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1.
Seredin P. V. Goloshchapov D. L. Arsentyev I. N. Nikolaev D. N. Pikhtin N. A. Slipchenko S. O. 《Semiconductors》2021,55(1):44-50
Semiconductors - The purpose of the study is to investigate the effect of a new type of compliant substrates based on an AlGaAs superstructure layer (SL) and a protoporous Si (proto-Si) layer... 相似文献
2.
É. P. Domashevskaya P. V. Seredin É. A. Dolgopolova I. E. Zanin I. N. Arsent’ev D. A. Vinokurov A. L. Stankevich I. S. Tarasov 《Semiconductors》2005,39(3):336-342
The lattice constants of AlxGa1?x As epitaxial alloys with various AlAs (x) contents are determined for AlxGa1?xAs/GaAs(100) heterostructures grown by MOC-hydride epitaxy using X-ray diffractometry and an X-ray back-reflection method. An ordered AlGaAs2 (superstructural) phase is found in epitaxial heterostructures with x ≈ 0.50. The lattice constant of this phase is smaller than the lattice constants of an Al0.50Ga0.50As alloy and GaAs single-crystal substrate. 相似文献
3.
Kseniia A. Sergeeva Dmitrii V. Pavlov Albert A. Seredin Eugeny V. Mitsai Aleksandr A. Sergeev Evgeny B. Modin Anastasiia V. Sokolova Tsz Chun Lau Kseniia V. Baryshnikova Mihail I. Petrov Stephen V. Kershaw Aleksandr A. Kuchmizhak Kam Sing Wong Andrey L. Rogach 《Advanced functional materials》2023,33(44):2307660
In order to advance the development of quantum emitter-based devices, it is essential to enhance light-matter interactions through coupling between semiconductor quantum dots with high quality factor resonators. Here, efficient tuning of the emission properties of HgTe quantum dots in the infrared spectral region is demonstrated by coupling them to a plasmonic metasurface that supports bound states in the continuum. The plasmonic metasurface, composed of an array of gold nanobumps, is fabricated using single-step direct laser printing, opening up new opportunities for creating exclusive 3D plasmonic nanostructures and advanced photonic devices in the infrared region. A 12-fold enhancement of the photoluminescence in the 900–1700 nm range is observed under optimal coupling conditions. By tuning the geometry of the plasmonic arrays, controllable shaping of the emission spectra is achieved, selectively enhancing specific wavelength ranges across the emission spectrum. The observed enhancement and shaping of the emission are attributed to the Purcell effect, as corroborated by systematic measurements of radiative lifetimes and optical simulations based on the numerical solution of Maxwell's equations. Moreover, coupling of the HgTe photoluminescence to high quality factor modes of the metasurface improves emission directivity, concentrating output within an ≈20° angle. 相似文献
4.
5.
Seredin P. V. Fedyukin A. V. Terekhov V. A. Barkov K. A. Arsentyev I. N. Bondarev A. D. Fomin E. V. Pikhtin N. A. 《Semiconductors》2019,53(11):1550-1557
Semiconductors - Thin AlN nanofilms are produced by reactive ion-plasma deposition onto GaAs(100) substrates misoriented with respect to the 〈100〉 direction to different degrees. It... 相似文献
6.
A. S. Lenshin P. V. Seredin D. A. Minakov V. M. Kashkarov B. L. Agapov E. P. Domashevskaya I. E. Kononova V. A. Moshnikov N. S. Terebova I. N. Shabanova 《Semiconductors》2014,48(4):551-555
The composition and optical properties of composite materials based on porous silicon with iron, cobalt, and nickel deposited by the sol-gel technique are studied. It is shown that the deposition of metal-oxide films onto the surface of porous silicon enables stabilization of the photoluminescence and an increase in its intensity, as well as the storage of hydrogen in the porous layer. 相似文献
7.
P. V. Seredin A. V. Glotov V. E. Ternovaya E. P. Domashevskaya I. N. Arsentyev D. A. Vinokurov A. L. Stankevich I. S. Tarasov 《Semiconductors》2011,45(4):481-492
The X-ray diffraction and infrared spectroscopy data for MOCVD-hydride Al
x
Ga1 − x
As:Si/GaAs(100) heterostructures and homoepitaxial GaAs:Si/GaAs(100) structures doped with Si to a content of up to ∼1 at
% are reported. It is shown that, in the homoepitaxial heterostructures, the formation of alloys with Si yields a decrease
in the crystal lattice parameters of the epitaxial layer and a negative lattice mismatch with the single-crystal substrate
(Δa < 0). At the same time, the formation of quaternary alloys in the Al
x
Ga1 − x
As:Si/GaAs(100) heterostructures is not accompanied by any pronounced strains in the crystal lattice. By introducing Si into
the epitaxial layers of these heterostructures, it is possible to attain complete matching of crystal lattice parameters of
the film and substrate in the appropriately chosen technological conditions of growth of the epitaxial layers. 相似文献
8.
Alloys P. V. Seredin A. V. Glotov A. S. Lenshin I. N. Arsentyev D. A. Vinokurov Tatiana Prutskij Harald Leiste Monica Rinke 《Semiconductors》2014,48(1):21-29
Epitaxial heterostructures produced by MOCVD on the basis of Al x Ga1 ? x As ternary alloys with the composition parameter x ≈ 0.20–0.50 and doped to a high Si and P atomic content are studied. Using the high-resolution X-ray diffraction technique, scanning electron microscopy, X-ray microanalysis, Raman spectroscopy, and photoluminescence spectroscopy, it is shown that the epitaxial films grown by MOCVD are formed of five-component (Al x Ga1 ? x As1 ? y P y )1 ? z Si z alloys. 相似文献
9.
É. P. Domashevskaya P. V. Seredin A. N. Lukin L. A. Bityutskaya M. V. Grechkina I. N. Arsent’ev D. A. Vinokurov I. S. Tarasov 《Semiconductors》2006,40(4):406-413
The infrared reflectance spectra associated with lattice vibrations in the epitaxial AlxGa1?x As/GaAs(100) heterostructures with different Al content in the cation sublattice are studied. The structures are grown by metal-organic chemical vapor deposition. In the spectrum of the structure with x ≈ 0.50, the vibration modes corresponding to the superstructurally ordered AlGaAs2 phase are detected. The atomic force microscopy of the surface of the sample with x ≈ 0.50 reveals areas of ordered nano-scaled profile, with a period of ~ 115 nm. The ordered domains involve the AlGaAs2 structured phase. 相似文献
10.
P. V. Seredin D. L. Goloshchapov D. S. Zolotukhin A. S. Lenshin A. N. Lukin Yu. Yu. Khudyakov I. N. Arsentyev A. V. Zhabotinsky D. N. Nikolaev N. A. Pikhtin 《Semiconductors》2018,52(8):1012-1021
It is shown for the first time that the structural and optical functional characteristics of integrated GaAs/Si(100) heterostructures can be controlled by using misoriented Si(100) substrates and their preliminary etching. The growth of an epitaxial GaAs layer on a Si substrate without the formation of antiphase domains can be carried out on a substrate deviated from the (100) singular plane by an angle smaller than 4°–6° or without a transition layer of GaAs nanocolumns. Preliminary treatment of the silicon substrate by etching makes it possible to use it for the vapor-phase epitaxial growth of a single-crystal GaAs film with a considerably smaller relaxation coefficient, which has a positive effect on the structural quality of the film. These data are in good agreement with the results of IR reflectance spectroscopy and photoluminescence and ultraviolet spectroscopy. The features of the optical properties of integrated GaAs/Si(100) heterostructures in the infrared and ultraviolet spectral regions are also defined by the relaxation coefficient. 相似文献