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Two types of 5μm thick hybrid orientation structure wafers,which were integrated by(110)or(100) orientation silicon wafers as the substrate,have been investigated for 15-40 V voltage ICs and MEMS sensor applications.They have been obtained mainly by SOI wafer bonding and a non-selective epitaxy technique,and have been presented in China for the first time.The thickness of BOX SiO2 buried in wafer is 220 nm.It has been found that the quality of hybrid orientation structure with(100)wafer substrate is better than that with(110)wafer substrate by"Sirtl defect etching of HOSW". 相似文献
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A novel depletion-mode NJFET compatible high-voltage BiCMOS process is proposed and experimentally demonstrated with a four-branch 12-bit DAC(digital-to-analog converter).With this process,an NJFET with a pinch-off voltage ofabout-1.5 V and a breakdown voltage of about 16 V,an NLDDMOS(N-type lightly-dosed-drain in MOS) with a turn-on voltage of about 1.0 V and a breakdown voltage of about 35 V,and a Zener diode with a reverse voltage of about 5.6 V were obtained.Measurement results showed that the conver... 相似文献
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针对功率器件的抗辐射加固技术,从入射粒子对半导体材料的辐射损伤机理出发,设计了一种-150 V抗辐射P沟道VDMOS器件。该器件采取的抗辐射加固措施有:在颈区的上方形成局部厚场氧化层结构;在N体区进行高剂量离子注入掺杂;在850 ℃低温条件下生长栅氧化层。通过仿真分析和试验进行了验证,该器件在最劣漏偏置条件下抗总剂量达到3 kGy,抗单粒子烧毁和单粒子栅穿的LET值为99.1 MeV·cm2/mg。该器件适用于星用抗辐射DC-DC电源系统。 相似文献
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摘 要:本文提出了一种新型的兼容高压BiCMOS工艺的耗尽型NJFET,并实际研制了一种四路12位数模转换器。研制的NJFET夹断电压-1.5V,击穿电压17V;带轻掺杂漏区的高压NMOS管开启电压1.0V,击穿电压35V;齐纳二极管的正向电压5.5V。使用该耗尽型NJFET及其兼容工艺研制的四路12位数模转换器的基准温度系数为±25ppm/℃,微分误差小于±0.3LSB,线性误差小于±0.5LSB,还可以广泛应用于其他高压数模/模数转换器的研制。 相似文献
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基于CMOS工艺设计了一款轨到轨运算放大器,整体电路包括偏置电路、输入级、输出级以及ESD保护电路。电路中的输入级使用了一种全新的架构,通过一对耗尽型NMOS管作为输入管,实现轨到轨输入,同时在输入级采用了共源共栅结构,能够提供较高的共模输入范围和增益;在输出级,为了得到满摆幅输出而采用了AB类输出级;同时ESD保护电路采用传统的GGMOS电路,耐压大于2 kV。经过仿真后可知,电路的输入偏置电流为150 fA,在负载为100 kΩ的情况下,输出最高和最低电压可达距电源轨和地轨的20 mV范围内,当电源电压为5 V时能获得80 dB的CMRR和120 dB的增益,相位裕度约为50°,单位增益带宽约为1.5 MHz。 相似文献
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