removal From a Plane surface

Micron and submicron alumina particles are often used for the mechanical polishing of the GaAs wafers processed in the microelectronic industry. A better understanding of the adhesion mechanisms is the key factor for the particle removal and for the optimisation of the industrial chemical cleaning. However, the nature and the strength of the complex interactions occurring between asymmetrical alumina particles and the surface remain unclear. Thus, an experimental study of the detachment of asymmetrical alumina particles in adhesive contact with a glass plate was done using a specially designed shear stress flow chamber. A series of experiments was performed to measure the shear stress necessary to remove individual alumina particles (of 3 and 0.3 µm nominal size) under various chemical solutions (diluted ammonia, surfactant and glycerol). Then the effects of the particle size, the resting time, the pH and the nature of the chemical solutions used for the removal of the alumina particles was characterised in terms of percentage of alumina particles detached. Results have shown that the longer the resting time, the more adherent the particles are. Moreover, it was found that the ammonia solution gives the best particle removal rate (80%) because of the strong repulsive electrostatic interactions between the alumina particles and the glass surface, both being charged negatively in a basic solution.