Inline capacitive and DC-contact MEMS shunt switches

This paper presents inline capacitive MEMS shunt switches suitable for X/K-band and Ka/V-band applications. The inline switch allows for a low- or high-inductance connection to the ground plane without changing the mechanical characteristics of the MEMS bridge. Excellent isolation and loss are achieved with this design, and the performance is very similar to the standard capacitive MEMS shunt switch. Also, a new metal-to-metal contact MEMS shunt switch is presented. A novel pull-down electrode is used which applies the electrostatic force at the same location as the metal-to-metal contact area. A contact resistance of 0.15-0.35 Ω is repeatable, and results in an isolation of -40 dB at 0.1-3 GHz. The measured isolation is still better than -20 dB at 40 GHz. The application areas are in high-isolation/low-loss switches for telecommunication and radar systems     

All-metal high-isolation series and series/shunt MEMS switches

This paper presents a novel all-metal series switch with several different pull-down electrode geometries. The switch results in an up-state capacitance of 5-9 fF and an isolation of -25 to -30 d8 at 10 GHz. The fabrication process is completely compatible with the standard capacitive (or dc-contact) shunt switch, A dc-30 GHz series/shunt switch is also presented with an isolation of -60 dB at 5 GHz and -42 dB at 10 GHz. This is the highest isolation switch available to-date. The performance is limited by radiation in the CPW lines and not by the series/shunt switch characteristics. The application areas are in high-isolation switches for basestations and satellite systems     

Millimeter-wave tapered-slot antennas on synthesized lowpermittivity substrates

This paper presents 30-GHz linear-tapered slot antennas (LTSA) and 94-GHz constant-width slot antennas (CSWA) on synthesized low dielectric constant substrates (ϵ_r=2.2). The performance of tapered-slot antennas (TSA) is sensitive to the effective thickness of the substrate. We have reduced the effective thickness by selectively machining holes in the dielectric substrate. The machined substrate antenna radiation patterns were significantly improved independent of the machined hole size or lattice as long as the quasi-static effective thickness remained the same, even if the hole/lattice geometry is comparable to a wavelength. The method was applied at 94 GHz on a CSWA with excellent radiation pattern improvement, making it suitable for f/1.6 imaging array applications     

High-isolation CPW MEMS shunt switches. 2. Design

For pt.1 see ibid., vol.48, no.6, p.1045-1052 (2000). In this paper, the second of two parts, the equivalent RLC model of the shunt switch is used in the design of tuned two- and four-bridge “cross” switches from 10 to 40 GHz. The cross switch attained an insertion loss of less than 0.3-0.6 dB, a return loss below -20 dB from 22 to 38 GHz in the up state, and a down-state isolation of 45-50 dB with only 1.5 pF of down-state capacitance (C_d). Also, an X-band microelectromechanical system (MEMS) switch with an insertion loss of less than 0.2 dB and an isolation of 35 dB is presented. This is done by inductively tuning the LC series resonance of the shunt switch. The MEMS bridge height is 1.5-2.5 μm, resulting in a pull-down voltage of 15-25 V. Application areas are in low-loss high-isolation communication and radar     

High-isolation CPW MEMS shunt switches. 1. Modeling

This paper, the first of two parts, presents an electromagnetic model for membrane microelectromechanical systems (MEMS) shunt switches for microwave/millimeter-wave applications. The up-state capacitance can be accurately modeled using three-dimensional static solvers, and full-wave solvers are used to predict the current distribution and inductance of the switch. The loss in the up-state position is equivalent to the coplanar waveguide line loss and is 0.01-0.02 dB at 10-30 GHz for a 2-μm-thick Au MEMS shunt switch. It is seen that the capacitance, inductance, and series resistance can be accurately extracted from DC-40 GHz S-parameter measurements. It is also shown that dramatic increase in the down-state isolation (20⁺ dB) can be achieved with the choice of the correct LC series resonant frequency of the switch. In part 2 of this paper, the equivalent capacitor-inductor-resistor model is used in the design of tuned high isolation switches at 10 and 30 GHz     

RF MEMS switches and switch circuits

MEMS switches are devices that use mechanical movement to achieve a short circuit or an open circuit in the RF transmission line. RF MEMS switches are the specific micromechanical switches that are designed to operate at RF-to-millimeter-wave frequencies (0.1 to 100 GHz). The forces required for the mechanical movement can be obtained using electrostatic, magnetostatic, piezoelectric, or thermal designs. To date, only electrostatic-type switches have been demonstrated at 0.1-100 GHz with high reliability (100 million to 10 billion cycles) and wafer-scale manufacturing techniques. It is for this reason that this article will concentrate on electrostatic switches     

High-isolation W-band MEMS switches

This paper presents the design, fabrication and measurement of single, T-match and π-match W-band high-isolation MEMS shunt switches on silicon substrates. The single and T-match design result in -20 dB isolation over the 80-110 GHz range with an insertion loss of 0.25±0.1 dB. The π-match design results in a reflection coefficient lower than -20 dB up to 100 GHz, and an isolation of -30 to -40 dB from 75 to 110 GHz (limited by leakage through the substrate). The associated insertion loss Is 0.4±0.1 dB at 90 GHz. To our knowledge, this is the first demonstration of high-performance MEMS switches at W-band frequencies