高功率脉冲磁控溅射电源的研制

高功率脉冲磁控溅射(HPPMS)因其高离化率而得到广泛关注.高压大电流脉冲电源是实现该技术的重要环节之一.本论文介绍了一种HPPMS电源,该电源由充电电源、斩波输出两部分组成,给出了主电路框图.分析了大电流对斩波开关过电压的影响,采用RC吸收和续流有效地抑制了电压过冲,用所研制的电源进行HPPMS镀膜试验,结果表明电源运行稳定可靠,制备的薄膜表面清洁、致密,其平均表面粗糙度很低.可以预见HPPMS技术将会促进镀膜技术的发展.     

高功率脉冲磁控溅射试验平台设计及放电特性研究

高功率脉冲磁控溅射(HPPMS)因其高离化率而得到广泛关注,是目前的热点研究方向,为此我们搭建了试验平台并对HPPMS的放电特性进行了研究.结果表明:脉冲峰值电流随脉冲电压的增加而增加,随着气压的增加而增加.本文为进一步研究高功率脉冲磁控溅射提供了硬件条件和参考.     

Ion-Beam Surface Modification of Strut Dowel Used in ITER PF Support

In this paper, surface modification of the strut dowel used in ITER PF support is reported. Different ions (nitrogen/titanium) with different doses are implanted into the surface of strut dowel. The result of Auger Electron Spectroscopy (AES) indicates that nitrogen can be implanted more deeply than titanium under the implantation condition of 60 kV accelerating voltage and a dose of 8x10¹⁷/cm² nitrogen. Surface Micro Hardness (SMH) and wear resistance are improved remarkably. Further SEM observation shows that there are no obvious scratches and damages after wear test.