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1.
Nanocrystalline LaFeO3 is prepared by the dehydration of coprecipitated lanthanum and iron(III) hydroxides. It is shown that the behavior of the samples during heating and the size distribution of LaFeO3 nanocrystals can be considerably different depending on the scheme used for coprecipitation of lanthanum and iron hydroxides; independently of the method employed for coprecipitation of the initial compounds, sintering of the samples at 950°C leads to the formation of lanthanum orthoferrite crystals up to 100 nm in size.  相似文献   
2.
The introduction of oxidizers (O2, N2O, N2O + O2 mixture) into the gas phase (argon) affects the growth rate, composition, and properties of the films prepared via thermal decomposition of indium acetylacetonate, In(acac)3. N2O increases the average growth rate of the films by a factor of 3. It was proved by the radical fixation method that N2O oxidizes In(acac)3 molecules chemisorbed on the substrate, thus changing the composition and improving the electrical properties of the films.  相似文献   
3.
We report the deposition of chemostimulator nanoislands on the surface of indium phosphide by an electroexplosion process and the effect of experimental conditions (ambient composition, pressure, and source-substrate distance) on their size distribution and surface density. Vanadium oxide and vanadium islands are shown to have a catalytic effect on the surface oxidation of indium phosphide, ensuring one of the most effective interactions between a chemostimulator and a III–V semiconductor in an oxidizing atmosphere.  相似文献   
4.
The hydrothermal synthesis of nanocrystals in the ZrO2-In2O3-H2O system is investigated kinetically. The presence of indium hydroxide results in an increase in the dehydration temperature of this system. The size of nanocrystals is equal to 20–30 nm and virtually does not depend on the temperature and time of hydrothermal treatment or on the type of crystalline modification of ZrO2. An increase in the synthesis temperature leads to an increase in the fraction of the monoclinic zirconia modification.Original Russian Text Copyright © 2005 by Fizika i Khimiya Stekla, Artamonova, Almjasheva, Mittova, Lavrushina, Gusarov.  相似文献   
5.
X-ray emission and IR spectroscopy data are used to elucidate the mechanism of thermal oxidation of V2S5/InP structures in oxygen. The substrate-activator interaction is shown to have a significant effect on the oxidation mechanism and to improve the engineering performance of the structures.  相似文献   
6.
It is shown that the introduction of chromium(VI) oxide into a gaseous oxidative atmosphere leads to a complex activation mechanism of GaAs oxidation. This mechanism involves processes taking place largely in the activator itself. The kinetics of oxidation in dry and wet media, as well as the catalytic action of various chemistimulator phases, were studied. It was found that good insulating layers can be obtained when thermal oxidation proceeds in the presence of the chromium oxides.  相似文献   
7.
The evolution of the surface morphology and composition during the thermal oxidation of InP in the presence of V2O5 nanoislands has been studied by scanning tunneling microscopy and Auger electron spectroscopy. The results demonstrate that the effect of the islands is strongest in the initial stage of the process and persists in later stages. Auger electron spectroscopy and kinetic data strongly suggest that the oxidation of InP in the presence of vanadium oxide nanoislands follows a catalytic mechanism.  相似文献   
8.
The thermal oxidation of GaAs covered with an Ni layer is studied experimentally. It is shown that this layer makes for better dielectric performance of the oxide film and inhibits the escape of the volatiles from GaAs. A possible pattern of the oxidation of Ni/GaAs heterostructures is put forward. It includes the formation of a transition layer between NiO and GaAs, which contains nickel–arsenic and nickel–gallium compounds. Reactions at the interface between the transition layer and NiO are considered.  相似文献   
9.
The thermal oxidation of GaAs and InP is investigated when Al2(SO4)3 is introduced into the oxidizing atmosphere. It is found that the stimulator accelerates the reaction in both cases. The process and films are examined by laser ellipsometry, IR spectroscopy, and XRF. On this basis the role is identified of the stimulator anionic component, which causes the oxidation to branch and increases its rate.  相似文献   
10.
The kinetics and mechanism of the thermal oxidation of V/InP structures in flowing oxygen are investigated by x-ray diffraction and IR spectroscopy. The results demonstrate that the oxidation of thin (25 nm) vanadium films yields various oxides, which accelerate the oxidation of indium phosphide, leading to the formation of multiphase dielectric layers through a number of parallel reactions.Translated from Neorganicheskie Materialy, Vol. 41, No. 3, 2005, pp. 263–267.Original Russian Text Copyright © 2005 by Mittova, Tomina, Lapenko.This revised version was published online in April 2005 with a corrected cover date.This revised version was published online in April 2005 with a corrected cover date.  相似文献   
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