陶瓷靶射频磁控溅射TiO2薄膜的制备和光催化特性

Transparent titania thin films were prepared on glass substrates by radio frequency magnetron sputtering from TiO2 ceramic target. The structure and morphology of those films with different sputtering power and substrate temperature has been measured with X-ray diffractometer (XRD) and atomic force microscope (AFM). It was found that the films were anatase and a mix of anatase-rutile with different condition. The transmission of the films has been studied by using UV-VIS-NIR spectrometer. It shows absorption edge has a little red shift with the increase of sputtering power and substrate temperature. The photocatalytic activity of the films was tested on the degradation of Rhodamine B solution. T.he highest degradation efficiency in our experiment was obtained in the film deposited at 550℃ and 130W.