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The amorphous/polycrystalline Si3N4/CrN nancrstructured multilayer films have been prepared by radio frequency (RF) reactive magnetron sputtering. The composition, microstructure and mechanical properties of these films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM) and nano-indentation. The CrN and Si3N4 single layer films are polycrystalline face centered-cubic and amorphous structures, respectively. The CrN and Si3N4 layers are nearly stoichiometric. The HRTEM image indicates that the interfaces are planar and modulation structure is clear in multilayers. The hardness values of Si3N4/CrN multilayers are between those of the constituent CrN and Si3N4 films at a substrate temperature of 20℃, and are somewhat higher than those of Si3N4 films at a deposition temperature of 500℃. There is no superhardness effect in the Si3N4/CrN multilayers. Based on the experimental results, the hardening mechanisms in the multilayers have been discussed. 相似文献
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利用相变超塑性现象 ,在自制的电阻加热扩散连接试验机上 ,对扩散连接的方法以及热作模具钢 3Cr2W8V与H13扩散连接接头的性能进行了试验研究 ,分析了不同条件对接头显微组织和连接效果的影响。结果表明 :本试验条件下按优选工艺参数连接的试样在拉断试验时 ,断裂发生在基体处 ,表明接头强度已不低于基体强度 相似文献
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利用相变超塑性现象,在自制的电阻加热扩散连接试验机上,对扩散连接的方法以及热作模具钢3Cr2W8V与H13扩散连接接头的性能进行了试验研究,分析了不同条件对接头显微组织和连接效果的影响。结果表明:本试验条件安优选工艺参数连接的试样在拉断试验时,断裂发生在基体处,表明接头强度已不低于基体强度。 相似文献
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采用铜箔作中间层,在连接温度为833K的条件下进行瞬间液相连接。研究了保温时间和压力对接头组织和性能的影响,结果表明,铝基复合材料表面致密的氧化膜仍然是影响接头性能的重要因素。压力辅助瞬间液相连接(压力为2MPa)能获得颗粒分布均匀,无氧化物夹杂的接头,接头剪切强度达157.4MPa,约为母材强度的70.2%。 相似文献