Computational algebra applications in reliability theory

Reliability analysts are typically forced to choose between using an `algorithmic programming language' or a `reliability package' for analyzing their models and lifetime data. This paper shows that computational languages can be used to bridge the gap to combine the flexibility of a programming language with the ease of use of a package. Computational languages facilitate the development of new statistical techniques and are excellent teaching tools. This paper considers three diverse reliability problems that are handled easily with a computational algebra language: system reliability bounds; lifetime data analysis; and model selection     

Deep UV photolithographic systems and processes

Deep UV[200 to 300 nanometers (nm)] photolithography has received much recent attention because it promises higher resolution than conventional exposure technology. Except for the change in wavelength from the 400 nm region, the exposure technology would remain virtually unchanged. We will discuss resist materials and processes explored in the last few years for optimization of deep UV lithography. Particular emphasis is placed upon the chemistry of resist design, multilevel processing schemes, and new sources for deep UV exposure.