The MOCVD epitaxy has been used to grow the GaInAsP/GaInP/AlGaInP laser heterostructures with a narrow symmetric waveguide and broad asymmetric waveguide. Mesa stripe 100 μm aperture diode lasers emitting at 808 nm were manufactured. It is shown that a SiO2/Si dielectric mirror coating of Fabry-Perot faces of Al-free semiconductor lasers does not result in catastrophic optical mirror damage. It is found that the maximum optical output power of Al-free diode lasers is limited by catastrophic optical damage of the laser heterostructure. Maximum values of optical output power of 5.1 and 9.9 W have been attained in diode lasers with a narrow symmetric waveguide and broad asymmetric waveguide, respectively.
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