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用等离子体处理技术对不同作用距离下的玻璃纤维增强的氰酸酯基复合材料表面进行活化处理,通过对处理前后的材料表面进行接触角、表面能、表面形貌、红外光谱等宏观微观性能的对比分析,获得了不同距离下等离子体表面活化处理的作用规律。结果显示:在同一工作电压下,随着作用距离的增加,材料表面的接触角越来越大,表面能随着作用距离的增加而降低,材料表面浸润性和表面能显著提高;表面形貌显示,等离子体活化处理之后,表面树脂碎片颗粒变小,露出了玻璃纤维,粗糙度增加,并且随着作用距离的减小,粗糙度增加的程度变大;红外光谱显示等离子体活化处理后复合材料表面酯基C-O键断裂,酯基数量降低,而硝基、酮基、羧基、醇羟基的数量相应的增加,表面极性增强,随着作用距离的增加,材料表面增加的硝基、酮基、羧基、醇羟基等官能团的数量也越来越少。 相似文献
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Gd2O3 thin films as high-κ gate dielectrics were deposited directly on Si(001) substrates by magnetron sputtering at a pressure of 1.3 Pa and different temperatures. X-ray diffraction results revealed that all the films grown from 450 to 570 ℃ were crystalline, and the Gd2O3 thin films consisted of a mixture of cubic and monoclinic phases. The growth temperature was a critical parameter for the phase constituents and their relative amount. Low temperature was favorable for the formation of cubic phase while higher temperature gave rise to more monoclinic phase. All the Gd2O3 thin films grown from different temperatures exhibited acceptable electrical properties, such as low leakage current density (JL) of 10-5 A/cm^2 at zero bias with capacitance equivalent SiO2 thickness in the range of 6-13 nm. Through the comparison between films grown at 450 and 570 ℃, the existence of monoclinic phase caused an increase in JL by nearly one order of magnitude and a reduction of effective dielectric constant from 17 to 9. 相似文献
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