Influence of Field Effects on the Performance of InGaAs-Based Terahertz Radiation Detectors

A detailed electrical characterization of high-performance bow-tie InGaAs-based terahertz detectors is presented along with simulation results. The local surface potential and tunnelling current were scanned over the surfaces of the detectors by means of Kelvin probe force microscopy (KPFM) and scanning tunnelling microscopy (STM), which also enabled the determination of the Fermi level. Current-voltage curves were measured and modelled using the Synopsys Sentaurus TCAD package to gain deeper insight into the processes involved in detector operation. In addition, we performed finite-difference time-domain (FDTD) simulations to reveal features related to changes in the electric field due to the metal detector contacts. The investigation revealed that field-effect-induced conductivity modulation is a possible mechanism contributing to the high sensitivity of the studied detectors.     

Rotatable magnetron sputtering of aluminium in continuous and high power pulse modes using different strength magnetic arrays

This paper reports preliminary results of industrial size (152 mm target O.D.) rotatable magnetron sputtering of Al target in direct current (DC) and High Power Impulse Magnetron Sputtering (HIPIMS) modes using two standard commercially available magnetic arrays: standard strength array (as used for DC and AC processing) and a lower strength ‘RF’ array [i.e. as used for radio frequency (RF) magnetron sputtering]. A comparison of processes resulted in by combining the different magnetic arrays and power modes is made in terms of magnetic field distribution on the cathode surface, magnetron characteristics, process characteristics and deposition rates.Optical emission spectroscopy (OES) revealed enhanced sputtered Al flux ionisation in the HIPIMS discharge monitored 64 mm away from the target surface when using the ‘RF’ array. Importantly, the results of this work (at the processing conditions investigated) demonstrate that at the same average power the deposition rate of Al using HIPIMS in conjunction with the ‘RF’ array is substantially the same as that obtained for the ‘standard’ strength balanced array and DC power. This indicates that the magnetic field design of the ‘RF’ magnetic array affects favourably the sputtered flux transport perpendicular to the target surface by altering mass transport direction and minimising effects that reduce deposition rate (e.g. ion return effect). Arc rate is also reduced significantly (approximately ten times) if the low strength ‘RF’ array is used.     

Investigation of reactive high power impulse magnetron sputtering processes using various target material-reactive gas combinations

The two most important issues limiting reactive high power impulse magnetron sputtering (HIPIMS) process applicability until recently were the absence of suitable reactive HIPIMS control means and the limited capability of HIPIMS power supplies in terms of arc handling. The significant advancement has been made recently by the development of the optical plasma monitoring (PM)-based process control technology for reactive HIPIMS [Surface & Coatings Technology 204 (2010) 2159-2164]. The initial studies of reactive HIPIMS processes however have only covered Ti-O₂ target material-reactive gas system.In this paper the recently developed PM-based active feedback control technology was applied to explore further reactive HIPIMS processes now using a variety of different target material and reactive gas combinations. Data for hysteresis behaviour and process control using either PM or constant gas flow methods for Ti-O₂, Ti-CO₂, Cr-O₂, Cr-C₂H₄, Al-O₂, and Zn:Al-O₂ material-gas systems is presented and compared. In all cases the processes were found to exhibit hysteresis behaviour. The magnitude and features of the hysteresis loop were found to depend strongly on a particular metal-reactive gas pair. Similar to AC and DC reactive sputtering processes the hysteresis behaviour in reactive HIPIMS was found to be more pronounced for the gases that have high chemical affinity for a metal sputter target. The PM-based process control technology monitoring either metal or gas plasma emissions was shown to provide accurate control and stable operation of reactive HIPIMS discharges.     

Protein-protein interactions in reversibly assembled nanopatterns

We describe herein a platform to study protein-protein interactions and to form functional protein complexes in nanoscopic surface domains. For this purpose, we employed multivalent chelator (MCh) templates, which were fabricated in a stepwise procedure combining dip-pen nanolithography (DPN) and molecular recognition-directed assembly. First, we demonstrated that an atomic force microscope (AFM) tip inked with an oligo(ethylene glycol) (OEG) disulfide compound bearing terminal biotin groups can be used to generate biotin patterns on gold achieving line widths below 100 nm, a generic platform for fabrication of functional nanostructures via the highly specific biotin-streptavidin recognition. Subsequently, we converted such biotin/streptavidin patterns into functional MCh patterns for reversible assembly of histidine-tagged (His-tagged) proteins via the attachment of a tris-nitriloacetic acid (trisNTA) biotin derivative. Fluorescence microscopy confirmed reversible immobilization of the receptor subunit ifnar2-His10 and its interaction with interferon-alpha2 labeled with fluorescent quantum dots in a 7 x 7 dot array consisting of trisNTA spots with a diameter of approximately 230 nm. Moreover, we carried out characterization of the specificity, stability, and reversibility as well as quantitative real-time analysis of protein-protein interactions at the fabricated nanopatterns by imaging surface plasmon resonance. Our work offers a route for construction and analysis of functional protein-based nanoarchitectures.     

Pantoea Bacteriophage vB_PagS_MED16—A Siphovirus Containing a 2′-Deoxy-7-amido-7-deazaguanosine-Modified DNA

A novel siphovirus, vB_PagS_MED16 (MED16) was isolated in Lithuania using Pantoea agglomerans strain BSL for the phage propagation. The double-stranded DNA genome of MED16 (46,103 bp) contains 73 predicted open reading frames (ORFs) encoding proteins, but no tRNA. Our comparative sequence analysis revealed that 26 of these ORFs code for unique proteins that have no reliable identity when compared to database entries. Based on phylogenetic analysis, MED16 represents a new genus with siphovirus morphology. In total, 35 MED16 ORFs were given a putative functional annotation, including those coding for the proteins responsible for virion morphogenesis, phage–host interactions, and DNA metabolism. In addition, a gene encoding a preQ₀ DNA deoxyribosyltransferase (DpdA) is present in the genome of MED16 and the LC–MS/MS analysis indicates 2′-deoxy-7-amido-7-deazaguanosine (dADG)-modified phage DNA, which, to our knowledge, has never been experimentally validated in genomes of Pantoea phages. Thus, the data presented in this study provide new information on Pantoea-infecting viruses and offer novel insights into the diversity of DNA modifications in bacteriophages.     

The effect of Ti sputter target oxidation level on reactive High Power Impulse Magnetron Sputtering process behaviour

This paper investigates the effect of sputter target oxidation level on reactive process behaviour during High Power Impulse Magnetron Sputtering of transition metal target (Ti) in Ar/O₂ atmosphere. It was found by this study that the sputter target state depends on the history of its use in reactive HIPIMS mode. The effect appears to be pronounced strongly due to the significance of ion irradiation induced effects leading to enhanced sputter target oxidation. The target sputter cleaning times (e.g. after a reactive deposition run) are long (compared to DC sputtering) due to the same reason. The abovementioned effect has serious implications for the hysteresis behaviour and reactive deposition process window. It is shown in this paper that the hysteresis loop can be artificially suppressed or even eliminated and the reactive deposition process window can be reduced a number of times if the starting target surface is not a clean metal surface but a partially oxidised metal surface. Such target surface condition is readily obtainable for the targets that have a history of prolonged use in reactive HIPIMS mode. Processing parameters, such as pulse frequency and peak voltage pulse values are shown to have influence on the degree to what the abovementioned effects occur.     

The effects of Si and expanded PTFE substrates on formation and hydrogenation of Mg and Mg–Ti films

In this work, we investigated how DC and pulsed DC Ar gas plasma treatment changes surface topography and chemical composition of silicon and expanded Polytetrafluoroethylene (ePTFE) substrates and how different surface pretreatment techniques can affect the formation and hydrogenation of Mg and Mg–Ti films. It is observed that pre-treating Si and ePTFE substrates with different plasma modes results in significant changes of microstructures of as-deposited Mg and Mg–Ti films. After the hydrogenation of Mg films at 20 bar H₂ pressure and 180 °C temperature the formation of crystalline MgH₂ phase is observed only for the films deposited on plasma non-treated Si substrates which had the films with smallest dimensions of its columnar structure. It is known that, usually, Ti additives has positive effect on hydrogenation properties of Mg, but in this study independently of the used substrate pre-treatment technique after the hydrogenation of Mg–Ti films their XRD analysis showed no peaks of the crystalline hydride phase. However, depending on the surface properties of the substrate after hydrogenation Mg–Ti films also have several disparities which are discussed and attributed to the potentially related substrate features.