HFCVD金刚石薄膜表面的氨基修饰方法

金刚石是一种集多种优良性能于一体的功能材料,但是,金刚石薄膜sp3碳构造的高稳定性导致其表面活性不足,无法满足各种功能性表面的需要。本文从化学修饰角度,概括和总结了氨基在金刚石薄膜表面导入的一种新的简单方法,并对修饰后的金刚石表面进行了XPS表征。结果表明,氨基已成功的修饰到了金刚石薄膜表面。最后对氨基修饰后的金刚石薄膜的应用做了简单的介绍。     

Modification of the diamond film electrode with photochemistry for phenol degradation

The degradation of phenols has become urgent issues. In this paper, the diamond film electrode modified by photochemistry is chosen as the research object for phenol degradation. The boron-doped diamond films, which are modified and unmodified, are characterized by the X-ray photoelectron spectroscopy (XPS). Cyclic voltammograms are used to test the electrochemical window. It is found that the current value of tantalum/boron-doped diamond (Ta/BDD) electrode with amino modification increases two orders of magnitude in degrading the nitro-phenol, when the amino-modified rate is only 1.9%. The current value is enhanced from −4.0 × 10⁻⁴A-4.0 × 10⁻⁴ A to −4.0 × 10⁻²A-4.0 × 10⁻²A. In addition, in order to understand the excellent characteristics of Ta/BDD electrode modified by photochemistry for phenol degradation, the efficiency of degradation is also discussed.