异质栅碳纳米管场效应管电学特性研究

采用一种量子力学模型,研究了类MOSFET型碳纳米管场效应管(CNTFET)的电流特性.该模型基于二维非平衡格林函数(NEGF)方程和泊松(Poisson)方程自洽全量子数值解.结合器件的工作原理,研究了器件结构尺寸效应,比较分析单栅、异质栅CNTFET的电学特性.研究结果表明,与单橱结构相比,异质栅器件结构具有更低的泄漏电流、更高的电流开关比,并且,在15 nm技术节点以上,异质栅CNTFET器件能够较好地满足ITRS'10的相关性能指标要求.     

异质栅纳米碳管场效应管线性掺杂效应的研究

The effects of linear doping profile near the source and drain contacts on the switching and high- frequency characteristics for conventional single-material-gate CNTFET （C-CNTFET） and hetero-material-gate CNTFET （HMG-CNTFET） have been theoretically investigated by using a quantum kinetic model. This model is based on two-dimensional non-equilibrium Green＇s functions （NEGF） solved self-consistently with Poisson＇s equations. The simulation results show that at a CNT channel length of 20 nm with chirality （7, 0）, the intrinsic cutoff frequency of C-CNTFETs reaches up to a few THz. In addition, a comparison study has been performed between C-and HMG-CNTFETs. For the C-CNTFET, results reveal that a longer linear doping length can improve the cutoff frequency and switching speed. However, it has the reverse effect on on/off current ratios. To improve the on/off current ratios performance of CNTFETs and overcome short-channel effects （SCEs） in high-performance device applications, a novel CNTFET structure with a combination of an HMG and linear doping profile has been proposed. It is demonstrated that the HMG structure design with an optimized linear doping length has improved high-frequency and switching performances as compared to C-CNTFETs. The simulation study may be useful for understanding and optimizing high-performance of CNTFETs and assessing the reliability of CNTFETs for prospective applications.