首页 | 本学科首页   官方微博 | 高级检索  
文章检索
  按 检索   检索词:      
出版年份:   被引次数:   他引次数: 提示:输入*表示无穷大
  收费全文   47篇
  免费   0篇
化学工业   1篇
机械仪表   1篇
无线电   30篇
一般工业技术   12篇
冶金工业   2篇
原子能技术   1篇
  2022年   2篇
  2021年   1篇
  2020年   1篇
  2019年   1篇
  2018年   1篇
  2014年   1篇
  2013年   2篇
  2012年   1篇
  2011年   1篇
  2010年   1篇
  2009年   2篇
  2008年   2篇
  2007年   7篇
  2006年   4篇
  2005年   3篇
  2004年   3篇
  2003年   2篇
  2002年   1篇
  2000年   1篇
  1999年   4篇
  1998年   4篇
  1997年   2篇
排序方式: 共有47条查询结果,搜索用时 15 毫秒
1.
The method of scanning Kelvin-probe microscopy is used to show that the effect of triboelectrification is observed when the tip of an atomic-force microscope interacts with the surface of n-GaAs epitaxial layers. The sign of the change in the potential indicates that the sample surface after triboelectrification becomes more negative. The observed specific features of the phenomena can be attributed to the thermally activated generation of point defects in the vicinity of the sample surface due to deformation caused by the tip.  相似文献   
2.
Electron traps in GaAs grown by MBE at temperatures of 200–300°C (LT-GaAs) were studied. Capacitance deep level transient spectroscopy (DLTS) was used to study the Schottky barrier on n-GaAs, whose space-charge region contained a built-in LT-GaAs layer ∼0.1 μm thick. The size of arsenic clusters formed in LT-GaAs on annealing at 580°C depended on the growth temperature. Two new types of electron traps were found in LT-GaAs layers grown at 200°C and containing As clusters 6–8 nm in diameter. The activation energy of thermal electron emission from these traps was 0.47 and 0.59 eV, and their concentration was ∼1017 cm−3, which is comparable with the concentration of As clusters determined by transmission electron microscopy. In LT-GaAs samples that were grown at 300°C and contained no arsenic clusters, the activation energy of traps was 0.61 eV. The interrelation between these electron levels and the system of As clusters and point defects in LT-GaAs is discussed. __________ Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 38, No. 4, 2004, pp. 401–406. Original Russian Text Copyright ? 2004 by Brunkov, Gutkin, Moiseenko, Musikhin, Chaldyshev, Cherkashin, Konnikov, Preobrazhenskii, Putyato, Semyagin.  相似文献   
3.
Porous GaAs (100) and (111) substrates with nanostructured (~10 nm) surface profiles are obtained in which pores branching in the 〈111〉 direction form a dense network with a volume density of ~60% under the surface at a depth of ~(50–100) nm. The surface of the substrates and the structure of GaSb layers grown on these substrates are studied. A decrease of 22% in the lattice-parameter mismatch at the GaSb/GaAs(porous) interface compared with that at the GaSb/GaAs(monolithic) interface is observed. Ideas about the chemical mechanisms of pore formation in III–V crystals are developed, and relations connecting the structure of porous layers to the composition of electrolytes and anodization conditions are established. It is shown that the dependence of the layers’ growth rate on lattice elastic strain can be conducive to an enhanced overgrowth of pores and to a transition to planar growth.  相似文献   
4.
It is shown that GaN layers can be grown on (100)-and (111)-oriented porous single-crystal GaAs substrates by molecular-beam epitaxy with plasma activation of the nitrogen by an rf electron cyclotron resonance discharge. The resulting undoped epitaxial layers possessed ntype conductivity with a carrier concentration ∼1018. Data obtained by scanning electron microscopy and cathodoluminescence indicate that at thicknesses ∼2000 Å, continuous layers of the cubic GaN modification are obtained regardless of the substrate orientation. Pis’ma Zh. Tekh. Fiz. 25, 3–9 (January 12, 1999)  相似文献   
5.
Quasi-static capacitance characteristics of multilayer arrays of vertically coupled InAs quantum dots (QDs) in a GaAs matrix were analyzed on the assumption of a Gaussian energy distribution of the ground state of the QDs. An array of InAs QDs with a characteristic base size of about 20 nm and height of ~3 nm was ordered in the growth direction and had 3, 6, or 10 layers spaced by ~5 nm. It was found that, as the number of layers increases from 3 to 10, the average binding energy of the ground electron state grows from ~80 to ~120 meV and the root mean square deviation characterizing the energy distribution of the levels of this state decreases from ~30 to ~15 meV.  相似文献   
6.
Electron traps in low-temperature-grown ~40-nm-thick GaAs layers containing nanometer As-Sb clusters have been studied using deep-level transient spectroscopy. Measurements at various bias voltages and small-amplitude filling pulses have allowed the identification of two groups (T1 and T2) of traps with substantially different thermal electron emission rates. It is shown that the density of traps T2 (with an activation energy of 0.56 ± 0.04 eV and electron capture cross section of 2 × 10?13?10?12cm2) is ~2 × 1012cm?2, while the density of traps T1 (0.44 ± 0.02 eV and 2 × 10?14?10?13 cm2, respectively) is ten times lower. It is assumed that, according to the existence of the two cluster groups observed in the layers under study, traps T2 are associated with clusters 4–7 nm in diameter and traps T1, with clusters up to ~20 nm in diameter.  相似文献   
7.
Capacitance- and conductance-voltage studies have been carried out on Schottky barrier structures containing a sheet of self-organized InAs quantum dots. The dots are formed in GaAs n-type matrices after the deposition of four monolayers of InAs. Quasi-static analysis of capacitance-voltage measurements indicates that there are at least two filled electron levels in the quantum dots, located 60 and 140 meV below the GaAs conduction band edge. The conductance of the structure depends on the balance between measurement frequency and the thermionic emission rate of carriers from the quantum dots. An investigation of the temperature-dependent conductance at different frequencies as a function of the reverse bias allows us to study separately the electron emission rates from the ground and first excited levels in the quantum dots. We estimate that the electron escape times from both levels of the quantum dots become comparable at room temperature and equal to about 100 ps.  相似文献   
8.
An effective method for mass production of field-emission microcathodes (μFECs) is suggested and described. The main properties of the μFECs are calculated using the actual geometric parameters of the system (emitting nanotip radius ∼15-20 nm, interelectrode distance ∼1.5-2 μm, etc.). It is shown that the electric field strength in the immediate vicinity of a nanotip is several units of at comparatively low (100-200 V) voltages applied. A series of probable applications taking advantage of the unique features of the μFECs are suggested.  相似文献   
9.
Lyzlova  E. V.  Glukhova  A. V.  Konnikov  A. V.  Dyug  K. O. 《Radiochemistry》2022,64(2):176-182
Radiochemistry - The sorption extraction of Pu and Am from nitric acid simulation solutions were studied on a solid extractant (TVEX) AXIONIT MND 40T in a static mode. It is shown that the...  相似文献   
10.
To obtain statistical data on quantum-dot sizes, AFM topographic images of the substrate on which the dots under study are grown are analyzed. Due to the nonideality of the substrate containing height differences on the order of the size of nanoparticles at distances of 1–10 μm and the insufficient resolution of closely arranged dots due to the finite curvature radius of the AFM probe, automation of the statistical analysis of their large dot array requires special techniques for processing topographic images to eliminate the loss of a particle fraction during conventional processing. As such a technique, convolution of the initial matrix of the AFM image with a specially selected matrix is used. This makes it possible to determine the position of each nanoparticle and, using the initial matrix, to measure their geometrical parameters. The results of statistical analysis by this method of self-assembled InAs quantum dots formed on the surface of an AlGaAs epitaxial layer are presented. It is shown that their concentration, average size, and half-width of height distribution depend strongly on the In flow and total amount of deposited InAs which are varied within insignificant limits.  相似文献   
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号