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A novel wet vapor photoresist stripping technology is developed as an alternative to dry plasma ashing and wet stripping.Experiments using this technology to strip hard baked SU-8 photoresist,aurum and chromium film are carried out.Then the images of stripping results are shown and the mechanism is analyzed and discussed. The most striking result of this experiment is that the spraying mixture of steam and water droplets can strip photoresist and even metal film with ease. 相似文献
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带有热沉结构的全镂空光读出红外焦平面阵列 总被引:1,自引:1,他引:1
A substrate-free optical readout focal plane array(FPA) operating in 8-12μm with a heat sink structure (HSS) was fabricated and its performance was tested.The temperature distribution of the FPA with an HSS investigated by using a commercial FLIR IR camera shows excellent uniformity.The thermal cross-talk effect existing in traditional substrate-free FPAs was eliminated effectively.The heat sink is fabricated successfully by electroplating copper,which provides high thermal capacity and high thermal conductivity,on the frame of substrate-free FPA. The FPA was tested in the optical-readout system,the results show that the response and NETD are 13.6 grey/K(F / # = 0.8) and 588 mK,respectively. 相似文献
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The multi-SCCO2(supercritical carbon dioxide)release and dry process based on our specialized SCCO2 semiconductor process equipment is investigated and the releasing mechanism is discussed.The experiment results show that stuck cantilever beams were held up again under SCCO2 high pressure treatment and the repeatability of this process is nearly 100%. 相似文献
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绿色二氧化碳超流体半导体清洗设备 总被引:1,自引:0,他引:1
传统半导体清洗技术无法对硅片上的微小器件间的缝隙和线条进行有效清洗,以超临界二氧化碳为媒体的清洗技术则可克服上述缺点。超临界二氧化碳具有零表面张力、低黏度、强扩散能力和溶解能力等特性,并且无毒无臭、可以循环使用,在下一代半导体清洗和清洗后的干燥过程中有极强的应用前景。提出了一种绿色二氧化碳超流体半导体清洗设备,它可实现超流体清洗和超临界干燥,二氧化碳循环使用,属于新型高效的下一代绿色半导体清洗设备。 相似文献