纳米氧化钨薄膜改性的大孔硅气敏传感器

通过双槽电化学腐蚀法在P型单晶硅表面制备了大孔硅。然后通过直流对靶反应磁控溅射法在大孔硅表面淀积了纳米氧化钨薄膜。使用场发射扫描电子显微镜（FESEM）观察大孔硅和氧化钨/大孔硅样品的形貌。分别使用X射线衍射（XRD）图谱和X射线光电子能谱（XPS）分析氧化钨晶体结构和钨的化合价。在室温下测试大孔硅和氧化钨/大孔硅气敏传感器的气敏特性。结果表明：氧化钨/大孔硅气敏传感器表现出了P型半导体气敏传感器的气敏特性。它对1ppm的二氧化氮显示了良好的恢复特性和重复性。氧化钨/大孔硅气敏传感器的长期稳定性要好于大孔硅气敏传感器。氧化钨的添加提高了大孔硅气敏传感器对二氧化氮的灵敏度。氧化钨/大孔硅气敏传感器对于二氧化氮的灵敏度要高于其对氨气和乙醇的灵敏度。通过淀积纳米氧化钨薄膜,改善了大孔硅对二氧化氮的选择性。     

Nano-WO3 film modified macro-porous silicon（MPS） gas sensor

We prepared macro-porous silicon（MPS） by electrochemical corrosion in a double-tank cell on the surface of single-crystalline P-type silicon.Then,nano-WO₃ films were deposited on MPS layers by DC facing target reactive magnetron sputtering.The morphologies of the MPS and WO₃/MPS samples were investigated by using a field emission scanning electron microscope.The crystallization of WO₃ and the valence of the W in the WO₃/MPS sample were characterized by X-ray diffraction and X-ray photoelectron spectroscopy,respectively. The gas sensing properties of MPS and WO₃/MPS gas sensors were thoroughly measured at room temperature. It can be concluded that:the WO₃/MPS gas sensor shows the gas sensing properties of a P-type semiconductor gas sensor.The WO₃/MPS gas sensor exhibits good recovery characteristics and repeatability to 1 ppm NO₂.The addition of WO₃ can enhance the sensitivity of MPS to NO₂.The long-term stability of a WO₃/MPS gas sensor is better than that of an MPS gas sensor.The sensitivity of the WO₃/MPS gas sensor to NO₂ is higher than that to NH₃ and C₂H₅OH.The selectivity of the MPS to NO₂ is modified by deposited nano-WO₃ film.