Evolution of the Co–N/Ti/Si System in Magnetron Sputtering of Co onto a Heated Ti/Si(100) Substrate

The surface-diffusion interaction is studied experimentally between cobalt and a heated Ti/Si(100) substrate under reactive magnetron sputtering in an argon–nitrogen atmosphere. A model is proposed that accounts for the nature of silicide formation in the Co/Ti/Si system by volume and surface-diffusion reactions between cobalt and the substrate. It is shown that the diffusion of cobalt into the silicon is impeded by the TiSi _x layer to a far greater extent than by the Ti layer.     

Phase Formation in Ti–Co–N/CoSi x /Si(100) and Ti–Co–Si–N/CoSi x /Si(100) Systems by Diffusion Reactions: The Role of Nitrogen

Surface-diffusion reactions are experimentally investigated between a Ti–Co–N or Ti–Co–Si–N alloy and a CoSi _x /Si(100) structure heated to 650–700°C.     

Phase Formation in a Ta–Ni–N Thin Film during Its Electron-Beam Evaporation Deposition on a Heated Si(100) Substrate

Surface-diffusion reactions between a Ta–Ni–N alloy and a Si(100) substrate are studied experimentally. It is shown that a Ta _x Si _y N/NiSi₂bilayer can be produced on the substrate by simultaneous electron-beam evaporation of tantalum and nickel in a nitrogen atmosphere, the substrate being heated to about 800°C. The formation of the NiSi₂ phase is examined.